Mask Device for Optical Alignment and Equipment Thereof

Abstract

A mask device for optical alignment and equipment thereof are disclosed. The mask device comprises a first mask having a first overlapping region and a first non-overlapping region and a second mask having a second overlapping region and a second non-overlapping region. The first and second mask overlap with each other. The first overlapping and non-overlapping regions, the second overlapping and non-overlapping regions comprise openings respectively. The height of the openings of the first and the second overlapping region are arranged to vary according the trigonometric square such that the height of the openings at the same position that the overlapping regions overlap with each other is the same as that the openings of the first or the second non-overlapping regions. Compared with the current technology, the disclosure may eliminate the defects of the striped mura in the liquid crystal display to increase the display quality of the products.

What is claimed is: 
     
         1 . An optical mask device for optical alignment comprising:
 a first mask and a second mask;   the first mask comprises a first overlapping region and a first non-overlapping region;   the second mask comprises a second overlapping region and a second non-overlapping region;   the first overlapping region and the second overlapping region overlap with each other;   the first overlapping region comprises a plurality of transmission openings arranged in a first direction;   the first non-overlapping region comprises a plurality of transmission openings arranged in the first direction;   the second overlapping region comprising a plurality of transmission openings arranged in the first direction;   the second non-overlapping region comprises a plurality of transmission openings arranged in the first direction;   the openings of the first non-overlapping region and the openings of the second non-overlapping region are the same;   the height Y1 of the openings of the first overlapping region satisfies Y1=H sin 2 (πX/2L);   the height Y2 of the openings of the second overlapping region satisfies Y2=H cos 2 (πX/2L);   wherein H is the height of the openings of the first non-overlapping region and the height of the openings of the second non-overlapping region; X=L−M; L is the length of the first overlapping region and the length of the second overlapping region; M is the distance between the first overlapping region and the second non-overlapping region or the distance between the second overlapping region and the second non-overlapping region;   the openings of the first non-overlapping region and the openings of the second non-overlapping region are a first rectangular;   the width direction of the first rectangular is the same as the first direction;   the openings of the first overlapping region and the openings of the second overlapping region are a plurality of third rectangular; the size of the third rectangle in the first direction is the same as or different from the width of the first rectangular;   the openings of the first overlapping region and the openings of the second overlapping region are arranged symmetrically or asymmetrically.   
     
     
         2 . The device according to  claim 1 , wherein the openings of the first overlapping region and the openings of the second overlapping region are obtained by mosaic algorithm. 
     
     
         3 . An optical mask device for optical alignment comprising:
 a first mask and a second mask;   the first mask comprises a first overlapping region and a first non-overlapping region;   the second mask comprises a second overlapping region and a second non-overlapping region;   the first overlapping region and the second overlapping region overlap with each other;   the first overlapping region comprises a plurality of transmission openings arranged in a first direction;   the first non-overlapping region comprises a plurality of transmission openings arranged in the first direction;   the second overlapping region comprising a plurality of transmission openings arranged in the first direction;   the second non-overlapping region comprises a plurality of transmission openings arranged in the first direction;   the openings of the first non-overlapping region and the openings of the second non-overlapping region are the same;   the height Y1 of the openings of the first overlapping region satisfies Y1=H sin 2 (πX/2L);   the height Y2 of the openings of the second overlapping region satisfies Y2=H cos 2 (πX/2L);   wherein H is the height of the openings of the first non-overlapping region and the height of the openings of the second non-overlapping region; X=L−M; L is the length of the first overlapping region and the length of the second overlapping region; M is the distance between the first overlapping region and the second non-overlapping region or the distance between the second overlapping region and the second non-overlapping region.   
     
     
         4 . The device according to  claim 3 , wherein:
 the openings of the first non-overlapping region and the openings of the second non-overlapping are being a first rectangular;   the width direction of the first rectangular is the same as the first direction;   the openings of the first overlapping region and the openings of the second overlapping region are a second rectangle; the size of the second rectangular in the first direction is the same as the width of the first rectangular.   
     
     
         5 . The device according to  claim 3 , wherein:
 the openings of the first non-overlapping region and the openings of the second non-overlapping region are a first rectangular;   the width direction of the first rectangular is the same as the first direction;   the openings of the first overlapping region and the openings of the second overlapping region are a plurality of third rectangular; the size of the third rectangular in the first direction is the same as or different from the width of the first rectangular.   
     
     
         6 . The device according to  claim 5 , wherein the openings of the first overlapping region and the openings of the second overlapping region are obtained by mosaic algorithm. 
     
     
         7 . The device according to  claim 3 , wherein the openings of the first overlapping region and the openings of the second overlapping region overlap with each other. 
     
     
         8 . The device according to  claim 3 , wherein the openings of the first overlapping region and the openings of the second overlapping region do not overlap with each other. 
     
     
         9 . The device according to  claim 3 , wherein the openings of the first overlapping region and the openings of the second overlapping region are arranged symmetrically or asymmetrically. 
     
     
         10 . An exposure equipment comprising a mask device, a first light source and a second light source, wherein the mask device comprises:
 a first mask and a second mask;   the first mask comprises a first overlapping region and a first non-overlapping region;   the second mask comprises a second overlapping region and a second non-overlapping region;   the first overlapping region and the second overlapping region overlap with each other;   the first overlapping region comprises a plurality of transmission openings arranged in a first direction;   the first non-overlapping region comprises a plurality of transmission openings arranged in the first direction;   the second overlapping region comprising a plurality of transmission openings arranged in the first direction;   the second non-overlapping region comprises a plurality of transmission openings arranged in the first direction;   the openings of the first non-overlapping region and the openings of the second non-overlapping region are the same;   the height Y1 of the openings of the first overlapping region satisfies Y1=H sin 2 (πX/2L);   the height Y2 of the openings of the second overlapping region satisfies Y2=H cos 2 (πX/2L);   wherein H is the height of the openings of the first non-overlapping region and the height of the openings of the second non-overlapping region; X=L−M; L is the length of the first overlapping region and the length of the second overlapping region; M is the distance between the first overlapping region and the second non-overlapping region or the distance between the second overlapping region and the second non-overlapping region;   the first light source provides light for the openings of the first mask;   the second light source provides light for the openings of the second mask.   
     
     
         11 . The equipment according to  claim 10 , wherein:
 the openings of the first non-overlapping region and the openings of the second non-overlapping region are a first rectangular;   the width direction of the first rectangular is the same as the first direction;   the openings of the first overlapping region and the openings of the second overlapping region are a second rectangle; the size of the second rectangular in the first direction being the same as the width of the first rectangular.   
     
     
         12 . The equipment according to  claim 10 , wherein:
 the openings of the first non-overlapping region and the openings of the second non-overlapping region are a first rectangular;   the width direction of the first rectangular is the same as the first direction;   the openings of the first overlapping region and the openings of the second overlapping region are a plurality of third rectangular; the size of the third rectangular in the first direction is the same as or different from the width of the first rectangular.   
     
     
         13 . The equipment according to  claim 12 , wherein the openings of the first overlapping region and the openings of the second overlapping region are obtained by mosaic algorithm. 
     
     
         14 . The equipment according to  claim 10 , wherein the openings of the first overlapping region and the openings of the second overlap region overlap with each other. 
     
     
         15 . The equipment according to  claim 10 , wherein the openings of the first overlapping region and the openings of the second overlapping region do not overlap with each other. 
     
     
         16 . The equipment according to  claim 10 , wherein the openings of the first overlapping region and the openings of the second overlapping region are arranged symmetrically or asymmetrically. 
     
     
         17 . The equipment according to  claim 10 , wherein the first light source and the second light source are ultraviolet lights.