Organic electroluminescent device and method for preparing the same, and display apparatus

Abstract

An electroluminescent device and a method for preparing the same, and a display apparatus are disclosed. The organic electroluminescent device comprises a substrate ( 1 ) and a cover plate ( 2 ) disposed opposite to each other; an electroluminescent structure ( 3 ) disposed between the substrate ( 1 ) and the cover plate ( 2 ); and a barrier wall ( 4 ) for blocking water and oxygen, which is located around the electroluminescent structure ( 3 ) and forms a closed ring structure. The barrier wall ( 4 ) for blocking water and oxygen is located between the substrate ( 1 ) and the cover plate ( 2 ), is assembled with the substrate ( 1 ) and the cover plate ( 2 ) in a sealing manner to form a sealed space ( 6 ), and comprises a plurality of barrier layers ( 41 ) for blocking water and oxygen with an interval therebetween, the barrier layers ( 41 ) being made of an inorganic material; a sealant ( 5 ) is provided between each two adjacent barrier layer ( 41 ) for blocking water and oxygen to connect the substrate ( 1 ) and the cover plate ( 2 ). The organic electroluminescent device can effectively block water and oxygen and reduce permeability of water and oxygen so as to increase its lifetime.

1 . An organic electroluminescent device comprising:
 a substrate;   a cover plate disposed opposite to the substrate;   an electroluminescent structure disposed on the substrate and located between the substrate and the cover plate; and   a barrier wall configured for blocking water and oxygen, which is located around the electroluminescent structure and forms a closed ring structure,   wherein:   the barrier wall configured for blocking water and oxygen is located between the substrate and the cover plate and is assembled with the substrate and the cover plate in a sealing manner to form a sealed space in which the electroluminescent structure is disposed; the barrier wall configured for blocking water and oxygen comprises a plurality of barrier layers for blocking water and oxygen with an interval therebetween, the barrier layers being made of an inorganic material; and a sealant is provided between each two adjacent barrier layers for blocking water and oxygen to connect the substrate and the cover plate.   
     
     
         2 . The organic electroluminescent device according to  claim 1 , wherein the inorganic material is selected from the group consisting of SiO 2 , SiN x , and Al 2 O 3 . 
     
     
         3 . The organic electroluminescent device according to  claim 1 , wherein a distance between a side surface of the substrate facing the cover plate and a side surface of the cover plate facing the substrate is 0.01 to 10 μm. 
     
     
         4 . The organic electroluminescent device according to  claim 1 , wherein each of the barrier layers for blocking water and oxygen has a thickness of 0.01 to 200 μm. 
     
     
         5 . The organic electroluminescent device according to  claim 1 , wherein a distance between two opposite side surfaces of each two adjacent barrier layers for blocking water and oxygen is 0.01 to 200 μm. 
     
     
         6 . A method for preparing the organic electroluminescent device according to  claim 1 , comprising:
 forming an inorganic film on one of the substrate and the cover plate and forming the inorganic film into a pattern of the barrier wall for blocking water and oxygen by a patterning process, wherein the barrier wall for blocking water and oxygen forms the closed ring structure and comprises the plurality of barrier layers for blocking water and oxygen with an interval therebetween;   filling up a space between each two adjacent barrier layers for blocking water and oxygen with the sealant; and   packaging the substrate and the cover plate such that the barrier wall for blocking water and oxygen is assembled with the substrate and the cover plate in a sealing manner to form the sealed space.   
     
     
         7 . The preparation method according to  claim 6 , further comprising:
 preparing the organic electroluminescent structure on the substrate and within a region corresponding to the closed ring structure.   
     
     
         8 . The preparation method according to  claim 6 , wherein the inorganic film has a thickness of 0.01 to 10 μm. 
     
     
         9 . The preparation method according to  claim 6 , wherein a distance between two opposite side surfaces of each two adjacent barrier layers for blocking water and oxygen is 0.01 to 200 μm. 
     
     
         10 . The preparation method according to  claim 6 , wherein the inorganic film is formed by a process selected from the group consisting of plasma enhanced chemical vapor deposition, atomic layer deposition, and a plasma sputtering method. 
     
     
         11 . The preparation method according to  claim 6 , wherein the material of the inorganic film is selected from the group consisting of SiO 2 , SiN x , and Al 2 O 3 . 
     
     
         12 . The preparation method according to  claim 6 , wherein a distance between a side surface of the substrate facing the cover plate and a side surface of the cover plate facing the substrate is 0.01 to 10 μm. 
     
     
         13 . A display apparatus comprising the organic electroluminescent device according to  claim 1 . 
     
     
         14 . The organic electroluminescent device according to  claim 2 , wherein a distance between a side surface of the substrate facing the cover plate and a side surface of the cover plate facing the substrate is 0.01 to 10 μm. 
     
     
         15 . The organic electroluminescent device according to  claim 2 , wherein each of the barrier layers for blocking water and oxygen has a thickness of 0.01 to 200 μm. 
     
     
         16 . The organic electroluminescent device according to  claim 2 , wherein a distance between two opposite side surfaces of each two adjacent barrier layers for blocking water and oxygen is 0.01 to 200 μm. 
     
     
         17 . The preparation method according to  claim 7 , wherein the inorganic film has a thickness of 0.01 to 10 μm. 
     
     
         18 . The preparation method according to  claim 7 , wherein a distance between two opposite side surfaces of each two adjacent barrier layers for blocking water and oxygen is 0.01 to 200 μm. 
     
     
         19 . The preparation method according to  claim 7 , wherein the inorganic film is formed by a process selected from the group consisting of plasma enhanced chemical vapor deposition, atomic layer deposition, and a plasma sputtering method. 
     
     
         20 . The preparation method according to  claim 7 , wherein the material of the inorganic film is selected from the group consisting of SiO 2 , SiN x , and Al 2 O 3 .