US2017053780A1PendingUtilityA1

Target supply device, target material refining method, recording medium having target material refining program recorded therein, and target generator

Assignee: GIGAPHOTON INCPriority: Jun 30, 2014Filed: Nov 8, 2016Published: Feb 23, 2017
Est. expiryJun 30, 2034(~7.9 yrs left)· nominal 20-yr term from priority
H01J 37/32449H05G 2/00H05G 2/0035H05G 2/0023
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Claims

Abstract

A target supply device may be provided with a tank configured to contain a metal as a target material, a nozzle having a nozzle hole through which the target material is output from the tank, a filter disposed in a communication portion for conducting the target material from the tank to the nozzle hole, a temperature adjuster configured to change the temperature of the target material in the tank, and a controller controlling the temperature adjuster to change the temperature of the target material in the tank such that oxygen in the target material is precipitated as metal oxide.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A target supply device comprising:
 a tank configured to contain target material of metal;   a nozzle having a nozzle hole configured to output the target material from the tank;   a filter disposed in a communication portion for conducting the target material from the tank to the nozzle hole;   a temperature adjuster configured to change temperature of the target material in the tank; and   a controller configured to control the temperature adjuster to change the temperature of the target material in the tank so as to cause oxygen in the target material to precipitate as metal oxide.   
     
     
         2 . The target supply device as defined in  claim 1 , wherein the controller is configured to control the temperature adjuster to change the temperature of the target material in the tank for at least one time between a first temperature higher than a melting point of the target material and a second temperature lower than the first temperature. 
     
     
         3 . The target supply device as defined in  claim 2 , wherein the second temperature is lower than the melting point of the target material. 
     
     
         4 . A target supply device comprising:
 a tank configured to contain target material of metal;   a nozzle having a nozzle hole configured to output the target material from the tank;   a filter disposed in a communication portion for conducting the target material from the tank to the nozzle hole;   a temperature adjuster configured to change a temperature of the target material in the tank; and   a controller configured to control the temperature adjuster to changing the temperature of the target material in the tank for at least one time between a first temperature higher than a melting point of the target material and a second temperature lower than the first temperature while the target material is not contained between the filter and the nozzle hole.   
     
     
         5 . The target supply device as defined in  claim 4 , wherein the second temperature is lower than the melting point of the target material. 
     
     
         6 . A target supply device comprising:
 a tank configured to contain target material of metal;   a nozzle having a nozzle hole configured to output the target material from the tank;   a filter disposed in a communication portion for conducting the target material from the tank to the nozzle hole;   a temperature adjuster configured to change a temperature of the target material in the tank;   a gas exhauster configured to exhaust gas from the tank; and   a controller configured to control the temperature adjuster to change the temperature of the target material in the tank for at least one time between a first temperature higher than a melting point of the target material and a second temperature lower than the first temperature while the gas exhauster is controlled to set a pressure in the tank lower than an atmospheric pressure.   
     
     
         7 . The target supply device as defined in  claim 6 , wherein the second temperature is lower than the melting point of the target material. 
     
     
         8 . A target material refining method for refining a target material by use of a target generator and a temperature adjuster, the target generator having a tank configured to contain the target material of a metal, a nozzle having a nozzle hole configured to output the target material from the tank, and a filter disposed in a communication portion for conducting the target material from the tank to the nozzle hole, the temperature adjuster being configured to change a temperature of the target material in the tank, the target material refining method comprising steps of:
 causing oxygen in the target material to precipitate as metal oxide by changing the temperature of the target material in the tank by the temperature adjuster; and   filtrating the target material as being liquefied and containing the precipitated metal oxide through the filter.   
     
     
         9 . The target material refining method as defined in  claim 8 , wherein the step of causing oxygen in the target material to precipitate as metal oxide includes controlling the temperature adjuster to change the temperature of the target material in the tank for at least one time between a first temperature higher than a melting point of the target material and a second temperature lower than the first temperature. 
     
     
         10 . The target material refining method as defined in  claim 9 , wherein the second temperature is lower than the melting point of the target material. 
     
     
         11 . A recording medium configured to store a target material refining program in a computer readable manner, the target material refining program enabling a computer to execute operations for controlling the temperature adjuster in the target material refining method as defined in  claim 8 . 
     
     
         12 . A target generator configured to contain a target material that is solidified after refined by the target material refining method as defined in  claim 8 .

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