No clean flux composition and methods for use thereof
Abstract
A flux formulation includes an activator and a protic solvent. The activator may be glutaric acid, levulinic acid, 2-ketobutyric acid, 2-oxovaleric acid, or mixtures thereof. Suitable protic solvents include alkanediol, alkoxy propanol and alkoxy ethanol. The flux formulation may be a no-clean flux formulation that may be used in the soldering of electronic circuit board assemblies, for example, in conjunction with a support fixture having a planar back surface that minimizes vibrations during processing that might otherwise cause misalignment between a chip and a substrate prior to solder reflow.
Claims
exact text as granted — not AI-modified1 .- 10 . (canceled)
11 . A soldering method comprising:
exposing a first substrate to a reducing plasma at a temperature from 20° C. to 25° C.; applying a flux formulation comprising an activator and a protic solvent, wherein the activator is a ketoacid having a boiling, sublimation or decomposition point of from 150° C. to 260° C. onto a surface of the first substrate to be soldered, the surface of the first substrate comprising a plurality of first solder bumps or metal contacts, contacting second solder bumps disposed on a surface of a second substrate to be soldered with the first solder bumps or metal contacts, and heating the first solder bumps or metal contacts and the second solder bumps to a first temperature to solder the first solder bumps or metal contacts to the second solder bumps and form a soldered assembly.
12 . (canceled)
13 . The method of claim 11 , wherein the first temperature is 150° C. to 260° C.
14 . The method of claim 11 , further comprising cooling the soldered assembly to a second temperature and applying an underfill material between the first substrate and the second substrate at the second temperature, wherein the second temperature is 100° C. to 120° C.
15 . The method of claim 14 , further comprising exposing the soldered assembly to an oxidizing plasma prior to applying the underfill material.
16 . The method of claim 14 , further comprising curing the underfill material at a third temperature greater than the second temperature.
17 . The method of claim 11 , further comprising placing the first substrate on a top surface of a fixture prior to the contacting, wherein the fixture has a planar bottom surface opposite to the top surface.
18 . The method of claim 17 , wherein the planar bottom surface comprises at least 25% of an area of the fixture.
19 . The method of claim 17 , wherein the first substrate is placed into a recessed region formed in the top surface.
20 . The method of claim 17 , wherein the fixture comprises a plurality of apertures extending through the fixture from the first surface to the second surface.
21 . The method of claim 1 , wherein the ketoacid is selected from the group consisting of 2-ketobutyric acid, 2-oxovaleric acid and mixtures thereof.
22 . The method of claim 1 , wherein the flux formulation does not contain halides.
23 . The method of claim 1 , wherein the flux formulation does not contain halides or organic resins.
24 . A soldering method comprising:
providing a first substrate comprising a plurality of first solder bumps or metal contacts affixed to a surface thereof; exposing the surface of the first substrate to a reducing plasma at a temperature from 20° C. to 25° C.; applying a flux formulation comprising an activator and a protic solvent, wherein the activator is a diacid or ketoacid having a boiling, sublimation or decomposition point of from 150° C. to 260° C. onto a surface of the first substrate; contacting the first solder bumps or metal contacts disposed on a surface of the first substrate to a second substrate, and heating the first solder bumps or metal contacts to a first temperature to solder the first solder bumps or metal contacts to the second substrate to form a soldered assembly.
25 . The method of claim 24 , wherein the reducing plasma comprises hydrogen.
26 . The method of claim 24 , further comprising cooling the soldered assembly to a second temperature and applying an underfill material between the first substrate and the second substrate at the second temperature, wherein the second temperature is 100° C. to 120° C.
27 . The method of claim 26 , further comprising exposing the soldered assembly to an oxidizing plasma prior to applying the underfill material.
28 . The method of claim 26 , further comprising curing the underfill material at a third temperature greater than the second temperature.
29 . The method of claim 24 , wherein the activator is a ketoacid selected from the group consisting of 2-ketobutyric acid, 2-oxovaleric acid and mixtures thereof
30 . The method of claim 24 , wherein the flux formulation does not contain halides or organic resins.Join the waitlist — get patent alerts
Track US2017173745A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.