Template, imprint apparatus, imprint method and imprint apparatus management method

Abstract

According to the embodiments, a template in which a main pattern is placed on a pattern-formed surface of a template substrate, the main pattern being formed by a concave and convex pattern, the template substrate being transparent to an electromagnetic wave with a predetermined wavelength is provided. The template includes a first mark in which line-shaped first concave patterns and first convex patterns are alternately placed in a width direction on the pattern-formed surface. The first convex pattern includes a first light-blocking portion and a first translucent portion. The first light-blocking portion is a region including a first side surface in the width direction and being covered with a metal film. The first translucent portion is a region including a second side surface in the width direction and being not covered with the metal film.

What is claimed is: 
     
         1 . A template in which a main pattern is placed on a pattern-formed surface of a template substrate, the main pattern being formed by a concave and convex pattern, the template substrate being transparent to an electromagnetic wave with a predetermined wavelength, the template comprising:
 a first mark in which line-shaped first concave patterns and first convex patterns are alternately placed in a width direction on the pattern-formed surface, wherein   the first convex pattern including
 a first light-blocking portion that is a region including a first side surface in the width direction and being covered with a metal film, and 
 a first translucent portion that is a region including a second side surface in the width direction and being not covered with the metal film. 
   
     
     
         2 . The template according to  claim 1 , wherein a ratio of the first light-blocking portion, the first translucent portion, and the first concave pattern in the width direction is 2:1:1. 
     
     
         3 . The template according to  claim 2 , wherein a difference in height between the first concave pattern and the first convex pattern is set such that a phase difference between the electromagnetic wave passing through the first translucent portion and the electromagnetic wave passing through the first concave pattern is 90 degrees. 
     
     
         4 . The template according to  claim 1 , further comprising:
 a second mark in which line-shaped second concave patterns and second convex patterns are alternately placed in a width direction on the pattern-formed surface, wherein   the second convex pattern including
 a second light-blocking portion that is a region including a first side surface in the width direction and being covered with a metal film, and 
   a second translucent portion that includes a second side surface in the width direction and is not covered with the metal film, and   pitches in the first mark are different from pitches in the second mark in the width direction.   
     
     
         5 . The template according to  claim 4 , wherein an order of arrangement of the second concave pattern, the second light-blocking portion, and the second translucent portion is different from an order of arrangement of the first concave pattern, the first light-blocking portion, and the first translucent portion in the first mark. 
     
     
         6 . The template according to  claim 4 , wherein a ratio of the second light-blocking portion, the second translucent portion, and the second concave pattern in the width direction is 2:1:1. 
     
     
         7 . The template according to  claim 6 , wherein a difference in height between the second concave pattern and the second convex pattern is set such that a phase difference between the electromagnetic wave passing through the second translucent portion and the electromagnetic wave passing through the second concave pattern is 90 degrees. 
     
     
         8 . The template according to  claim 4 , wherein the first mark is adjacent to the second mark. 
     
     
         9 . The template according to  claim 1 , wherein the first mark is placed at an outer periphery of a region in which the main pattern is placed. 
     
     
         10 . The template according to  claim 1 , wherein the first mark is placed in a region in which the main pattern is not placed. 
     
     
         11 . The template according to  claim 1 , wherein the first mark is used also as a misalignment-correcting alignment mark. 
     
     
         12 . An imprint apparatus comprising:
 a substrate stage that holds a substrate to be processed, the substrate including a first mark;   a template stage that faces the substrate stage and holds a template including a second mark;   a moving mechanism that relatively moves the substrate stage and the template stage in an in-plane direction and in a height direction; and   an alignment scope that puts the first mark and the second mark in a field of view and receives a diffracted light, the diffracted light being obtained by irradiating the first mark and the second mark with an electromagnetic wave with a predetermined wavelength, wherein   the alignment scope including
 a light source that emits the electromagnetic wave, 
 a projection optical system that includes a first light input and output unit and a second light input and output unit, and forms light paths being through the first and second marks between the first light input and output unit and the second light input and output unit, 
   a light reception sensor that receives the diffracted light, and   a switching unit that switches a state between a first state and a second state, the first state being a state in which the light source is placed on a light path formed by the first light input and output unit and the light reception sensor is placed on a light path formed by the second light input and output unit, and the second state being a state in which the light reception sensor is placed on the light path formed by the first light input and output unit, and the light source is placed on the light path formed by the second light input and output unit.   
     
     
         13 . An imprint method comprising:
 aligning a first mark of a substrate to be processed with a second mark of a template;   placing a first light source on a first light path and placing a first light reception sensor on a second light path in an alignment scope, the alignment scope forming the first light path and the second light path,   the first light path through which an electromagnetic wave with a predetermined wavelength is led to the aligned first and second marks from a direction of a first-order diffraction angle, the first-order diffraction angle being an angle of a first-order diffracted light when the first and second marks are irradiated with the electromagnetic wave from a direction perpendicular to the first and second marks, the second light path through which a first diffracted light is led, the first diffracted light vertically being diffracted at the aligned first and second marks;   receiving the first diffracted light from the first and second marks with the first light reception sensor, the first diffracted light being obtained by emitting the electromagnetic wave from the first light source;   correcting misalignment between the template and the substrate to be processed using the first diffracted light;   aligning the first mark with a third mark of the template;   placing a second light source on the second light path and placing a second light reception sensor on the first light path in the alignment scope;   receiving a second diffracted light from the first and third marks with the second light reception sensor, the second diffracted light being obtained by emitting the electromagnetic wave from the second light source;   calculating a template height at the third mark from an intensity of the received second diffracted light; and   adjusting a pressure at which a reverse surface of the template is pressurized based on the template height.   
     
     
         14 . The imprint method according to  claim 13 , wherein, in a case that a plurality of third marks exists, the receiving a second diffracted light and the calculating a template height are performed for all of the third mark 
     
     
         15 . The imprint method according to  claim 13 , wherein
 the third mark includes a pattern, the pattern giving a priority to one first-order diffracted light over the other first-order diffracted light of ±first-order diffracted lights diffracted at the third mark, and   the calculating of the template height includes
 measuring a signal intensity of the second diffracted light diffracted at the aligned first and third marks while a predetermined distance is placed between the template and the substrate to be processed, and 
 finding the template height corresponding to the measured signal intensity with reference to information indicating a relationship between a height of a pattern-formed surface of the template from a template stage and the signal intensity of the second diffracted light. 
   
     
     
         16 . The imprint method according to  claim 13 , wherein
 the third mark includes a first pattern giving a priority to one first-order diffracted light over the other first-order diffracted light of ±first-order diffracted lights diffracted at the third mark, and a second pattern giving a priority to the other first-order diffracted light over the one first-order diffracted light,   in the receiving of the second diffracted light, a first process and a second process are conducted while the distance between the template and the substrate to be processed is changed, the first process being a process receiving the second diffracted light when the first mark and the first pattern are irradiated with the electromagnetic wave, the second process being a process receiving the second diffracted light when the first mark and the second pattern are irradiated with the electromagnetic wave, and   the calculating of the template height includes
 calculating first signal intensity and second signal intensity of the second diffracted light corresponding to the distance, the first signal intensity being obtained in the first process, the second signal intensity being obtained in the second process, 
 calculating the distance at which the first signal intensity is identical to the second signal intensity, and 
 finding the template height corresponding to the distance at which the first signal intensity is identical to the second signal intensity. 
   
     
     
         17 . The imprint method according to  claim 13 , wherein
 the third mark includes line-shaped first concave patterns and first convex patterns that are alternately placed in a width direction,   the first convex pattern includes:
 a first light-blocking portion that is a region including a first side surface in the width direction and being covered with a metal film; and 
 a first translucent portion that includes a second side surface in the width direction and is not covered with the metal film, 
   a ratio of the first light-blocking portion, the first translucent portion, and the first concave pattern in the width direction is 2:1:1, and   a difference in height between the first concave pattern and the first convex pattern is set such that a phase difference between the electromagnetic wave passing through the first translucent portion and the   electromagnetic wave passing through the first concave pattern is 90 degrees.   
     
     
         18 . The imprint method according to  claim 13 , wherein, in the placing of the second light source and the second light reception sensor, the first light source placed on the first light path is placed on the second light path and is used as the second light source, the first light reception sensor placed on the second light path is placed on the first light path and is used as the second light reception sensor. 
     
     
         19 . The imprint method according to  claim 10 , wherein, in the placing of the second light source and the second light reception sensor, the first light source and the first light reception sensor are switched while a substrate stage that holds the substrate to be processed is stationary. 
     
     
         20 . An imprint apparatus management method, the method comprising:
 holding a template on a template stage in an imprint apparatus;   aligning a first mark of a substrate to be processed with a second mark of the template;   placing a light source on a first light path and placing a light reception sensor on a second light path in an alignment scope, the alignment scope forming the first light path and the second light path, the first light path through which an electromagnetic wave with a predetermined wavelength is led to the first and second marks from a direction perpendicular to the aligned first and second marks, the second light path through which a diffracted light is led, the diffracted light being obtained by diffracting the electromagnetic wave in a direction of a first-order diffraction angle at the aligned first and second marks, the electromagnetic wave being emitted from the perpendicular direction;   emitting the electromagnetic wave from the light source,   receiving the diffracted light from the aligned first and second marks with the light reception sensor;   calculating a template height at the second mark from an intensity of the diffracted light; and   outputting expected maintenance time information in accordance with temporal change of the template height, the expected maintenance time information indicating a time for maintenance of the template stage.