Measuring method, stage apparatus, and exposure apparatus

Abstract

An exposure apparatus exposes a substrate with an illumination light via a projection optical system. The apparatus has a base member supported via a first isolating member below the projection optical system; a stage arranged on the base member, and having a holder configured to support the substrate; a metrology frame supported via a second isolating member; a drive system to drive the stage on the base member; a plurality of grating portions on the metrology frame and arranged substantially parallel to a predetermined plane orthogonal to an optical axis of the projection optical system above the stage; an encoder system on the stage and configured to obtain position information of the stage; and a controller configured to control the drive system based on the position information obtained by the encoder system.

What is claimed is: 
     
         1 . An exposure apparatus that exposes a substrate with an illumination light via a projection optical system, the apparatus comprising:
 a base member supported via a first isolating member below the projection optical system;   a stage that is arranged on the base member, the stage having a holder configured to support the substrate;   a metrology frame supported via a second isolating member that is different from the first isolating member;   a drive system having a motor configured to drive the stage on the base member;   a plurality of grating portions provided on the metrology frame so as to be arranged substantially parallel to a predetermined plane that is orthogonal to an optical axis of the projection optical system above the stage, each of the plurality of grating portions having a reflective grating;   an encoder system provided on the stage and configured to obtain position information of the stage, the encoder system having a plurality of heads configured to irradiate a beam to each of the plurality of grating portions from below the plurality of grating portions; and   a controller configured to control the drive system based on the position information obtained by the encoder system, wherein   the plurality of grating portions are arranged such that the reflective grating surrounds a lens, the lens being one of a plurality of optical elements of the projection optical system and being arranged closest to an image plane, and   the position information of the stage moved below the plurality of grating portions is obtained by the encoder system at least in an exposure operation of the substrate.   
     
     
         2 . The exposure apparatus according to  claim 1 , wherein
 the plurality of grating portions are arranged such that an opening portion in which the lens is arranged is surrounded by the reflective grating, the plurality of grating portions being supported so as to be suspended by the metrology frame via a plurality of support portions such that the plurality of grating portions are capable of being displaced in a direction along a surface of the plurality of grating portions.   
     
     
         3 . The exposure apparatus according to  claim 2 , wherein
 the plurality of grating portions are fixed to a base in which the opening portion is formed, and the base is supported so as to be suspended by the metrology frame via the plurality of support portions.   
     
     
         4 . The exposure apparatus according to  claim 3 , wherein
 each of the plurality of support portions has a flexural member.   
     
     
         5 . The exposure apparatus according to  claim 4 , wherein
 each of the plurality of grating portions has a protection member that covers the reflective grating.   
     
     
         6 . The exposure apparatus according to  claim 3 , further comprising:
 a nozzle member provided so as to surround the lens and having an opening, through which the illumination light passes, at a lower surface of the nozzle member, the nozzle member being configured to form an immersion area between the lens and part of the substrate, wherein   the plurality of grating portions are arranged outside the nozzle member, and   the substrate is exposed with the illumination light via the projection optical system and a liquid of the immersion area.   
     
     
         7 . The exposure apparatus according to  claim 6 , wherein
 the plurality of grating portions are arranged such that the opening portion in which the lens and the nozzle member are arranged is surrounded by the reflective grating.   
     
     
         8 . The exposure apparatus according to  claim 7 , wherein
 the stage has an upper surface on which a recess on which the holder is arranged is provided, the stage being configured to support the substrate in the recess such that a surface of the substrate is substantially flush with the upper surface.   
     
     
         9 . The exposure apparatus according to  claim 8 , wherein
 each of the plurality of heads is provided on the stage so as to be positioned outside the upper surface of the stage with respect to a direction parallel to the predetermined plane.   
     
     
         10 . The exposure apparatus according to  claim 6 , wherein
 the nozzle member has supply and recovery ports of the liquid and the lower surface on which the opening is provided, the lower surface being arranged to be face-to-face with the substrate in the exposure operation, and   the liquid is supplied to the immersion area via the supply port, and the liquid is recovered from the immersion area via the recovery port.   
     
     
         11 . A device manufacturing method comprising:
 exposing a substrate using the exposure apparatus according to  claim 1 ; and   developing the exposed substrate.   
     
     
         12 . An exposure method for exposing a substrate with an illumination light via a projection optical system, the method comprising:
 moving a stage having a holder configured to support the substrate on a base member supported via a first isolating member below the projection optical system;   obtaining position information of the stage by an encoder system provided on the stage and having a plurality of heads configured to irradiate a beam to each of a plurality of grating portions from below the plurality of grating portions, the plurality of grating portions being provided on a metrology frame, which is supported via a second isolating member that is different from the first isolating member, so as to be arranged substantially parallel to a predetermined plane that is orthogonal to an optical axis of the projection optical system above the stage, each of the plurality of grating portions having a reflective grating; and   controlling a movement of the stage based on the position information obtained by the encoder system, wherein   the plurality of grating portions are arranged such that the reflective grating surrounds a lens, the lens being one of a plurality of optical elements of the projection optical system and being arranged closest to an image plane, and   the position information of the stage moved below the plurality of grating portions is obtained by the encoder system at least in an exposure operation of the substrate.   
     
     
         13 . The exposure method according to  claim 12 , wherein
 the plurality of grating portions are arranged such that an opening portion in which the lens is arranged is surrounded by the reflective grating, the plurality of grating portions being supported so as to be suspended by the metrology frame via a plurality of support portions such that the plurality of grating portions are capable of being displaced in a direction along a surface of the plurality of grating portions.   
     
     
         14 . The exposure method according to  claim 13 , wherein
 the plurality of grating portions are fixed to a base in which the opening portion is formed, and the base is supported so as to be suspended by the metrology frame via the plurality of support portions.   
     
     
         15 . The exposure method according to  claim 14 , wherein
 an immersion area is formed between the lens and part of the substrate by a nozzle member provided so as to surround the lens and having an opening, through which the illumination light passes, at a lower surface of the nozzle member, and the substrate is exposed with the illumination light via the projection optical system and a liquid of the immersion area, and wherein   the plurality of grating portions are arranged outside the nozzle member.   
     
     
         16 . The exposure method according to  claim 15 , wherein
 the substrate is supported in a recess, on which the holder is arranged, of an upper surface of the stage such that a surface of the substrate is substantially flush with the upper surface of the stage.   
     
     
         17 . A device manufacturing method comprising:
 exposing a substrate using the exposure method according to  claim 12 ; and   developing the exposed substrate.   
     
     
         18 . A manufacturing method of an exposure apparatus that exposes a substrate with an illumination light via a projection optical system, the method comprising:
 providing a base member supported via a first isolating member below the projection optical system;   providing a stage that is arranged on the base member, the stage having a holder configured to support the substrate;   providing a metrology frame supported via a second isolating member that is different from the first isolating member;   providing a drive system having a motor configured to drive the stage on the base member;   providing a plurality of grating portions provided on the metrology frame so as to be arranged substantially parallel to a predetermined plane that is orthogonal to an optical axis of the projection optical system above the stage, each of the plurality of grating portions having a reflective grating;   providing an encoder system provided on the stage and configured to obtain position information of the stage, the encoder system having a plurality of heads configured to irradiate a beam to each of the plurality of grating portions from below the plurality of grating portions; and   providing a controller configured to control the drive system based on the position information obtained by the encoder system, wherein   the plurality of grating portions are arranged such that the reflective grating surrounds a lens, the lens being one of a plurality of optical elements of the projection optical system and being arranged closest to an image plane, and   the position information of the stage moved below the plurality of grating portions is obtained by the encoder system at least in an exposure operation of the substrate.