US2016258684A1PendingUtilityA1
Purification of a metalloid by consumable electrode vacuum arc remelt process
Est. expiryAug 26, 2031(~5.1 yrs left)· nominal 20-yr term from priority
Inventors:Raymond J. Roberts
C01B 33/037Y02P20/129C30B 29/06F27B 14/06F27B 14/14F27B 2014/068C30B 11/003
56
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Claims
Abstract
A metalloid such as silicon in the form of a preheated solid electrode is purified by a CEVAR purification process by producing an ingot with controlled heating and cool down after the preheated electrode is melted in a CEVAR furnace system using a short CEVAR open-bottomed crucible.
Claims
exact text as granted — not AI-modified1 . A CEVAR furnace system for producing a purified silicon ingot from a silicon electrode, the CEVAR furnace system comprising:
a silicon electrode heating apparatus for preheating the silicon electrode to form a preheated silicon electrode; a gas-tight CEVAR furnace chamber; a short CEVAR open-bottomed crucible for containment of an arc zone from a CEVAR purification process melting the preheated silicon electrode, the short CEVAR open-bottomed crucible disposed in the gas-tight CEVAR furnace chamber; a preheated silicon electrode drive system for lowering the preheated silicon electrode within the short CEVAR open-bottomed crucible as a lower end of the preheated silicon electrode melts in the CEVAR purification process; an ingot heating apparatus disposed adjacent to the open bottom of the short CEVAR open-bottomed crucible through which the purified silicon ingot formed in the CEVAR purification process passes; an ingot heating controller for controlling the ingot heating apparatus to provide a temperature-controlled thermal environment for the purified silicon ingot passing through the ingot heating apparatus; and an ingot withdrawal drive system for alternatively withdrawing the purified silicon ingot from the short CEVAR open-bottomed crucible at a vertical growth rate of the purified silicon ingot during steady state of the CEVAR purification process or raising the short CEVAR open-bottomed crucible, the silicon electrode and the ingot heating apparatus at the vertical growth rate of the purified silicon ingot during steady state of the CEVAR purification process.
2 . The CEVAR furnace system of claim 1 wherein an interior height of the short CEVAR opened-bottom crucible is at least 60 percent and less than 120 percent of a diameter of the purified silicon ingot formed in the CEVAR purification process.
3 . The CEVAR furnace system of claim 1 further comprising a vacuum lock chamber connected between the silicon electrode heating apparatus and the short CEVAR opened-bottom crucible in the gas-tight CEVAR furnace chamber to prevent exposure to air of the preheated silicon electrode during transfer from the silicon electrode heating apparatus to the gas-tight CEVAR furnace chamber.
4 . The CEVAR furnace system of claim 3 wherein the silicon electrode heating apparatus comprises a resistance furnace.
5 . The CEVAR furnace system of claim 1 further comprising an auxiliary electrode heater disposed within the gas-tight CEVAR furnace chamber to heat the preheated silicon electrode during the CEVAR purification process.
6 . The CEVAR furnace system of claim 1 further comprising a thermal insulation disposed around the preheated silicon electrode in the gas-tight CEVAR furnace chamber.
7 . The CEVAR furnace system of claim 6 wherein the thermal insulation comprises a carbon fiber insulating material.
8 . The CEVAR furnace system of claim 1 , the base having a contour for interlocking contact with the bottom of the purified silicon ingot.
9 . The CEVAR furnace system of claim 1 , the short CEVAR opened-bottom crucible having an interior wall with a rectangular cross section, the interior height of the short CEVAR opened-bottom crucible being at least 60 percent and less than 120 percent of the length of a rectangular side of the purified silicon ingot formed in the CEVAR purification process.
10 . The CEVAR furnace system of claim 1 , the ingot withdrawal drive system further comprising a base upon which the bottom of the purified silicon ingot sits and a drive actuator connected to the base to control the rate of withdrawing of the purified silicon ingot from the short CEVAR open-bottomed crucible.
11 . The CEVAR furnace system of claim 10 further comprising a DC power source having a first output and a second output connected respectively between the preheated silicon electrode and the base or the drive actuator.
12 . The CEVAR furnace system of claim 1 further comprising a continuous preheated silicon electrode furnace charging apparatus for forming the purified silicon ingot with the CEVAR furnace system as a continuous purified silicon ingot.
13 . A CEVAR furnace system for producing a purified silicon ingot from a silicon electrode, the CEVAR furnace system comprising:
a gas-tight CEVAR furnace chamber; a silicon electrode heating apparatus disposed within the gas-tight CEVAR furnace chamber for preheating the silicon electrode to form a preheated silicon electrode; a short CEVAR open-bottomed crucible for containment of an arc zone from a CEVAR purification process melting the preheated silicon electrode, the short CEVAR open-bottomed crucible disposed in the gas-tight CEVAR furnace chamber; a preheated silicon electrode drive system for lowering the preheated silicon electrode within the short CEVAR open-bottomed crucible as a lower end of the preheated silicon electrode melts in the CEVAR purification process; an ingot heating apparatus disposed adjacent to the open bottom of the short CEVAR open-bottomed crucible through which the purified silicon ingot formed in the CEVAR purification process passes; an ingot heating controller for controlling the ingot heating apparatus to provide a temperature-controlled thermal environment for the purified silicon ingot passing through the ingot heating apparatus; and an ingot withdrawal drive system for alternatively withdrawing the purified silicon ingot from the short CEVAR open-bottomed crucible at a vertical growth rate of the purified silicon ingot during a steady state of the CEVAR purification process or raising the short CEVAR open-bottomed crucible, the silicon electrode and the ingot heating apparatus at the vertical growth rate of the purified silicon ingot during the steady state of the CEVAR purification process.
14 . The CEVAR furnace system of claim 13 wherein an interior height of the short CEVAR opened-bottom crucible is at least 60 percent and less than 120 percent of a diameter of the purified silicon ingot formed in the CEVAR purification process.
15 . The CEVAR furnace system of claim 13 further comprising a thermal insulation disposed around the preheated silicon electrode in the gas-tight CEVAR furnace chamber.
16 . The CEVAR furnace system of claim 15 wherein the thermal insulation comprises a carbon fiber insulating material.
17 . The CEVAR furnace system of claim 13 , the base having a contour for interlocking contact with the bottom of the purified silicon ingot.
18 . The CEVAR furnace system of claim 13 , the short CEVAR opened-bottom crucible having an interior wall with a rectangular cross section, the interior height of the short CEVAR opened-bottom crucible being at least 60 percent and less than 120 percent of the length of a rectangular side of the purified silicon ingot formed in the CEVAR purification process.
19 . The CEVAR furnace system of claim 13 , the ingot withdrawal drive system further comprising a base upon which the bottom of the purified silicon ingot sits and a drive actuator connected to the base to control the rate of withdrawing of the purified silicon ingot from the short CEVAR open-bottomed crucible.
20 . The CEVAR furnace system of claim 19 further comprising a DC power source having a first output and a second output connected respectively between the preheated silicon electrode and the base or the drive actuator.Join the waitlist — get patent alerts
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