Bulk acoustic wave resonator having a plurality of compensation layers and duplexer using same
Abstract
A bulk acoustic wave resonator (BAWR) includes a bulk acoustic resonance unit and at least one compensation layer. The bulk acoustic resonance unit includes a first electrode, a second electrode, and a piezoelectric layer disposed between the first electrode and the second electrode. The first electrode, the second electrode, and the piezoelectric layer each include a material that modifies a resonance frequency based on a temperature, and the at least one compensation layer includes a material that adjusts the resonance frequency modified based on the temperature in a direction opposite to a direction of the modification.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A film bulk acoustic wave resonator (BAWR) comprising:
a substrate; a bulk acoustic resonance unit comprising a first electrode, a second electrode, and a piezoelectric layer disposed between the first electrode and the second electrode; a first compensation layer disposed above the bulk acoustic resonance unit; and a property compensation layer disposed above the first compensation layer, wherein the property compensation layer is disposed above the edges of a surface of the compensation layer so that a remaining portion of the surface between the edges is not covered by the property compensation layer.
2 . The BAWR of claim 1 , wherein the first compensation layer adjusts a temperature coefficient of the bulk acoustic wave resonance unit.
3 . The BAWR of claim 1 , wherein the first compensation layer comprises a silicon oxide-based material, a silicon nitride-based material, silicon oxide doped with an impurity, or silicon nitride doped with the impurity.
4 . The BAWR of claim 3 , wherein the impurity comprises at least one element selected from the group consisting of arsenic (As), antimony (Sb), phosphorus (P), boron (B), germanium (Ge), silicon (Si), and aluminum (Al.).
5 . The BAWR of claim 1 , further comprising:
a second compensation layer disposed below the second electrode
6 . A duplexer comprising:
a phase shifter configured to shift a phase of a received signal, and output the phase-shifted received signal; and a filter configured to filter the phase-shifted received signal output from the phase shifter, and output the filtered phase-shifted received signal to a receive output of the duplexer; wherein the filter comprises a film bulk acoustic source resonator comprising: a first electrode, a second electrode, a piezoelectric layer disposed between the first electrode and the second electrode, a compensation layer disposed above the bulk acoustic resonance unit, and a property compensation layer disposed above the compensation layer, wherein the property compensation layer is disposed above the edges of a surface of the compensation layer so that a remaining portion of the surface between the edges is not covered by the property compensation layer.Join the waitlist — get patent alerts
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