US2016312346A1PendingUtilityA1
Persulfate bath and method for chemically depositing a layer
Est. expiryDec 12, 2033(~7.4 yrs left)· nominal 20-yr term from priority
Y02E10/541H10F 71/125C23C 2/04Y02P70/50Y02E10/543C23C 18/1216C23C 18/1204
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Claims
Abstract
A chemical bath for depositing a layer made from at least metal and sulphur is described. A method for depositing such a layer is also presented. The bath comprises, in solution: a metal salt comprising a metal chosen from at least one of the elements from groups BIB and MA of the periodic table; and a sulphur precursor. The bath further comprises a persulfate compound.
Claims
exact text as granted — not AI-modified1 . A chemical bath for depositing a layer based on at least metal and sulfur, the chemical bath comprising, in solution:
a metal salt comprising a metal selected from among at least one of the elements of groups IIB and IIIA of the periodic table; and a sulfur precursor; wherein the chemical bath further comprises a persulfate compound.
2 . The chemical bath according to claim 1 , wherein the persulfate compound is from a group consisting of ammonium persulfate of chemical formula (NH 4 ) 2 S 2 O 8 , sodium persulfate of chemical formula Na 2 S 2 O 8 , and potassium persulfate of chemical formula K 2 S 2 O 8 .
3 . The chemical bath according to claim 1 , wherein a concentration between 10 −5 mol/L and 10 mol/L of persulfate is provided in the chemical bath, for a concentration between 0.05 mol/L and 1 mol/L of sulfur precursor.
4 . The chemical bath according to claim 3 , wherein the metal salt is in a solution selected from among: zinc sulfate, zinc acetate, and zinc chloride, at a concentration between 0.01 mol/L and 1 mol/L.
5 . The chemical bath according to claim 3 , further comprising an ammonia solution at a concentration between 0.1 mol/L and 10 mol/L.
6 . The chemical bath according to claim 1 , wherein the sulfur precursor is in a solution of thiourea CS(NH 2 ) 2 .
7 . The chemical bath according to claim 1 , wherein the metal is an element from column IIB.
8 . The chemical bath according to claim 7 , wherein the metal is zinc.
9 . A method for chemically depositing a layer based on at least metal and sulfur, the method comprising:
depositing, in a solution in a chemical bath, a metal salt comprising a metal selected from among at least one of the elements of groups IIB and IIIA of the periodic table; and depositing, in the solution in the chemical bath, a sulfur precursor; wherein a persulfate compound is further provided in said chemical bath.
10 . The method of claim 9 , wherein the layer is based on a metal sulfide.
11 . The method of claim 9 , wherein the layer is based on a metal oxysulfide.
12 . The method of claim 9 , wherein the temperature of the chemical bath during deposition is between 40° C. and 100° C.
13 . The method of claim 9 , wherein the layer based on metal and sulfur is deposited on a layer having photovoltaic properties, said layer having photovoltaic properties forming an absorber of a thin-film solar cell.
14 . The method of claim 13 , wherein the absorber is based on a chalcopyrite compound among Cu(In,Ga)(S,Se) 2 , Cu 2 (Zn, Sn)(S, Se) 4 , and their derivatives.Join the waitlist — get patent alerts
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