Amorphous Layer Extreme Ultraviolet Lithography Blank, And Manufacturing And Lithography Systems Therefor

Abstract

An integrated extreme ultraviolet blank production system includes: a vacuum chamber for placing a substrate in a vacuum; a deposition system for depositing a multi-layer stack without removing the substrate from the vacuum; and a treatment system for treating a layer on the multi-layer stack to be deposited as an amorphous metallic layer. A physical vapor deposition chamber for manufacturing an extreme ultraviolet mask blank includes: a target, comprising molybdenum alloyed with boron. An extreme ultraviolet lithography system includes: an extreme ultraviolet light source; a mirror for directing light from the extreme ultraviolet light source; a reticle stage for placing an extreme ultraviolet mask blank with a multi-layer stack having an amorphous metallic layer; and a wafer stage for placing a wafer. An extreme ultraviolet blank includes: a substrate; a multi-layer stack having an amorphous metallic layer; and capping layers over the multi-layer stack.

What is claimed is: 
     
         1 . An integrated extreme ultraviolet blank production system comprising:
 a vacuum chamber for placing a substrate in a vacuum;   a deposition system for depositing a multi-layer stack without removing the substrate from the vacuum; and   a treatment system for treating a layer on the multi-layer stack to be deposited as an amorphous metallic layer.   
     
     
         2 . The system as claimed in  claim 1  wherein the treatment system includes an alloyed deposition of the amorphous metallic layer. 
     
     
         3 . The system as claimed in  claim 1  wherein the treatment system provides a gas to disrupt a crystalline structure of the amorphous metallic layer. 
     
     
         4 . The system as claimed in  claim 1  wherein the treatment system cools the multi-layer stack to suppress grain growth of the amorphous metallic layer. 
     
     
         5 . The system as claimed in  claim 1  wherein the deposition system includes a magnetron for sputtering the multi-layer stack. 
     
     
         6 . The system as claimed in  claim 1  further comprising a second deposition system is for depositing additional layers to form an extreme ultraviolet mask blank. 
     
     
         7 . The system as claimed in  claim 1  further comprising a second deposition system is for depositing additional layers to form an extreme ultraviolet mirror. 
     
     
         8 . A physical vapor deposition chamber for manufacturing an extreme ultraviolet blank comprising:
 a target, comprising molybdenum alloyed with boron.   
     
     
         9 . The chamber of  claim 8  further comprising:
 a second target, comprising silicon. 
 
     
     
         10 . The chamber of  claim 9  wherein the target and the second target are angled with respect to a pedestal adapted to receive a substrate. 
     
     
         11 . The chamber of  claim 8  further comprising a rotating pedestal adapted to receive a substrate. 
     
     
         12 . An extreme ultraviolet lithography system comprising:
 an extreme ultraviolet light source;   a mirror for directing light from the extreme ultraviolet light source;   a reticle stage for placing an extreme ultraviolet mask blank with a multi-layer stack having an amorphous metallic layer; and   a wafer stage for placing a wafer.   
     
     
         13 . The system as claimed in  claim 12  wherein the amorphous metallic layer is alloyed to form the amorphous metallic layer. 
     
     
         14 . The system as claimed in  claim 12  wherein the amorphous metallic layer has a disrupted crystalline structure to form the amorphous metallic layer. 
     
     
         15 . The system as claimed in  claim 12  wherein the amorphous metallic layer has suppressed grain growth to form the amorphous metallic layer. 
     
     
         16 . A method of making an extreme ultraviolet blank comprising:
 providing a substrate;   forming a multi-layer stack having an amorphous metallic layer over the substrate;
 and 
   forming capping layers over the multi-layer stack.   
     
     
         17 . The method as claimed in  claim 16  wherein forming the multi-layer stack having the amorphous metallic layer forms an alloyed amorphous metallic layer. 
     
     
         18 . The method as claimed in  claim 16  wherein forming the multi-layer stack having the amorphous metallic layer deposits the amorphous metallic layer by sputtering the metal with an alloy. 
     
     
         19 . The method as claimed in  claim 16  wherein forming the multi-layer stack having the amorphous metallic layer deposits the amorphous metallic layer by sputtering while cooling the substrate. 
     
     
         20 . The method as claimed in  claim 16  wherein forming the multi-layer stack having the amorphous metallic layer forms the amorphous metallic layer alloyed with boron, nitrogen, or carbon. 
     
     
         21 . The method as claimed in  claim 16  wherein forming the multi-layer stack having the amorphous metallic layer forms the amorphous metallic layer of amorphous molybdenum. 
     
     
         22 . The method as claimed in  claim 16  wherein forming the multi-layer stack having the amorphous metallic layer forms the amorphous metallic layer of a disrupted crystalline structure. 
     
     
         23 . The method as claimed in  claim 16  wherein forming the multi-layer stack having the amorphous metallic layer forms the amorphous metallic layer having suppressed grain growth. 
     
     
         24 . The method as claimed in  claim 16  wherein forming the multi-layer stack forms an extreme ultraviolet mask blank. 
     
     
         25 . The method as claimed in  claim 16  wherein forming the multi-layer stack forms an extreme ultraviolet mirror. 
     
     
         26 . The method as claimed in  claim 16  wherein providing the substrate provides a substrate of an ultra-low thermal expansion material. 
     
     
         27 . The method as claimed in  claim 16  wherein providing the substrate provides a substrate of glass.