Method of forming a graphene structure

Abstract

In various embodiments, a method of forming a graphene structure is provided. The method may include forming a body including at least one protrusion, and forming a graphene layer at an outer peripheral surface of the at least one protrusion.

What is claimed is: 
     
         1 . A method of forming a graphene structure, comprising:
 forming at least one opening in a body; and   forming a graphene layer at an inner peripheral surface of the at least one opening.   
     
     
         2 . The method of  claim 1 , further comprising at least partially removing the body from an outer peripheral surface of the graphene layer. 
     
     
         3 . The method of  claim 1 ,
 wherein the body comprises silicon carbide.   
     
     
         4 . The method of  claim 3 , wherein forming the graphene layer at the inner peripheral surface of the at least one opening comprises annealing the body so that the graphene layer forms at an inner peripheral surface of the at least one opening. 
     
     
         5 . The method of  claim 4 , wherein process parameters of the annealing comprise at least one of an annealing temperature, an annealing duration, an atmospheric pressure, and constituents of the atmosphere. 
     
     
         6 . The method of  claim 4 , wherein an annealing temperature is in a range from about 1150° C. to about 1800° C. 
     
     
         7 . The method of  claim 4 , wherein an annealing duration is in a range from about 5 minutes to about 60 minutes. 
     
     
         8 . The method of  claim 1 , wherein the graphene layer is a closed surface. 
     
     
         9 . The method of  claim 1 , wherein the graphene layer is a carbon nanotube. 
     
     
         10 . The method of  claim 9 , wherein the carbon nanotube is unfilled. 
     
     
         11 . The method of  claim 2 , wherein at least partially removing the body from an outer peripheral surface of the graphene layer comprises etching the body. 
     
     
         12 . The method of  claim 1 , comprising removing the graphene layer from the body. 
     
     
         13 . A method of forming a graphene structure, comprising:
 forming at least one cylindrical opening in a body, wherein a diameter of the opening is chosen to fulfill a relation d=78.3□((n+m)2−n×m)0.5 pm, wherein n and m are integer values, at least one of n and m being greater than 0; and   forming a graphene layer at an inner peripheral surface of the at least one opening.   
     
     
         14 . The method of  claim 13 , further comprising at least partially removing the body from an outer peripheral surface of the graphene layer. 
     
     
         15 . The method of  claim 14 , wherein at least partially removing the body from an outer peripheral surface of the graphene layer comprises etching the body. 
     
     
         16 . The method of  claim 13 ,
 wherein the body comprises silicon carbide.   
     
     
         17 . The method of  claim 16 , wherein forming the graphene layer at the inner peripheral surface of the at least one opening comprises annealing the body so that the graphene layer forms at an inner peripheral surface of the at least one opening. 
     
     
         18 . The method of  claim 13 , wherein the graphene layer is a carbon nanotube.