Method for preparing solid state nanopores

Abstract

The application relates to methods of forming arrays of solid state nanopores. A substrate is provided having an array of apertures extending through the substrate. The substrate is oxidized so that an oxide layer is formed on the substrate. The formation of the oxide layer reduces the cross-sectional dimensions of the apertures. This method is useful for producing arrays of nanopores having controlled dimensions.

What is claimed is: 
     
         1 . A method for forming an array of nanopores comprising:
 a) providing a substrate comprising an array of apertures extending therethrough, each of the apertures having one or more cross-sectional dimension; and   b) oxidizing the substrate whereby an oxide layer is formed on the substrate and whereby the formed oxide lowers one or more cross sectional dimensions of the apertures to 20 nm or less.   
     
     
         2 . The method of  claim 1  wherein in step (b) the formed oxide lowers the aperture dimensions to 10 nm or less. 
     
     
         3 . The method of  claim 1  wherein in step (b) the formed oxide lowers the aperture dimensions to 5 nm or less. 
     
     
         4 . The method of  claim 1  wherein in step (b) the formed oxide lowers the aperture dimensions to 1 nm or less. 
     
     
         5 . The method of  claim 1  wherein the substrate comprises a metal. 
     
     
         6 . The method of  claim 1  wherein the substrate comprises silicon. 
     
     
         7 . The method of  claim 1  wherein the substrate comprises aluminum. 
     
     
         8 . The method of  claim 1  wherein the oxidizing comprises thermal, plasma, or electrochemical oxidation. 
     
     
         9 . The method of  claim 8  wherein thermal oxidation is carried out with agents comprising chromates, cerates, permanganates, titanium or zirconium oxides, lithium salts, or molybdates. 
     
     
         10 . The method of  claim 8  wherein plasma oxidation is carried out with an oxygen or ozone plasma. 
     
     
         11 . The method of  claim 1  wherein the cross-sectional dimension after the oxidizing step is from about 1% to about 75% of the original cross-sectional dimension. 
     
     
         12 . The method of  claim 1  wherein the cross-sectional dimension after the oxidizing step is from about 5% to about 50% of the original cross-sectional dimension. 
     
     
         13 . The method of  claim 1  wherein the shapes of the apertures are circular, elliptical, square, or slits. 
     
     
         14 . The method of  claim 1  wherein apertures have a cross-sectional shape that is a circle, and the cross-sectional dimension is the diameter of the circle. 
     
     
         15 . The method of  claim 1  wherein the original cross-sectional dimension is from about 500 nm and 20 nm, and the cross-sectional dimension after the oxidizing step is from about 100 nm to about 1 nm. 
     
     
         16 . The method of  claim 1  wherein the original apertures are formed using photolithography and etching.