Apparatus for distributing gas and apparatus for processing substrate including the same
Abstract
Disclosed is an apparatus for distributing gas which is capable of uniformly injecting processing gas into a plurality of gas passages being communicated with a plurality of gas distribution holes, and an apparatus for processing substrate including the same, wherein the apparatus for distributing gas may include a body including a plurality of gas passages connected with a plurality of gas distribution holes for distributing processing gas; and at least one gas injection module connected with at least one lateral surface of the body and respectively communicated with the plurality of gas passages, wherein the gas injection module firstly buffers the processing gas supplied from the external, secondly buffers the firstly buffered processing gas, and injects the buffered processing gas into the plurality of gas passages.
Claims
exact text as granted — not AI-modified1 . An apparatus for distributing gas comprising:
a body including a plurality of gas passages connected with a plurality of gas distribution holes for distributing processing gas; and at least one gas injection module connected with at least one lateral surface of the body and respectively communicated with the plurality of gas passages, wherein the gas injection module includes: a first gas buffering space for firstly buffering the processing gas supplied from the external; and a second gas buffering space for secondly buffering the processing gas firstly buffered in the first gas buffering space, and injecting the secondly buffered processing gas into the plurality of gas passages.
2 . The apparatus according to claim 1 , wherein the gas injection module includes:
a first gas buffering member provided with the first gas buffering space being communicated with at least one gas supply pipe, and connected with one lateral surface of the body; and a second gas buffering member communicated with the first gas buffering space, and provided with the second gas buffering space being communicated with the plurality of gas passages.
3 . The apparatus according to claim 2 , wherein the gas injection module further includes a sealing member for sealing a space between the first gas buffering member and the lateral surface of the body.
4 . The apparatus according to claim 2 , wherein the second gas buffering member is provided with a plurality of communication holes being communicated with the first gas buffering space.
5 . The apparatus according to claim 4 , wherein a diameter of each of the plurality of communication holes is gradually increased from the center of the body toward both ends of the body with respect to a longitudinal direction of the lateral surface of the body.
6 . The apparatus according to claim 4 , wherein an interval between the center of each of the adjacent communication holes is gradually decreased from the center of the body toward both ends of the body with respect to a longitudinal direction of the lateral surface of the body.
7 . The apparatus according to claim 2 , wherein,
the gas injection module further includes a gas injection member disposed inside the second gas buffering member, and connected with the lateral surface of the body so as to cover the plurality of gas passages being communicated with the second gas buffering space, and the gas injection member is provided with a plurality of gas injection holes for injecting the processing gas secondly buffered in the second gas buffering space into the plurality of gas passages.
8 . The apparatus according to claim 7 , wherein the gas injection hole is smaller than the gas passage.
9 . The apparatus according to claim 7 , wherein a diameter of each of the plurality of gas injection holes is gradually increased from the center of the body toward both ends of the body with respect to a longitudinal direction of the lateral surface of the body.
10 . The apparatus according to claim 7 , wherein the lateral surface of the body is provided with an insertion groove into which the gas injection member is to be inserted, and the gas injection member is inserted into and connected with the insertion groove while being detachably provided in the insertion groove.
11 . The apparatus according to claim 2 , wherein,
the plurality of gas passages are grouped into a plurality of gas passage groups, wherein each gas passage group includes the adjacent two or more gas passages, and the second gas buffering member includes a plurality of group buffering members which secondly buffer the processing gas supplied from the first gas buffering space and inject the secondly-buffered processing gas into the plurality of gas passage groups.
12 . The apparatus according to claim 1 , wherein the gas injection module includes:
a first gas injection module connected with one lateral surface of the body, wherein the first gas injection module includes first and second gas buffering spaces for injecting first processing gas into some of the gas passages among the plurality of gas passages, and a second gas injection module connected with the other lateral surface of the body in the opposite side of one lateral surface of the body, wherein the second gas injection module includes first and second gas buffering spaces for injecting second processing gas, which is the same as or different from the first processing gas, into the remaining gas passages among the plurality of gas passages.
13 . The apparatus according to claim 12 , wherein,
one side of each of some gas passages among the plurality of gas passages is communicated with the second gas buffering space of the first gas injection module, and the other side of each of some gas passages is closed, and one side of each of the remaining gas passages among the plurality of gas passages is closed, and the other side of each of the remaining gas passages is communicated with the second gas buffering space of the second gas injection module.
14 . The apparatus according to claim 12 , wherein,
the first gas injection module further includes a first gas injection member for injecting the first processing gas secondly buffered in the second gas buffering space into some of the gas passages among the plurality of gas passages, and the second gas injection module further includes a second gas injection member for injecting the second processing gas secondly buffered in the second gas buffering space into the remaining gas passages among the plurality of gas passages.
15 . The apparatus according to claim 1 , wherein the plurality of gas passages include:
a plurality of first gas passages provided at fixed intervals in parallel to a first longitudinal direction of the body; and a plurality of second gas passages disposed at a predetermined interval from the plurality of first gas passages in a thickness direction of the body, and provided at fixed intervals in parallel to a second longitudinal direction being perpendicular to the first longitudinal direction of the body.
16 . The apparatus according to claim 15 , wherein the gas injection module includes:
a first gas injection module connected with a first lateral surface of the body, wherein the first gas injection module includes the first and second gas buffering spaces for injecting first processing gas into one side of the plurality of first gas passages; a second gas injection module connected with a second lateral surface of the body in the opposite side of the first lateral surface, wherein the second gas injection module includes the first and second gas buffering spaces for injecting the first processing gas into the other side of the plurality of first gas passages; a third gas injection module connected with a third lateral surface of the body, wherein the first and second gas buffering spaces for injecting second processing gas, which is the same as or different from the first processing gas, into one side of the plurality of second gas passages; and a fourth gas injection module connected with a fourth lateral surface of the body in the opposite side of the third lateral surface, wherein the fourth gas injection module includes the first and second gas buffering spaces for injecting the second processing gas into the other side of the plurality of second gas passages.
17 . The apparatus according to claim 16 , wherein each of the first to fourth gas injection modules further includes a gas injection member with a plurality of gas injection holes for injecting the corresponding processing gas secondly buffered in the second gas buffering space into the corresponding gas passage.
18 . The apparatus according to claim 15 , wherein the gas injection module includes:
a first gas injection module connected with a first lateral surface of the body, wherein the first gas injection module includes the first and second gas buffering spaces for injecting first processing gas into some of first gas passages among a plurality of first gas passages; a second gas injection module connected with a second lateral surface of the body in the opposite side of the first lateral surface, wherein the second gas injection module includes the first and second gas buffering spaces for injecting second processing gas, which is the same as or different from the first processing gas, into the remaining first gas passages among the plurality of first gas passages; a third gas injection module connected with a third lateral surface of the body, wherein the third gas injection modules includes the first and second gas buffering spaces for injecting third processing gas, which is the same as or different from the second processing gas, into some of second gas passages among a plurality of second gas passages; and a fourth gas injection module connected with a fourth lateral surface of the body in the opposite side of the third lateral surface, wherein the fourth gas injection module includes the first and second gas buffering spaces for injecting fourth processing gas, which is the same as or different from the third processing gas, into the remaining second gas passages among the plurality of second gas passages.
19 . The apparatus according to claim 18 , wherein each of the first to fourth gas injection modules further includes a gas injection member with a plurality of gas injection holes for injecting the corresponding processing gas secondly buffered in the second gas buffering space into the corresponding gas passage.
20 . An apparatus for processing substrate comprising:
a processing chamber; a chamber lid for covering an upper side of the processing chamber; a substrate supporting means for supporting a substrate, the substrate supporting means provided inside the processing chamber; and a gas distribution means confronting the substrate supporting means, the gas distribution means connected with a lower surface of the chamber lid, wherein the gas distribution means includes an apparatus for distributing gas, wherein the apparatus for distributing gas includes: a body including a plurality of gas passages connected with a plurality of gas distribution holes for distributing processing gas; and at least one gas injection module connected with at least one lateral surface of the body and respectively communicated with the plurality of gas passages, wherein the gas injection module includes: a first gas buffering space for firstly buffering the processing gas supplied from the external; and a second gas buffering space for secondly buffering the processing gas firstly buffered in the first gas buffering space, and injecting the secondly buffered processing gas into the plurality of gas passages.Join the waitlist — get patent alerts
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