US2017323763A1PendingUtilityA1

Charged Particle Beam Device

Assignee: HITACHI HIGH TECH CORPPriority: Jul 31, 2014Filed: Jul 27, 2015Published: Nov 9, 2017
Est. expiryJul 31, 2034(~8 yrs left)· nominal 20-yr term from priority
H01J 37/28H01J 37/1474H01J 2237/2806H01J 2237/2817H01J 2237/221H01J 37/22H01J 37/147
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Claims

Abstract

The purpose of the present invention is to provide a charged particle beam device with which it is possible to minimize the beam irradiation amount while maintaining a high measurement success rate. The present invention is a charged particle beam device provided with a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m≧1), the number m of frames being smaller than the number n of frames.

Claims

exact text as granted — not AI-modified
1 . A charged particle beam device comprising:
 a scanning deflector that performs scanning with a charged particle beam discharged from a charged particle source;   a detector that detects a charged particle obtained based on the scanning with the charged particle beam; and   a control device that controls the scanning deflector, based on selection of a predetermined number of frames n,   wherein the control device controls the scanning deflector so that scanning with the charged particle beam is selectively performed on a portion on a sample corresponding to a pixel satisfying a predetermined condition or on a region including the portion on the sample, from an image obtained by scanning with the charged particle beam for the number of frames m (m≧1) which is smaller than the number of frames n.   
     
     
         2 . The charged particle beam device according to  claim 1 ,
 wherein the control device performs selective scanning with the charged particle beam on a frame subsequent to the number of frames m.   
     
     
         3 . The charged particle beam device according to  claim 1 ,
 wherein the control device generates an image signal by integrating a plurality of signals of the number of frames n.   
     
     
         4 . The charged particle beam device according to  claim 1 ,
 wherein the control device controls the scanning deflector so that scanning with the charged particle beam is selectively performed on a portion on a sample corresponding to a pixel whose signal amount shows a predetermined value or greater or on a region including the portion on the sample, from an image obtained by scanning performed on the number of frames m.   
     
     
         5 . A charged particle beam device comprising:
 a scanning deflector that performs scanning with a charged particle beam discharged from a charged particle source;   a detector that detects a charged particle obtained based on the scanning with the charged particle beam; and   a control device that adjusts an irradiation condition of the charged particle beam in at least two ways,   wherein the control device measures or inspects a pattern formed on the sample, based on a signal obtained by scanning a first region on the sample with a first charged particle, and   wherein the control device scans a second region including the first region with a second charged particle beam whose dose amount is smaller than that of the first charged particle beam, and specifies the first region, based on a signal obtained by scanning with the second charged particle beam.   
     
     
         6 . The charged particle beam device according to  claim 5 ,
 wherein a scanning speed of the second charged particle beam is faster than that of the first charged particle beam.   
     
     
         7 . The charged particle beam device according to  claim 5 ,
 wherein the control device specifies a portion, an edge portion of a pattern, or a position of a pattern on the sample whose signal amount shows a predetermined value or greater, from a signal obtained by scanning with the second charged particle beam, and performs scanning with the first charged particle beam so as to include the specified region.   
     
     
         8 . The charged particle beam device according to  claim 5 ,
 wherein the control device evaluates quality of an image obtained by scanning with the charged particle beam in which a scanning speed and the number of scanning times are differently combined with each other, and sets a combination between the number of scanning times and the scanning speed whose evaluation result satisfies a predetermined condition, as a beam condition of the first charged particle beam.   
     
     
         9 . A charged particle beam device comprising:
 a scanning deflector that performs scanning with a charged particle beam discharged from a charged particle source;   a detector that detects a charged particle obtained based on the scanning with the charged particle beam; and   a control device that adjusts an irradiation condition of the charged particle beam in at least two ways,   wherein the control device measures or inspects a pattern formed on a sample, based on a signal obtained by scanning a first region on the sample with a first charged particle beam, and wherein the control device scans a second region including the first region with a second charged particle beam whose dose amount is smaller than that of the first charged particle beam, and selects a scanning direction of the first charged particle beam, based on a signal obtained by scanning with the second charged particle beam.   
     
     
         10 . The charged particle beam device according to  claim 9 ,
 wherein a scanning speed of the second charged particle beam is faster than that of the first charged particle beam.   
     
     
         11 . The charged particle beam device according to  claim 9 ,
 wherein the control device specifies an edge portion of a pattern or a position of a pattern, from the signal obtained by scanning with the second charged particle beam, and performs scanning with the first charged particle beam so as to include the specified region.

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