Cleaning solution, cleaning facility and method of cleaning mount substrate

Abstract

A method of cleaning a mount substrate comprising the step of: preparing a cleaning solution and cleaning the mount substrate by using the cleaning solution. The cleaning solution is a chemical solution produced by providing organic amine as a content in a hydrocarbon-based solvent containing a ketone or an aromatic and by adding unsaturated carboxylic acid anhydride or carboxylic anhydride to this solvent.

What is claimed is: 
     
         1 . An anhydrous cleaning solution produced by providing organic amine as a content in a hydrocarbon-based solvent containing at least one of a ketone, an aromatic, or a ketone and an aromatic, and by adding at least one of unsaturated carboxylic acid anhydride, carboxylic anhydride, or unsaturated carboxylic acid anhydride and carboxylic anhydride to this solvent. 
     
     
         2 . The anhydrous cleaning solution according to  claim 1 , wherein the organic amine is at least one of a secondary organic amine, a tertiary organic amine, or a secondary and a tertiary organic amine 
     
     
         3 . The anhydrous cleaning solution according to  claim 1 , wherein the organic amine is at least one of diethanolamine, trimethylamine, or diethanolamine and trimethylamine. 
     
     
         4 . The anhydrous cleaning solution according to  claim 1 , wherein the unsaturated carboxylic acid anhydride is at least one of abietic anhydride, neoabietic anhydride, or abietic and neoabietic anhydride. 
     
     
         5 . The anhydrous cleaning solution according to  claim 1 , wherein the carboxylic anhydride is at least one of formic acid, acetic anhydride, valeric anhydride, or any combination of the three.