Electrochemical reaction apparatus

Abstract

An electrochemical reactor includes an adjustable electric field shaping capability during electroplating. The electrochemical reactor includes a reservoir configured to retain an electrolytic solution; a cathode and an anode disposed in the reservoir to form electric field lines passing through the electrolytic solution. Either the cathode or the anode includes a workpiece holder. A shield attaches to the cathode or the anode without the workpiece holder. The shield includes a surface configured to block a portion of the electric field lines, and a conduit positioned on the surface and configured to concentrate the electric field lines within the conduit. The conduit includes a protruding portion including a height measured from the surface to a top surface of the conduit, and an aperture penetrating the protruding portion and passing through the surface. The aperture is configured to allow the electric field lines to pass through the conduit.

What is claimed is: 
     
         1 . An electrochemical reactor comprising an adjustable electric field shaping capability during electroplating, comprising:
 a reservoir configured to retain an electrolytic solution;   a cathode and an anode disposed in the reservoir to form electric field lines passing through the electrolytic solution, wherein either the cathode or the anode includes a workpiece holder; and   a shield attached to the cathode or the anode without the workpiece holder, the shield comprising:
 a surface configured to block a portion of the electric field lines; and 
 a conduit positioned on the surface, and configured to concentrate the electric field lines within the conduit, wherein the conduit comprises:
 a protruding portion including a height measured from the surface to a top surface of the conduit; and 
 an aperture penetrating the protruding portion and passing through the surface, and the aperture configured to allow the electric field lines to pass through the conduit. 
 
   
     
     
         2 . The electrochemical reactor of  claim 1 , further comprising an electrode holder configured to fasten the cathode or the anode. 
     
     
         3 . The electrochemical reactor of  claim 2 , wherein the electrode holder comprises a fixing member configured to have the shield being replaceably fastened on to the electrode holder. 
     
     
         4 . The electrochemical reactor of  claim 2 , wherein at least a part of the cathode or the anode is exposed by the electrode holder and entirely covered by the surface except at the aperture. 
     
     
         5 . The electrochemical reactor of  claim 1 , wherein the shield is made of a dielectric material. 
     
     
         6 . The electrochemical reactor of  claim 1 , wherein the surface is parallel with a surface of the workpiece holder. 
     
     
         7 . The electrochemical reactor of  claim 1 , wherein the aperture comprises a square, a circle, an oval, a polygonal, or an irregular shape. 
     
     
         8 . The electrochemical reactor of  claim 1 , wherein the shield comprises a plurality of the conduits. 
     
     
         9 . An electrochemical reactor comprising a capability for adjusting an electric field distribution during electroplating, the electrochemical reactor comprising:
 a reservoir configured to retain an electrolytic solution;   a cathode and an anode disposed in the reservoir to form electric field lines passing through the electrolytic solution, wherein either the cathode or the anode comprises a workpiece holder; and   a shield in contact with the cathode or the anode without the workpiece holder, the shield configured to adjust a uniformity of the electric field lines reaching a workpiece disposed on the workpiece holder; wherein the shield comprising:
 a surface configured to block a portion of the electric field lines; and 
 a conduit coupled to the surface and configured to concentrate the electric field lines passing through an aperture, the conduit comprising a height measured from the surface to a top surface of the conduit. 
   
     
     
         10 . The electrochemical reactor of  claim 9 , further comprising an electrode holder configured to clasp the cathode or the anode. 
     
     
         11 . The electrochemical reactor of  claim 10 , wherein the electrode holder comprises a fixing member configured to be inserted by the shield replaceably on the electrode holder. 
     
     
         12 . The electrochemical reactor of  claim 10 , wherein at least a part of the cathode or the anode is exposed by the electrode holder and entirely covered by the surface except at the aperture. 
     
     
         13 . The electrochemical reactor of  claim 9 , wherein the conduit comprises a thickness measured from an outer surface to an inner surface of the conduit. 
     
     
         14 . The electrochemical reactor of  claim 9 , wherein the conduit comprises an inner surface orthogonal to the surface. 
     
     
         15 . The electrochemical reactor of  claim 9 , wherein the conduit comprises an inner surface tilted at an angle with respect to the surface. 
     
     
         16 . The electrochemical reactor of  claim 9 , wherein the aperture comprises a square, a circle, an oval, a polygonal, or an irregular shape. 
     
     
         17 . An electrochemical reactor comprising a capability for adjusting an electric field distribution during electroplating, the electrochemical reactor comprising:
 a reservoir configured to retain an electrolytic solution;   a cathode and an anode disposed in the reservoir to form electric field lines passing through the electrolytic solution, wherein the cathode comprises a workpiece holder; and   a shield positioned at the anode configured to adjust a uniformity of the electric field lines reaching a workpiece disposed on the workpiece holder, and the shield comprising:
 a surface configured to block a portion of the electric field lines, and 
 a conduit connected to the surface and configured to channel the electric field lines through an aperture, wherein the conduit comprises a height measured from the surface to a top surface of the conduit. 
   
     
     
         18 . The electrochemical reactor of  claim 17 , wherein the shield is replaceably disposed at the anode. 
     
     
         19 . The electrochemical reactor of  claim 17 , wherein a part of the anode from which the electric field lines are formed is entirely covered by the surface except at the aperture. 
     
     
         20 . The electrochemical reactor of  claim 17 , wherein the conduit comprises a plurality of apertures.