Manufacturing method for component in plasma processing apparatus

Abstract

A manufacturing method for a component in a plasma processing apparatus is provided. The method includes: performing a surface conditioning on a surface of an underlying layer on which a film is to be formed by thermal spraying, the surface of the underlying layer includes a surface of a base or a surface of a layer formed on the surface of the base; and forming the film on the surface of the underlying layer by thermally spraying yttrium fluoride. A high velocity oxygen fuel spraying method or an atmospheric plasma spraying method is used in the forming of the film.

We claim: 
     
         1 . A manufacturing method for a component in a plasma processing apparatus, the manufacturing method comprising:
 performing a surface conditioning on a surface of an underlying layer on which a film is to be formed by thermal spraying, the surface of the underlying layer includes a surface of a base or a surface of a layer formed on the surface of the base; and   forming the film on the surface of the underlying layer by thermally spraying yttrium fluoride,   wherein, a high velocity oxygen fuel spraying method or an atmospheric plasma spraying method is used in the forming of the film, and   in the forming of the film, a slurry containing yttrium fluoride particles having an average diameter ranging from 1 μm to 8 μm is supplied, from a nozzle of a spraying gun configured to jet a flame in the high velocity oxygen fuel spraying method or from a nozzle of a spraying gun configured to discharge a plasma jet in the atmospheric plasma spraying method, to a position distanced apart from the nozzle of the spraying gun toward a downstream side in a direction of a central axis line of the nozzle of the spraying gun or to a position corresponding to a tip end of the nozzle of the spraying gun.   
     
     
         2 . The manufacturing method of  claim 1 ,
 wherein the high velocity oxygen fuel spraying method is used in the forming of the film, and   the position to which the slurry is supplied is in the range from 0 mm to 100 mm from the tip end of the nozzle in the direction of the central axis line.   
     
     
         3 . The manufacturing method of  claim 1 ,
 wherein the atmospheric plasma spraying method is used in the forming of the film, and   
       the position to which the slurry is supplied is in the range from 0 mm to 30 mm from the tip end of the nozzle in the direction of the central axis line. 
     
     
         4 . The manufacturing method of  claim 1 ,
 wherein an angle between a central axis line of a slurry supplying nozzle configured to supply the slurry and the central axis line of the nozzle of the spraying gun ranges from 45 degrees to 135 degrees at a side of the tip end of the nozzle of the spraying gun.   
     
     
         5 . The manufacturing method of  claim 1 ,
 wherein a temperature of the base is set to be in a range from 100° C. to 300° C. in the forming of the film.   
     
     
         6 . The manufacturing method of  claims 1 , further comprising:
 forming a first intermediate layer made of yttrium oxide between the base and the film.   
     
     
         7 . The manufacturing method of  claim 6 , further comprising:
 forming a mask on a region including an edge of the first intermediate layer,   wherein the forming of the film is performed while the mask is formed on the region including the edge of the first intermediate layer in the forming of the mask.   
     
     
         8 . The manufacturing method of  claim 6 , further comprising:
 forming a second intermediate layer between the first intermediate layer and the film.   
     
     
         9 . The manufacturing method of  claim 8 ,
 wherein the second intermediate layer has a linear expansion coefficient that falls between a linear expansion coefficient of the first intermediate layer and a linear expansion coefficient of the film.   
     
     
         10 . The manufacturing method of  claim 9 ,
 wherein the second intermediate layer is made of a thermally sprayed film of yttria-stabilized zirconia (YSZ), or a thermally sprayed film of forsterite.   
     
     
         11 . The manufacturing method of  claim 8 ,
 wherein the second intermediate layer is made of a thermally sprayed film of alumina or a thermally sprayed film of gray alumina.   
     
     
         12 . The manufacturing method of  claim 6 , further comprising:
 forming another intermediate layer between the base and the first intermediate layer.   
     
     
         13 . The manufacturing method of  claim 12 ,
 wherein the another intermediate layer is made of a thermally sprayed film of alumina or a thermally sprayed film of gray alumina.   
     
     
         14 . The manufacturing method of  claim 1 , further comprising:
 forming an alumite film on the surface of the base.