US2017266699A1PendingUtilityA1

Cleaning method and cleaning apparatus for a mask

Assignee: SHENZHEN CHINA STAR OPTOELECTPriority: Jun 12, 2014Filed: Jun 6, 2017Published: Sep 21, 2017
Est. expiryJun 12, 2034(~7.8 yrs left)· nominal 20-yr term from priority
Inventors:Youyuan Kuang
B08B 3/022B08B 7/0071B08B 3/10H01L 51/001H10K 71/00H10K 71/164H10K 71/166
57
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Claims

Abstract

A cleaning method and a cleaning apparatus for a mask are disclosed. The cleaning method includes: step 1, providing a to-be-cleaned mask which is made of metal and has an organic material film attached thereto; step 2, heating the to-be-cleaned mask with microwave to break up the organic material film attached to the mask; step 3, stopping heating with microwave, and spraying the heated mask with a solution to remove off the broken organic material film from the mask; step 4, cleaning residual organic material film on the mask with a solution; step 5, rinsing the cleaned mask to wash off residual solution on the mask; step 6, drying the rinsed mask with microwave. Accordingly, the cleaning period of mask is dramatically shortened; the cleaning productivity is increased; and the probability of material residue is decreased.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A cleaning apparatus for a mask, comprising:
 a microwave dry-type cleaning tank, a solution wet-type cleaning tank and a solution wet-type washing tank;   wherein the microwave dry-type cleaning tank comprises a tank body, a microwave generator disposed at a bottom of the tank body, and a low speed solution sprayer disposed at a top of the tank body.   
     
     
         2 . The cleaning apparatus as claimed in  claim 1 , wherein the microwave dry-type cleaning tank, the solution wet-type cleaning tank and the solution wet-type washing tank are adjacently arranged in that order. 
     
     
         3 . The cleaning apparatus as claimed in  claim 1 , wherein the solution wet-type cleaning tank is contained with a solution, the solution wet-type washing tank is contained with a detergent, and the mask is made of metal and used for an OLED evaporation process. 
     
     
         4 . A cleaning apparatus for a mask, comprising:
 a microwave dry-type cleaning tank, a solution wet-type cleaning tank and a solution wet-type washing tank;   wherein the microwave dry-type cleaning tank comprises a tank body, a microwave generator disposed at the bottom of the tank body, and a low speed solution sprayer disposed at the top of the tank body;   wherein the microwave dry-type cleaning tank, the solution wet-type cleaning tank and the solution wet-type washing tank are adjacently arranged in that order; and   wherein the solution wet-type cleaning tank is contained with a solution, the solution wet-type washing tank is contained with a detergent, and the mask is made of metal and used for an OLED evaporation process.

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