Substrate processing apparatus and substrate processing method

Abstract

A substrate processing apparatus comprises: a first chamber; a liquid film former which forms a liquid film P of a solution containing a sublimable substance having sublimability on a surface of a substrate in the first chamber; a second chamber 30 which receives the substrate W having the liquid film; a plate unit 311 provided in the second chamber such that the substrate W is placeable on an upper surface thereof; a temperature controller 312, 335 which controls a temperature of the upper surface of the plate unit 311 to a predetermined temperature; and a heater 322 which heats and sublimates the sublimable substance precipitated from the solution on the substrate W placed on the plate unit 311.

What is claimed is: 
     
         1 . A substrate processing apparatus, comprising:
 a first chamber;   a liquid film former which forms a liquid film of a solution containing a sublimable substance having sublimability on a surface of a substrate in the first chamber;   a second chamber which receives the substrate having the liquid film formed thereon;   a plate unit which is provided in the second chamber such that the substrate is placeable on an upper surface thereof;   a temperature controller which controls a temperature of the upper surface of the plate unit to a predetermined temperature; and   a heater which heats and sublimates the sublimable substance precipitated from the solution on the substrate placed on the plate unit.   
     
     
         2 . The substrate processing apparatus according to  claim 1 , wherein
 the heater irradiates an electromagnetic wave for increasing the temperature of the sublimable substance toward the plate unit from above the plate unit.   
     
     
         3 . The substrate processing apparatus according to  claim 1 , wherein the heater includes:
 a heat radiating member which is controlled to have a temperature higher than the plate unit; and   a moving mechanism which moves the heat radiating member between a proximate position where the heat radiating member is proximately facing the upper surface of the plate unit and a separated position where the heat radiating member is more distant from the plate unit than at the proximate position.   
     
     
         4 . The substrate processing apparatus according to  claim 1 , further comprising an ejector which ejects the sublimated sublimable substance from an atmosphere of the substrate surface. 
     
     
         5 . The substrate processing apparatus according to  claim 1 , further comprising a rotator which rotates the plate unit about a vertical axis. 
     
     
         6 . The substrate processing apparatus according to  claim 1 , further comprising a conveyor which conveys the substrate having the liquid film formed thereon from the first chamber to the second chamber. 
     
     
         7 . The substrate processing apparatus according to  claim 1 , wherein the liquid film former includes:
 a holder which holds the substrate in a horizontal posture in the first chamber; and   a liquid supplier supplies a solution to the upper surface of the substrate to form the liquid film.   
     
     
         8 . A substrate processing apparatus, comprising:
 a chamber which receives a substrate having a liquid film of a solution containing a sublimable substance having sublimability formed on a surface thereof;   a plate unit which is provided in the chamber such that the substrate is placeable on an upper surface thereof;   a temperature controller which controls a temperature of the upper surface of the plate unit to a predetermined temperature; and   a heater which heats and sublimates the sublimable substance precipitated from the solution on the substrate placed on the plate unit.   
     
     
         9 . The substrate processing apparatus according to  claim 8 , wherein
 the heater irradiates an electromagnetic wave for increasing the temperature of the sublimable substance toward the plate unit from above the plate unit.   
     
     
         10 . The substrate processing apparatus according to  claim 8 , wherein the heater includes:
 a heat radiating member which is controlled to have a temperature higher than the plate unit; and   a moving mechanism which moves the heat radiating member between a proximate position where the heat radiating member is proximately facing the upper surface of the plate unit and a separated position where the heat radiating member is more distant from the plate unit than at the proximate position.   
     
     
         11 . The substrate processing apparatus according to  claim 8 , further comprising an ejector which ejects the sublimated sublimable substance from an atmosphere of the substrate surface. 
     
     
         12 . The substrate processing apparatus according to  claim 8 , further comprising a rotator which rotates the plate unit about a vertical axis. 
     
     
         13 . A substrate processing method, comprising:
 forming a liquid film by a solution containing a sublimable substance having sublimability on a surface of a substrate in a first chamber;   conveying the substrate having the liquid film to a second chamber and placing the substrate on a plate unit which is provided in the second chamber and has an upper surface temperature-controlled to a predetermined temperature;   evaporating a solvent from the liquid film on the substrate placed on the plate unit and precipitating the sublimable substance in the second chamber; and   heating and sublimating the sublimable substance precipitated in the second chamber.