US2017186758A1PendingUtilityA1

3-dimensional semiconductor memory device and operating method thereof

Assignee: SAMSUNG ELECTRONICS CO LTDPriority: May 21, 2015Filed: Mar 14, 2017Published: Jun 29, 2017
Est. expiryMay 21, 2035(~8.8 yrs left)· nominal 20-yr term from priority
G11C 16/3459G11C 16/10H01L 27/11582H01L 27/11573H01L 27/11529G11C 16/0483H01L 27/11524H01L 27/1157H01L 27/11556H10D 62/83H10D 62/40G11C 16/3404H10B 41/41H10B 41/40H10B 43/10H10B 43/50H10B 43/27H10B 43/40H10B 41/35H10B 41/27H10B 41/20H10B 43/35
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Claims

Abstract

Disclosed is a three-dimensional semiconductor memory device, comprising a cell array formed on a first substrate and a peripheral circuit formed on a second substrate that is at least partially overlapped by the first substrate, wherein the peripheral circuit is configured to provide signals for controlling the cell array. The cell array comprises insulating patterns and gate patterns stacked alternately on the first substrate, and at least a first pillar formed in a direction perpendicular to the first substrate and being in contact with the first substrate through the insulating patterns and the gate patterns. The three-dimensional semiconductor memory device further comprising a first ground selection transistor that includes a first gate pattern, adjacent to the first substrate and the first pillar, and a second ground selection transistor that includes a second gate pattern positioned on the first gate pattern and the first pillar, and wherein the first ground selection transistor is not programmable, and the second ground selection transistor is programmable.

Claims

exact text as granted — not AI-modified
1 . A three-dimensional semiconductor memory device comprising:
 a cell array formed on a first substrate; and   a peripheral circuit formed on a second substrate that is at least partially overlapped by the first substrate, the peripheral circuit being configured to provide signals for controlling the cell array,   wherein the cell array comprises:   insulating patterns and gate patterns stacked alternately on the first substrate; and   at least a first pillar formed in a direction perpendicular to the first substrate and being in contact with the first substrate through the insulating patterns and the gate patterns,   wherein a first ground selection transistor includes a first gate pattern, adjacent to the first substrate and the first pillar, and a second ground selection transistor includes a second gate pattern positioned on the first gate pattern and the first pillar, and   wherein the first ground selection transistor is not programmable, and the second ground selection transistor is programmable.   
     
     
         2 .- 23 . (canceled)

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