Nanoparticle - polymer resists

Abstract

A composite, which is a blend comprising: a nanoparticle comprising a core and a coating surrounding the core; and a polymer, wherein the coating of the nanoparticle comprises a ligand, wherein the ligand is a substituted or unsubstituted C 1 -C 16 carboxylic acid or a salt thereof, a substituted or unsubstituted C 1 -C 16 amino acid or a salt thereof, a substituted or unsubstituted C 1 -C 16 dialkyl phosphonate, or a combination thereof; and wherein the polymer is a polymerization product of a photoacid generator comprising a polymerizable group; at least one unsaturated monomer, which is different from the photoacid generator comprising a polymerizable group; and a chain transfer agent of formula (I); wherein: Z is a y valent C 1-20 organic group, x is 0 or 1, and R d is a substituted or unsubstituted C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, or C 7-20 aralkyl.

1 . A composite, which is a blend comprising:
 a nanoparticle comprising a core and a coating surrounding the core; and   a polymer,   wherein the coating of the nanoparticle comprises a ligand, wherein the ligand is a substituted or unsubstituted C 1 -C 16  carboxylic acid or a salt thereof, a substituted or unsubstituted C 1 -C 16  amino acid or a salt thereof, a substituted or unsubstituted C 1 -C 16  dialkyl phosphonate, or a combination thereof; and   wherein the polymer is a polymerization product of a group of reactants consisting of   a photoacid generator comprising a polymerizable group,   at least one unsaturated monomer, which is different from the photoacid generator comprising a polymerizable group; and   a chain transfer agent of formula (I);   
       
         
           
           
               
               
           
         
         wherein: 
         Z is a y valent C 1-20  organic group, 
         x is 0 or 1, and 
         R d  is a substituted or unsubstituted C 1-20  alkyl, C 3-20  cycloalkyl, C 6-20  aryl, or C 7-20  aralkyl, 
         wherein the at least one unsaturated monomer is free of an acid-deprotectable monomer of formula (IV-B): 
       
       
         
           
           
               
               
           
         
         wherein, 
         R a  is independently H, F, C 1-10  alkyl, or C 1-10  fluoroalkyl; and 
         R b  is independently C 1-20  alkyl, C 3-20  cycloalkyl, or C 7-20  aralkyl, wherein each R b  is separate or at least one R b  is bonded to an adjacent R b  to form a cyclic structure. 
       
     
     
         2 . The composite of  claim 1 , wherein the core of the nanoparticle comprises ZrO 2 , HfO 2 , TiO 2 , or a combination thereof. 
     
     
         3 . The composite of  claim 1 , wherein the ligand is a substituted or unsubstituted C 1 -C 16  carboxylic acid or a salt thereof. 
     
     
         4 . The composite of  claim 1 , wherein a median diameter of the nanoparticle is 10 nanometers or less. 
     
     
         5 . The composite of  claim 1 , wherein photoacid generator comprising a polymerizable group is a monomer represented by formula (II): 
       
         
           
           
               
               
           
         
         wherein 
         each R a  is independently H, F, C 1-10  alkyl, or C 1-10  fluoroalkyl; 
         Q 2  is a single bond or an ester-containing or non-ester containing, fluorinated or non-fluorinated group selected from C 1-20  alkylene, C 3-20  cycloalkylene, C 6-20  arylene, and C 7-20  aralkylene group; 
         A is an ester-containing or non ester-containing, fluorinated or non-fluorinated group selected from C 1-20  alkylene, C 3-20  cycloalkylene, C 6-20  arylene, and C 7-20  aralkylene; 
         Z is an anionic moiety comprising sulfonate, an anion of a sulfonamide, or an anion of a sulfonimide; and 
         G +  has formula (III): 
       
       
         
           
           
               
               
           
         
         wherein X is S or I, each R c  is halogenated or non-halogenated and is independently a C 1-30  alkyl group; a polycyclic or monocyclic C 3-30  cycloalkyl group; a polycyclic or monocyclic C 4-30  aryl group, wherein when X is S, one of the R c  groups is optionally attached to one adjacent R c  group by a single bond, and z is 2 or 3, wherein when X is I, z is 2, or when X is S, z is 3. 
       
     
     
         6 . The composite of  claim 1 , wherein the polymerized product further comprises a repeating unit derived from a base-soluble monomer of formula (V) or a lactone-containing monomer of formula (VI): 
       
         
           
           
               
               
           
         
         wherein, 
         W is a base-reactive group comprising —C(═O)—OH; —C(CF 3 ) 2 OH; —NH—SO 2 —Y 1  where Y 1  is F or C 1-4  perfluoroalkyl; an aromatic —OH; or an adduct of any of the foregoing with a vinyl ether, 
         a is an integer of 1 to 3, 
         L is a monocyclic, polycyclic, or fused polycyclic C 4-20  lactone-containing group. 
       
     
     
         7 . The composite of  claim 1 , wherein G +  has formula (VII), (VIII), or (IX): 
       
         
           
           
               
               
           
         
         wherein 
         X is I or S, 
         R h , R i , R j , and R k  are each independently hydroxy, nitrile, halogen, C 1-10  alkyl, C 1-10  fluoroalkyl, C 1-10  alkoxy, C 1-10  fluoroalkoxy, C 6-20  aryl, C 6-20  fluoroaryl, C 6-20  aryloxy, or C 6-20  fluoroaryloxy, 
         Ar 1  and Ar 2  are independently C 10-30  fused or singly bonded polycyclic aryl groups; 
         R 1  is a lone pair of electrons where X is I, or a C 6-20  aryl group where X is S; p is an integer of 2 or 3, wherein when X is I, p is 2, and where X is S, p is 3, 
         q and r are each independently an integer from 0 to 5, and 
         s and t are each independently an integer from 0 to 4. 
       
     
     
         8 . The composite of  claim 1 , wherein the chain transfer agent of formula (I) has the structure of formula (X): 
       
         
           
           
               
               
           
         
         wherein 
         R m  is a C 1-10  alkyl, C 1-10  alkoxy, C 3-10  cycloalkyl, C 6-10  aryl, or C 7-10  aralkyl group, and 
         R c  is substituted or unsubstituted and is a C 1-10  alkyl or C 6-10  aryl group. 
       
     
     
         9 . A photoresist composition comprising the composite of  claim 1 . 
     
     
         10 . A coated substrate, comprising: (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition of  claim 9  over the one or more layers to be patterned. 
     
     
         11 . A method of forming an electronic device comprising:
 (a) applying a layer of the photoresist composition of  claim 9  on a surface of the substrate;   (b) pattern-wise exposing the photoresist composition layer to activating radiation; and   (c) developing the exposed photoresist composition layer with a solvent to provide a resist relief image.   
     
     
         12 . The composite of  claim 11 , wherein the resist relief image is a negative image. 
     
     
         13 . The method of  claim 11 , wherein the solvent is a mixture of an alcohol and a ketone.