Exposure apparatus and method for producing device

Abstract

A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes: a projection system; a first nozzle member having an aperture through which the exposure beam is projected, the first nozzle member having a liquid supply inlet and a liquid recovery outlet; a second nozzle member having a gas supply inlet via which a gas is supplied, the gas being supplied via the gas supply inlet to a space surrounding the liquid immersion area during the exposure; and a stage system having a holder by which the substrate is held. The substrate held by the holder is moved below and relative to the projection system, the first nozzle member and the second nozzle member.

What is claimed is: 
     
         1 . A liquid immersion exposure apparatus in which substrate is exposed with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate, the apparatus comprising:
 a projection system;   a first nozzle member having an aperture through which the exposure beam is projected, the first nozzle member having a liquid supply inlet and a liquid recovery outlet;   a second nozzle member having a gas supply inlet via which a gas s supplied, the gas being supplied via the gas supply inlet to a space surrounding the liquid immersion area during the exposure; and   a stage system having a holder by which the substrate is held,   wherein the substrate held by the holder is moved below and relative to the projection system, the first nozzle member and the second nozzle member.