Vapor deposition apparatus and method

Abstract

A vapor deposition apparatus includes a chamber configured to operate at vacuum and at least one crucible in the chamber. The crucible is configured to receive an ingot, a feeder operable to move the ingot with respect to the at least one crucible, and a heater in the chamber and configured to heat a hot zone between the at least one crucible and the feeder. A method for vapor deposition is also disclosed.

What is claimed is: 
     
         1 . A vapor deposition apparatus, comprising:
 a chamber configured to operate at vacuum;   at least one crucible in the chamber, the at least one crucible configured to receive an ingot;   a feeder operable to move the ingot with respect to the at least one crucible; and   a heater in the chamber and configured to heat a hot zone between the at least one crucible and the feeder.   
     
     
         2 . The apparatus of  claim 1 , wherein the feeder includes a drive mechanism and a mechanical guide mechanism or guide rods. 
     
     
         3 . The apparatus of  claim 2 , wherein the heater is between the mechanical guide mechanism or guide rods and the crucible. 
     
     
         4 . The apparatus of  claim 1 , wherein the heater is fixed to the crucible. 
     
     
         5 . The apparatus of  claim 1 , wherein the heater is an induction heater. 
     
     
         6 . The apparatus of  claim 1 , wherein the heater is a microwave heater. 
     
     
         7 . The apparatus of  claim 1 , wherein the heater is a resistance heater. 
     
     
         8 . The apparatus of  claim 1 , wherein the heater is selected from a group consisting of an induction heater, a microwave heater, and a resistance heater. 
     
     
         9 . The apparatus of  claim 1 , wherein the heater circumscribes the hot zone. 
     
     
         10 . The apparatus of  claim 1 , wherein the heater is operable to heat the hot zone above the vaporization temperature of water across a typical range of thermal emission physical vapor deposition (TE-PVD) process pressures. 
     
     
         11 . The apparatus of  claim 1 , further comprising heat shields defining the hot zone. 
     
     
         12 . A method for vapor deposition, comprising:
 driving off moisture from an ingot in a vapor deposition chamber prior to the ingot entering a crucible; and   providing the ingot to the crucible for vapor deposition.   
     
     
         13 . The method of  claim 12 , further comprising feeding the ingot through a hot zone and into the crucible. 
     
     
         14 . The method of  claim 13 , wherein the hot zone is defined between an ingot feeder and the crucible. 
     
     
         15 . The method of  claim 13 , wherein the moisture is driven off as the ingot is fed through the hot zone. 
     
     
         16 . The method of  claim 13 , wherein heat is retained by providing heat shields. 
     
     
         17 . The method of  claim 13 , further comprising heating the hot zone with a heater that is in the chamber. 
     
     
         18 . The method of  claim 17 , wherein the heater is selected from a group consisting of an induction heater, a microwave heater, and a resistance heater. 
     
     
         19 . The method of  claim 18 , wherein the ingot is heated to a temperature above the vaporization temperature of water. 
     
     
         20 . The method of  claim 17 , wherein the heater circumscribes the ingot.