Low-cost high-efficiency solar module using epitaxial si thin-film absorber and double-sided heterojunction solar cell with integrated module fabrication
Abstract
One embodiment of the present invention provides a double-sided heterojunction solar cell module. The solar cell includes a frontside glass cover, a backside glass cover situated below the frontside glass cover, and a number of solar cells situated between the frontside glass cover and the backside glass cover. Each solar cell includes a semiconductor multilayer structure situated below the frontside glass cover, including: a frontside electrode grid, a first layer of heavily doped amorphous Si (a-Si) situated below the frontside electrode, a layer of lightly doped crystalline-Si (c-Si) situated below the first layer of heavily doped a-Si, and a layer of heavily doped c-Si situated below the lightly doped c-Si layer. The solar cell also includes a second layer of heavily doped a-Si situated below the multilayer structure; and a backside electrode situated below the second layer of heavily doped a-Si.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A solar module, comprising:
a first photovoltaic structure; a second photovoltaic structure positioned adjacent to the first photovoltaic structure, wherein each of the first and second photovoltaic structures comprises a first electrode positioned on a first surface and a second electrode positioned on an opposite surface; and wherein a solder tab of the first electrode of the first photovoltaic structure is in direct contact with a solder tab of the second electrode of the second photovoltaic structure, thereby enabling a serial connection between the first and second photovoltaic structures.
2 . The solar module of claim 1 , further comprising:
a first cover; and a second cover.
3 . The solar module of claim 2 , further comprising:
a first adhesive polymer layer positioned between the first cover and the photovoltaic structures; and a second adhesive polymer layer positioned between the second cover and the photovoltaic structures; wherein the first and second adhesive polymer layers, the first and second covers, and the first and second photovoltaic structures are laminated together.
4 . The solar module of claim 3 , wherein the first cover comprises glass, and wherein a refractive index of the first adhesive polymer layer matches a refractive index of the glass.
5 . The solar module of claim 4 , wherein the first adhesive polymer layer comprises one or more selected from a group consisting of: ethylene-vinyl acetate (EVA), acrylic, polycarbonate, polyolefin, and thermal plastic.
6 . The solar module of claim 1 , wherein each of the first and second photovoltaic structures comprises:
a lightly doped crystalline-Si layer positioned between the first and second electrodes; a first heavily doped amorphous Si layer positioned between the first electrode and the lightly doped crystalline-Si layer; and a second heavily doped amorphous Si layer positioned between the second electrode and the lightly doped crystalline-Si layer, wherein the first and second heavily doped amorphous Si layers have opposite conductive doping types.
7 . The solar module of claim 6 , wherein each of the first and second photovoltaic structures further comprises at least one transparent conductive oxide layer positioned between an electrode and a heavily doped amorphous Si layer.
8 . The solar module of claim 6 , wherein the lightly doped crystalline-Si layer is formed using a chemical vapor deposition technique, wherein a thickness of the lightly doped crystalline-Si layer is between 5 μm and 100 μm, and wherein a doping concentration for the lightly doped c-Si layer is between 1×10 16 /cm 3 and 1×10 17 /cm 3 .
9 . The solar module of claim 6 , wherein at least one heavily doped crystalline-Si layer is formed using a chemical vapor deposition technique, wherein a thickness of the at least one heavily doped crystalline-Si layer is between 10 nm and 50 nm, and wherein a doping concentration of the at least one heavily doped a-Si layer is between 1×10 17 /cm 3 and 1×10 20 /cm 3 .
10 . The solar module of claim 6 , wherein each of the first and second photovoltaic structures further comprises a passivation layer on at least one surface of the lightly doped crystalline-Si layer, wherein a thickness of the passivation layer is between 1 nm and 10 nm, and wherein the passivation layer includes at least one of: undoped a-Si and SiO x .
11 . The solar module of claim 1 , wherein the first or second electrode comprises: Cu or tin-lead-silver coated Cu.
12 . A solar panel, comprising:
a first cover; a second cover; and a plurality of photovoltaic structures positioned between the first and second covers, wherein a respective photovoltaic structure comprises a first electrode positioned on a first surface and a second electrode positioned on an opposite surface of the photovoltaic structure; and wherein the plurality of photovoltaic structures are arranged in a way that a solder tab of the first electrode of a first photovoltaic structure is in direct contact with a solder tab of the second electrode of an adjacent photovoltaic structure, thereby enabling a serial connection between the first photovoltaic structure and the adjacent photovoltaic structure.
13 . The solar panel of claim 12 , further comprising:
a first adhesive polymer layer positioned between the first cover and the plurality of photovoltaic structures; and a second adhesive polymer layer positioned between the second cover and the plurality of photovoltaic structures; wherein the first and second adhesive polymer layers, the first and second covers, and the plurality of photovoltaic structures are laminated together.
14 . The solar panel of claim 13 , wherein the first or second adhesive polymer layer comprises one or more selected from a group consisting of: ethylene-vinyl acetate (EVA), acrylic, polycarbonate, polyolefin, and thermal plastic.
15 . The solar panel of claim 13 , wherein the photovoltaic structure comprises:
a lightly doped crystalline-Si layer positioned between the first and second electrodes; a first heavily doped amorphous Si layer positioned between the first electrode and the lightly doped crystalline-Si layer; and a second heavily doped amorphous Si layer positioned between the second electrode and the lightly doped crystalline-Si layer, wherein the first and second heavily doped amorphous Si layers have opposite conductive doping types.
16 . The solar panel of claim 15 , wherein the photovoltaic structure further comprises at least one transparent conductive oxide layer positioned between an electrode and a heavily doped amorphous Si layer.
17 . The solar panel of claim 15 , wherein the lightly doped crystalline-Si layer is formed using a chemical vapor deposition technique, wherein a thickness of the lightly doped crystalline-Si layer is between 5 μm and 100 μm, and wherein a doping concentration for the lightly doped c-Si layer is between 1×10 16 /cm 3 and 1×10 17 /cm 3 .
18 . The solar panel of claim 15 , wherein at least one heavily doped crystalline-Si layer is formed using a chemical vapor deposition technique, wherein a thickness of the at least one heavily doped crystalline-Si layer is between 10 nm and 50 nm, and wherein a doping concentration of the at least one heavily doped a-Si layer is between 1×10 17 /cm 3 and 1×10 20 /cm 3 .
19 . The solar panel of claim 15 , wherein the photovoltaic structure further comprises a passivation layer on at least one surface of the lightly doped crystalline-Si layer, wherein a thickness of the passivation layer is between 1 nm and 10 nm, and wherein the passivation layer includes at least one of: undoped a-Si and SiO x .
20 . The solar panel of claim 12 , wherein the first or second electrode comprises: Cu or tin-lead-silver coated Cu.Join the waitlist — get patent alerts
Track US2017148943A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.