Laser system

Abstract

The laser system may include a first laser apparatus configured to emit a first pulse laser beam, a second laser apparatus configured to emit a second pulse laser beam, a timing detector, and a controller. The timing detector may be configured to detect a first passage timing at which the first pulse laser beam passes a first position and a second passage timing at which the second pulse laser beam passes a second position. The controller may be configured to control a first trigger timing for the first laser apparatus to emit the first pulse laser beam and a second trigger timing for the second laser apparatus to emit the second pulse laser beam based on the first passage timing and the second passage timing.

1 . A laser system comprising:
 a first laser apparatus configured to emit a first pulse laser beam;   a second laser apparatus configured to emit a second pulse laser beam;   a timing detector; and   a controller, wherein   the timing detector is configured to detect a first passage timing at which the first pulse laser beam passes a first position and a second passage timing at which the second pulse laser beam passes a second position, and   the controller is configured to control a first trigger timing for the first laser apparatus to emit the first pulse laser beam and a second trigger timing for the second laser apparatus to emit the second pulse laser beam based on the first passage timing and the second passage timing.   
     
     
         2 . A laser system comprising:
 a first discharge-pumped laser apparatus configured to emit a first pulse laser beam;   a second discharge-pumped laser apparatus configured to emit a second pulse laser beam;   a timing detector; and   a controller, wherein   the timing detector is configured to detect a first timing of electric discharge occurred for emitting the first pulse laser beam from the first laser apparatus and detect a second timing of electric discharge occurred for emitting the second pulse laser beam from the second laser apparatus, and   the controller is configured to control a first trigger timing for the first laser apparatus to emit the first pulse laser beam and a second trigger timing for the second laser apparatus to emit the second pulse laser beam based on the first timing of electric discharge and the second timing of electric discharge.   
     
     
         3 . A laser system comprising:
 a first laser apparatus configured to emit a first pulse laser beam;   a second laser apparatus configured to emit a second pulse laser beam;   a timing detector;   a first optical path length adjuster;   a second optical path length adjuster; and   a controller, wherein   the timing detector is configured to detect a first passage timing at which the first pulse laser beam passes a first position and a second passage timing at which the second pulse laser beam passes a second position,   the first optical path length adjuster is provided in an optical path of the first pulse laser beam,   the second optical path length adjuster is provided in an optical path of the second pulse laser beam, and   the controller is configured to control the first optical path length adjuster and the second optical path length adjuster based on the first passage timing and the second passage timing.   
     
     
         4 . A laser system comprising:
 a first discharge-pumped laser apparatus configured to emit a first pulse laser beam;   a second discharge-pumped laser apparatus configured to emit a second pulse laser beam;   a timing detector;   a first optical path length adjuster;   a second optical path length adjuster; and   a controller, wherein   the timing detector is configured to detect a first timing of electric discharge occurred for emitting the first pulse laser beam from the first laser apparatus and detect a second timing of electric discharge occurred for emitting the second pulse laser beam from the second laser apparatus,   the first optical path length adjuster is provided in an optical path of the first pulse laser beam,   the second optical path length adjuster is provided in an optical path of the second pulse laser beam, and   the controller is configured to control the first optical path length adjuster and the second optical path length adjuster based on the first timing of electric discharge and the second timing of electric discharge.   
     
     
         5 . A laser system comprising:
 a first laser apparatus configured to emit a first pulse laser beam;   a second laser apparatus configured to emit a second pulse laser beam; and   a controller, wherein   the controller is configured to control a first trigger timing for the first laser apparatus to emit the first pulse laser beam and a second trigger timing for the second laser apparatus to emit the second pulse laser beam, such that a difference between a first emitting timing at which the first pulse laser beam is emitted from the laser system and a second emitting timing at which the second pulse laser beam is emitted from the laser system approaches a predetermined value.   
     
     
         6 . A laser system comprising:
 a first laser apparatus configured to emit a first pulse laser beam;   a second laser apparatus configured to emit a second pulse laser beam;   a first optical path length adjuster;   a second optical path length adjuster; and   a controller, wherein   the first optical path length adjuster is provided in an optical path of the first pulse laser beam,   the second optical path length adjuster is provided in an optical path of the second pulse laser beam, and   the controller is configured to control the first optical path length adjuster and the second optical path length adjuster, such that a difference between a first emitting timing at which the first pulse laser beam is emitted from the laser system and a second emitting timing at which the second pulse laser beam is emitted from the laser system approaches a predetermined value.   
     
     
         7 . The laser system according to  claim 5 , further comprising a beam combiner, wherein
 the beam combiner is provided such that the first pulse laser beam is made incident on the beam combiner in a first direction and the second pulse laser beam is made incident on the beam combiner in a second direction different from the first direction, and   the beam combiner is configured to emit the first pulse laser beam and the second pulse laser beam to a third direction.   
     
     
         8 . The laser system according to  claim 6 , further comprising a beam combiner, wherein
 the beam combiner is provided such that the first pulse laser beam is made incident on the beam combiner in a first direction and the second pulse laser beam is made incident on the beam combiner in a second direction different from the first direction, and,   the beam combiner is configured to emit the first pulse laser beam and the second pulse laser beam to a third direction.   
     
     
         9 . The laser system according to  claim 5 , further comprising a pulse waveform measuring device, wherein
 the pulse waveform measuring device is provided in optical paths of the first pulse laser beam and the second pulse laser beam, and   the controller is configured to control the first trigger timing and the second trigger timing based on the pulse waveform measured by the pulse waveform measuring device.   
     
     
         10 . The laser system according to  claim 6 , further comprising a pulse waveform measuring device, wherein
 the pulse waveform measuring device is provided in optical paths of the first pulse laser beam and the second pulse laser beam, and   the controller is configured to control the first optical path length adjuster and the second optical path length adjuster based on the pulse waveform measured by the pulse waveform measuring device.   
     
     
         11 . The laser system according to  claim 5 , further comprising a pulse waveform measuring device, wherein
 the pulse waveform measuring device is provided in optical paths of the first pulse laser beam and the second pulse laser beam, and   the controller is configured to control pulse energy of the first pulse laser beam and pulse energy of the second pulse laser beam based on the pulse waveform measured by the pulse waveform measuring device.   
     
     
         12 . The laser system according to  claim 6 , further comprising a pulse waveform measuring device, wherein
 the pulse waveform measuring device is provided in optical paths of the first pulse laser beam and the second pulse laser beam, and   the controller is configured to control pulse energy of the first pulse laser beam and pulse energy of the second pulse laser beam based on the pulse waveform measured by the pulse waveform measuring device.