US2018002804A1PendingUtilityA1

Laminate and method of producing the same, and gas barrier film and method of producing the same

Assignee: TOPPAN PRINTING CO LTDPriority: Mar 17, 2015Filed: Sep 14, 2017Published: Jan 4, 2018
Est. expiryMar 17, 2035(~8.6 yrs left)· nominal 20-yr term from priority
C23C 14/0036C23C 16/45525C23C 14/20C23C 16/40C23C 16/403C23C 16/4554C23C 16/405C23C 28/04C23C 16/45555C23C 16/0272C23C 16/402B32B 9/00C23C 14/083C23C 14/34C23C 16/545
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Claims

Abstract

A laminate that improves barrier properties of an atomic layer deposition film in spite of use of a substrate made of a polymer material, and provides a gas barrier film and a method of producing the same. The laminate includes: a substrate made a polymer material; an undercoat layer disposed on at least part of a surface of the substrate and made up of an inorganic material containing Ta; and an atomic layer deposition film disposed so as to cover a surface of the undercoat layer.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A laminate, comprising:
 a substrate made of a polymer material;   an undercoat layer disposed on at least part of a surface of the substrate and made of an inorganic material containing elemental Ta; and,   an atomic layer deposition film disposed on at least part of a surface of the undercoat layer.   
     
     
         2 . The laminate of  claim 1 , wherein the thickness of the undercoat layer is in a range of 1 nm or more and 1000 nm or less. 
     
     
         3 . The laminate of  claim 1 , where the thickness of the atomic layer deposition film is in a range of 0.5 nm or more and 200 nm or less. 
     
     
         4 . A gas barrier film comprising the laminate of  claim 1 , and wherein the substrate that constitutes the laminate is a film-shaped substrate. 
     
     
         5 . The gas barrier film of  claim 4 , wherein a water vapor transmission rate of the laminate is in a range of 0.1 g/(m 2 ·day) or less. 
     
     
         6 . A method of producing a laminate, comprising the steps of:
 forming an undercoat layer by using an inorganic material containing elemental Ta on at least part of a surface of a substrate made of a polymer material disposed in a vacuum chamber; and,   forming an atomic layer deposition film on at least part of a surface of the undercoat layer by supplying a precursor serving as a raw material for deposition on the surface of the undercoat layer.   
     
     
         7 . A method of producing a gas barrier film comprising the method of producing a laminate of  claim 6 , and wherein a film-shaped substrate is used as the substrate.

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