Cleaning method and cleaning apparatus for a mask
Abstract
A cleaning method and a cleaning apparatus for a mask are disclosed. The cleaning method includes: step 1, providing a to-be-cleaned mask which is made of metal and has an organic material film attached thereto; step 2, heating the to-be-cleaned mask with microwave to break up the organic material film attached to the mask; step 3, stopping heating with microwave, and spraying the heated mask with a solution to remove off the broken organic material film from the mask; step 4, cleaning residual organic material film on the mask with a solution; step 5, rinsing the cleaned mask to wash off residual solution on the mask; step 6, drying the rinsed mask with microwave. Accordingly, the cleaning period of mask is dramatically shortened; the cleaning productivity is increased; and the probability of material residue is decreased.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A cleaning apparatus for a mask, comprising:
a microwave dry-type cleaning tank, a solution wet-type cleaning tank and a solution wet-type washing tank; wherein the microwave dry-type cleaning tank comprises a tank body, a microwave generator disposed at a bottom of the tank body, and a low speed solution sprayer disposed at a top of the tank body.
2 . The cleaning apparatus as claimed in claim 1 , wherein the microwave dry-type cleaning tank, the solution wet-type cleaning tank and the solution wet-type washing tank are adjacently arranged in that order.
3 . The cleaning apparatus as claimed in claim 1 , wherein the solution wet-type cleaning tank is contained with a solution, the solution wet-type washing tank is contained with a detergent, and the mask is made of metal and used for an OLED evaporation process.
4 . A cleaning apparatus for a mask, comprising:
a microwave dry-type cleaning tank, a solution wet-type cleaning tank and a solution wet-type washing tank; wherein the microwave dry-type cleaning tank comprises a tank body, a microwave generator disposed at the bottom of the tank body, and a low speed solution sprayer disposed at the top of the tank body; wherein the microwave dry-type cleaning tank, the solution wet-type cleaning tank and the solution wet-type washing tank are adjacently arranged in that order; and wherein the solution wet-type cleaning tank is contained with a solution, the solution wet-type washing tank is contained with a detergent, and the mask is made of metal and used for an OLED evaporation process.Join the waitlist — get patent alerts
Track US2017266699A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.