US2017243997A1PendingUtilityA1

Four Junction Inverted Metamorphic Multijunction Solar Cell with Two Metamorphic Layers

Assignee: SOLAERO TECH CORPPriority: Nov 14, 2008Filed: May 8, 2017Published: Aug 24, 2017
Est. expiryNov 14, 2028(~2.3 yrs left)· nominal 20-yr term from priority
H01L 31/06875H01L 31/078H01L 31/1892H01L 31/1844H10F 71/1272H10F 71/139H10F 10/19H10F 10/1425Y02E10/544Y02P70/50Y02E10/547
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Claims

Abstract

A multijunction solar cell including an upper first solar subcell having a first band gap; a second solar subcell adjacent to the first solar subcell and having a second band gap smaller than the first band gap; a first graded interlayer adjacent to the second solar subcell; the first graded interlayer having a third band gap greater than the second band gap; and a third solar subcell adjacent to the first graded interlayer, the third subcell having a fourth band gap smaller than the second band gap such that the third subcell is lattice mismatched with respect to the second subcell. A second graded interlayer is provided adjacent to the third solar subcell; the second graded interlayer having a fifth band gap greater than the fourth band gap; and a lower fourth solar subcell is provided adjacent to the second graded interlayer, the lower fourth subcell having a sixth band gap smaller than the fourth band gap such that the fourth subcell is lattice mismatched with respect to the third subcell.

Claims

exact text as granted — not AI-modified
1 .- 20 . (canceled) 
     
     
         21 . A multijunction solar cell comprising:
 one or more upper solar subcells;   a first upper barrier layer below the one or more upper solar subcells, the first upper barrier layer being composed of InGa(Al)P;   a first graded interlayer composed of InGaAlAs, the first graded interlayer being below and adjacent the first upper barrier layer and having a band gap that is constant throughout the thickness of the first graded interlayer;   a first lower barrier layer below and adjacent the first graded interlayer, the first lower barrier layer being composed of InGaP and having a composition different from that of the first upper barrier layer;   at least one middle solar subcell below the first lower barrier layer;   a second graded interlayer composed of InGaAlAs and disposed below the at least one middle solar subcell and having a band gap that is constant throughout the thickness of the second graded interlayer; and   at least one lower solar subcell below the second graded interlayer.   
     
     
         22 . The multijunction solar cell of  claim 21  wherein the first upper barrier layer and the first lower barrier layer help prevent threading dislocations from propagating, respectively, into adjacent ones of the solar subcells. 
     
     
         23 . The multijunction solar cell of  claim 21  wherein the band gap of the first graded interlayer is 1.5 eV. 
     
     
         24 . The multijunction solar cell of  claim 23  wherein the band gap of the second graded interlayer is 1.1 eV. 
     
     
         25 . The multijunction solar cell of  claim 24  wherein:
 the one or more upper solar subcells include a first solar subcell having a first band gap in the range of 1.8 to 2.1 eV, and a second solar subcell below the first solar subcell and having a second band gap in the range of 1.35 to 1.45 eV; 
 the at least one middle solar subcell includes a third solar subcell having a band gap in the range of 0.9 to 1.1 eV; and 
 the at least one lower solar subcell includes a fourth solar subcell having a band gap in the range of 0.6 to 0.8 eV. 
 
     
     
         26 . The multijunction solar cell of  claim 21  wherein:
 the one or more upper solar subcells include a first solar subcell having a first band gap, and a second solar subcell disposed below the first solar subcell and having a second band gap smaller than the first band gap; 
 the first graded interlayer has a third band gap greater than the second band gap; 
 the at least one middle solar subcell includes a third solar subcell having a fourth band gap smaller than the second band gap such that the third subcell is lattice mismatched with respect to the second subcell, and wherein the first graded interlayer provides a gradual transition in lattice constant from the second solar subcell to the third solar subcell; 
 the second graded interlayer has a fifth band gap greater than the fourth band gap; and 
 the at least one lower solar subcell includes a fourth solar subcell having a sixth band gap smaller than the fourth band gap such that the fourth solar subcell is lattice mismatched with respect to the third solar subcell, and wherein the second graded interlayer provides a gradual transition in lattice constant from the third solar subcell to the fourth solar subcell. 
 
     
     
         27 . The multijunction solar cell of  claim 21  wherein the first upper barrier layer is n-type, and the first lower barrier layer is n+ type. 
     
     
         28 . The multijunction solar cell of  claim 21  wherein the first upper barrier layer is composed of InGaP. 
     
     
         29 . The multijunction solar cell of  claim 21  further including a second upper barrier layer disposed below the at least one middle solar subcell, and disposed above and adjacent to the second graded interlayer. 
     
     
         30 . The multijunction solar cell of  claim 29  wherein the second upper barrier layer is composed of GaInP. 
     
     
         31 . A method of manufacturing a solar cell comprising:
 providing a first substrate;   depositing over the first substrate a first sequence of layers of semiconductor material forming one or more first solar subcells;   depositing over the first sequence of layers a first upper barrier layer composed of InGa(Al)P;   depositing over the first upper barrier layer a first graded interlayer composed of InGaAlAs, the first graded interlayer being adjacent the first upper barrier layer and having a band gap that is constant throughout the thickness of the first graded interlayer;   depositing over the first graded interlayer a first lower barrier layer such that the first lower barrier layer is adjacent the first graded interlayer, the first lower barrier layer being composed of InGaP and having a composition different from that of the first upper barrier layer;   depositing over the first lower barrier layer at least one second solar subcell;   depositing over the at least one second solar subcell a second graded interlayer composed of InGaAlAs and having a band gap that is constant throughout the thickness of the second graded interlayer; and   depositing over the second graded interlayer at least one third solar subcell.   
     
     
         32 . The method of  claim 31  wherein the first upper barrier layer and the first lower barrier layer help prevent threading dislocations from propagating, respectively, into adjacent ones of the solar subcells. 
     
     
         33 . The method of  claim 31  wherein depositing a first graded interlayer includes depositing a graded interlayer having a band gap of 1.5 eV. 
     
     
         34 . The method of  claim 33  wherein depositing a second graded interlayer included depositing a graded interlayer having a band gap of 1.1 eV. 
     
     
         35 . The method of  claim 34  wherein:
 depositing the one or more first solar subcells includes:
 depositing a first solar subcell having a first band gap in the range of 1.8 to 2.1 eV; and 
 depositing over the first solar subcell another solar subcell having a second band gap in the range of 1.35 to 1.45 eV; 
 
 depositing the at least one second solar subcell includes depositing a solar subcell having a band gap in the range of 0.9 to 1.1 eV; and 
 depositing the at least one third solar subcell includes depositing a solar subcell having a band gap in the range of 0.6 to 0.8 eV. 
 
     
     
         36 . The method of  claim 31  wherein:
 depositing the one or more first solar subcells includes:
 depositing a first solar subcell having a first band gap; and 
 depositing over the first solar subcell another solar subcell having a second band gap smaller than the first band gap; 
 
 depositing the first graded interlayer includes depositing a graded interlayer having a third band gap greater than the second band gap; 
 depositing the at least one second solar subcell includes depositing a solar subcell having a fourth band gap smaller than the second band gap, wherein the solar subcell having the fourth band gap is lattice mismatched with respect to the solar subcell having the second band gap, and wherein the first graded interlayer provides a gradual transition in lattice constant from the solar subcell having the second band gap to the solar subcell having the fourth band gap; 
 depositing a second graded interlayer includes depositing a graded interlayer having a fifth band gap greater than the fourth band gap; and 
 depositing the at least one third solar subcell includes depositing a solar subcell having a sixth band gap smaller than the fourth band gap such that the solar subcell having the sixth band gap is lattice mismatched with respect to the solar subcell having the fourth band gap, and wherein the second graded interlayer provides a gradual transition in lattice constant from the solar subcell having the fourth band gap to the solar subcell having the sixth band gap. 
 
     
     
         37 . The method of  claim 31  wherein depositing a first upper barrier layer includes depositing a barrier layer composed of an n-type layer, and wherein depositing a first lower barrier layer includes depositing a barrier layer composed of an n+ type layer. 
     
     
         38 . The method of  claim 31  wherein depositing a first upper barrier layer includes depositing a barrier layer composed of InGaP. 
     
     
         39 . The method of  claim 31  further including depositing a second upper barrier layer over the at least one second solar subcell prior to depositing the second graded interlayer. 
     
     
         40 . The method of  claim 39  wherein depositing a second upper barrier layer includes depositing a barrier layer composed of GaInP.

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