Reduced volume processing chamber

Abstract

Embodiments described herein generally relate to a processing chamber having a reduced volume for performing supercritical drying processes or other phase transition processes. The chamber includes a substrate support moveably disposed on a first track and a door moveably disposed on a second track. The substrate support and door may be configured to move independently of one another and the chamber may be configured to minimize vertical movement of the substrate within the chamber.

What is claimed is: 
     
         1 . A substrate processing apparatus, comprising:
 a processing chamber body having a liner and an insulation element formed in the chamber body, wherein the liner defines a processing volume;   a door slidably coupled to the chamber body, the door configured to move relative to the chamber body; and   a substrate support slidably coupled to the chamber body, wherein the substrate support is configured to move into and out of the processing volume, and wherein the substrate support is configured to move independently of the door.   
     
     
         2 . The apparatus of  claim 1 , wherein the liner has a thickness of about 2 mm to about 5 mm. 
     
     
         3 . The apparatus of  claim 1 , wherein the insulation element has a thickness between about 0.1 inches and about 1.0 inches. 
     
     
         4 . The apparatus of  claim 3 , wherein the insulation element is ceramic. 
     
     
         5 . The apparatus of  claim 1 , wherein a size of the processing volume is less than about 2 L. 
     
     
         6 . The apparatus of  claim 5 , further comprising a baffle plate disposed within the processing volume and coupled to an actuator to move the baffle plate within the processing volume. 
     
     
         7 . The apparatus of  claim 1 , wherein the substrate support and the door move laterally into and out of the chamber body. 
     
     
         8 . A substrate processing apparatus, comprising:
 a chamber body having an opening formed therein for ingress and egress from a processing volume defined by a liner of the chamber body;   a baffle plate disposed within the processing volume and coupled to an actuator to move the baffle plate within the processing volume;   a door slidably coupled to the chamber body, wherein the door is configured to translate between an open position and a closed position; and   a substrate support slidably coupled to the chamber body, wherein the substrate support is configured to translate independently of the door between a first position outside of the processing volume and a second position inside the processing volume.   
     
     
         9 . The apparatus of  claim 8 , wherein the liner has a thickness of about 2 mm to about 5 mm. 
     
     
         10 . The apparatus of  claim 8 , wherein the chamber body comprises an insulation element with a thickness between about 0.1 inches and about 1.0 inches. 
     
     
         11 . The apparatus of  claim 10 , wherein the insulation element is ceramic. 
     
     
         12 . The apparatus of  claim 8 , wherein a size of the processing volume is less than about 2 L. 
     
     
         13 . The apparatus of  claim 12 , further comprising a baffle plate disposed within the processing volume and coupled to an actuator to move the baffle plate within the processing volume. 
     
     
         14 . The apparatus of  claim 8 , wherein the substrate support is coupled to a first track and the door is coupled to one or more second tracks. 
     
     
         15 . The apparatus of  claim 8 , further comprising a pressure closure to urge the door against the chamber body. 
     
     
         16 . The apparatus of  claim 15 , wherein the pressure closure comprises an actuator. 
     
     
         17 . A substrate processing method, comprising:
 positioning a door in an open orientation relative to a chamber body;   positioning a substrate support in an open orientation relative to the chamber body;   positioning a substrate on the substrate support;   positioning a baffle plate over the substrate disposed on the substrate support;   sliding the substrate support into the chamber body; and   sliding the door to abut the chamber body, wherein the sliding the substrate support and the sliding the door are performed independently.   
     
     
         18 . The method of  claim 17 , further comprising urging the door against the chamber body to provide closure against elevated pressure. 
     
     
         19 . The method of  claim 18 , wherein urging the door against the chamber body comprises operating a pressure closure coupled to the chamber body. 
     
     
         20 . The method of  claim 19 , wherein operating the pressure closure coupled to the chamber body comprises operating an actuator coupled to the pressure closure.