Substrate processing apparatus, substrate processing system, and substrate processing method

Abstract

A top plate when located at a first position is held by an opposing-member holder, and the top plate when located at a second position is held by a substrate holder and rotated along with the substrate holder. In a substrate processing apparatus, a first processing liquid nozzle located at a supply position inside a to-be-held part of the top plate supplies a first processing liquid through an opposing-member opening to a substrate and is moved from the supply position to its retracted position, and a second processing liquid nozzle is moved from its retracted position to the supply position and supplies a second processing liquid through the opposing-member opening to the substrate. This configuration suppresses or prevents mixture of multiple types of processing liquids, as compared with the case where multiple types of processing liquids are sequentially supplied from a single processing liquid nozzle.

1 . A substrate processing apparatus for processing a substrate, comprising:
 a substrate holder for holding a substrate in a horizontal position;   an opposing member that opposes an upper surface of said substrate and has an opposing-member opening in a central part;   an opposing-member conveying mechanism for holding said opposing member and moving said opposing member relative to said substrate holder between a first position and a second position in an up-down direction;   a first processing liquid supply part for supplying a first processing liquid through a first processing liquid nozzle to said upper surface of said substrate;   a second processing liquid supply part for supplying a second processing liquid through a second processing liquid nozzle to said upper surface of said substrate;   a nozzle moving mechanism for individually moving said first processing liquid nozzle and said second processing liquid nozzle, specifically, moving said first processing liquid nozzle between a supply position above said opposing-member opening and a first retracted position around said substrate holder and moving said second processing liquid nozzle between said supply position and a second retracted position around said substrate holder;   a substrate rotation mechanism for rotating said substrate along with said substrate holder about a central axis pointing in said up-down direction;   a controller for controlling said first processing liquid supply part, said second processing liquid supply part, and said nozzle moving mechanism; and   a gas supply part for supplying a gas to a space between said opposing member and said substrate,   wherein said opposing member that is located at said first position is held by said opposing-member conveying mechanism and spaced above from said substrate holder, and said opposing member that is located at said second position is held by said substrate holder and rotated along with said substrate holder by said substrate rotation mechanism, and   under the control of said controller, said first processing liquid is supplied through said opposing-member opening to said substrate with said first processing liquid nozzle being located at said supply position, said first processing liquid nozzle is moved from said supply position to said first retracted position, said second processing liquid nozzle is moved from said second retracted position to said supply position, and said second processing liquid is supplied through said opposing-member opening to said substrate.   
     
     
         2 . The substrate processing apparatus according to  claim 1 , wherein
 said opposing member includes:   an opposing-member body that opposes said upper surface of said substrate and has said opposing-member opening in said central part; and   a tubular to-be-held part that protrudes upward from the periphery of said opposing-member opening of said opposing-member body and is held by said opposing-member conveying mechanism, and   said first processing liquid nozzle and said second processing liquid nozzle, when located at said supply position, are inserted through an upper opening of said to-be-held part.   
     
     
         3 . The substrate processing apparatus according to  claim 2 , wherein
 an end of said first processing liquid nozzle that is located at said supply position and an end of said second processing liquid nozzle that is located at said supply position are located above a lower edge of said opposing-member opening or at the same position as said lower edge in said up-down direction.   
     
     
         4 . The substrate processing apparatus according to  claim 1 , wherein
 said first processing liquid nozzle and said second processing liquid nozzle, when located at said supply position, are inserted into a through hole of said opposing-member conveying mechanism above said opposing-member opening.   
     
     
         5 . The substrate processing apparatus according to  claim 4 , wherein
 the gas from said gas supply part is supplied from said opposing-member opening via said opposing-member conveying mechanism.   
     
     
         6 . The substrate processing apparatus according to  claim 1 , wherein
 said opposing-member conveying mechanism includes:   an opposing-member holder for holding said opposing member; and   an opposing-member-holder moving mechanism for, with said opposing member being located at said second position, retracting said opposing-member holder from above said opposing member, and   with said opposing-member holder being retracted, either said first processing liquid nozzle or said second processing liquid nozzle is located at said supply position, and the gas from said gas supply part is supplied from said first processing liquid nozzle or said second processing liquid nozzle that is located at said supply position.   
     
     
         7 . The substrate processing apparatus according to  claim 1 , further comprising:
 a nozzle cleaning part for cleaning said first processing liquid nozzle that is located at said first retracted position.   
     
     
         8 . A substrate processing apparatus for processing a substrate, comprising:
 a substrate holder for holding a substrate in a horizontal position;   an opposing member that opposes an upper surface of said substrate, has an opposing-member opening in a central part, and has a tubular to-be-held part that protrudes upward from the periphery of said opposing-member opening;   an opposing-member conveying mechanism for holding said to-be-held part of said opposing member and moving said opposing member relative to said substrate holder between a first position and a second position in an up-down direction;   a processing liquid nozzle located on the inner side of said to-be-held part and for ejecting a processing liquid through said opposing-member opening toward said upper surface of said substrate;   a substrate rotation mechanism for rotating said substrate along with said substrate holder about a central axis pointing in said up-down direction; and   a gas supply part for supplying a gas to a space between said opposing member and said substrate,   said opposing member that is located at said first position is held by said opposing-member conveying mechanism and spaced above from said substrate holder, and said opposing member that is located at said second position is held by said substrate holder and rotated along with said substrate holder by said substrate rotation mechanism, and   said gas supply part supplies a gas to a gap between an inner surface of said to-be-held part of said opposing member and an outer surface of said processing liquid nozzle.   
     
     
         9 . The substrate processing apparatus according to  claim 8 , wherein
 said processing liquid nozzle protrudes downward from said opposing-member conveying mechanism and is inserted through an upper opening of said to-be-held part, and   the gas from said gas supply part is supplied from said upper opening of said to-be-held part into said to-be-held part via said opposing-member conveying mechanism.   
     
     
         10 . The substrate processing apparatus according to  claim 9 , wherein
 said to-be-held part includes:   a cylindrical flange connector centered on said central axis; and   an opposing-member flange part that extends radially outward from an upper end of said flange connector,   said opposing-member conveying mechanism supports said opposing-member flange part of said opposing member from the underside when said opposing member is located at said first position, and   a labyrinth is formed between said opposing-member conveying mechanism and an upper surface of said opposing-member flange part of said opposing member that is located at said second position.   
     
     
         11 . The substrate processing apparatus according to  claim 9 , wherein
 said processing liquid nozzle is inserted into said to-be-held part through a through hole of said opposing-member conveying mechanism above said to-be-held part, and   the gas from said gas supply part is supplied toward said through hole.   
     
     
         12 . The substrate processing apparatus according to  claim 8 , wherein
 the gas from said gas supply part is supplied from said outer surface of said processing liquid nozzle to said gap.   
     
     
         13 . The substrate processing apparatus according to  claim 8 , wherein
 said opposing-member conveying mechanism includes:   an opposing-member holder for holding said opposing member; and   an opposing-member-holder moving mechanism for, with said opposing member being located at said second position, retracting said opposing-member holder from above said opposing member, and   with said opposing-member holder being retracted, said processing liquid nozzle is inserted through an upper opening of said to-be-held part, and the gas from said gas supply part is supplied from said outer surface of said processing liquid nozzle to said gap.   
     
     
         14 . The substrate processing apparatus according to  claim 13 , wherein
 the gas from said gas supply part is supplied obliquely downward and obliquely upward from said outer surface of said processing liquid nozzle.   
     
     
         15 . The substrate processing apparatus according to  claim 13 , wherein
 said to-be-held part includes:   a cylindrical flange connector centered on said central axis; and   an opposing-member flange part that extends radially outward from an upper end of said flange connector,   said processing liquid nozzle includes:   a nozzle body that is inserted in said flange connector of said to-be-held part; and   a nozzle flange part that extends radially outward from a top of said nozzle body and opposes an upper surface of said opposing-member flange part, and   a labyrinth is formed between said upper surface of said opposing-member flange part and a lower surface of said nozzle flange part.   
     
     
         16 . The substrate processing apparatus according to  claim 15 , wherein
 the gas from said gas supply part is supplied from said outer surface of said processing liquid nozzle toward said labyrinth.   
     
     
         17 . A substrate processing apparatus for processing a substrate, comprising:
 a substrate holder for holding a substrate in a horizontal position;   an opposing member that opposes an upper surface of said substrate, has an opposing-member opening in a central part, and has a tubular to-be-held part that protrudes upward from the periphery of said opposing-member opening;   an opposing-member holder for holding said to-be-held part of said opposing member;   an opposing-member elevating mechanism for moving said opposing member relative to said substrate holder between a first position and a second position in an up-down direction;   a processing liquid nozzle located on the inner side of said to-be-held part and for ejecting a processing liquid through said opposing-member opening toward said upper surface of said substrate;   a substrate rotation mechanism for rotating said substrate along with said substrate holder about a central axis pointing in said up-down direction; and   an opposing-member-holder moving mechanism for moving said opposing-member holder between a holding position above said opposing member and a retracted position around said opposing member,   wherein said opposing member that is located at said first position is held by said opposing-member holder and spaced above from said substrate holder, and said opposing member that is located at said second position is held by said substrate holder and rotated along with said substrate holder by said substrate rotation mechanism,   said to-be-held part includes:   a cylindrical flange connector centered on said central axis; and   an opposing-member flange part that extends radially outward from an upper end of said flange connector,   said opposing-member holder includes:   a first flange supporter that is in contact with and supports part of said opposing-member flange part of said opposing member from the underside when said opposing member is located at said first position;   a second flange supporter that is located on the opposite side to said first flange supporter with said flange connector located therebetween and that is in contact with and supports part of said opposing-member flange part of said opposing member from the underside when said opposing member is located at said first position; and   a holder body on which said first flange supporter and said second flange supporter are mounted, and   with said opposing member being located at said second position, said first flange supporter and said second flange supporter are horizontally moved to space said first flange supporter and said second flange supporter radially outward from said opposing-member flange part or to dispose said first flange supporter and said second flange supporter below said opposing-member flange part.   
     
     
         18 . The substrate processing apparatus according to  claim 17 , wherein
 said first flange supporter and said second flange supporter are fixed to said holder body,   said opposing-member-holder moving mechanism horizontally rotates said holder body to move said opposing-member holder between said holding position and said retracted position, and   the rotation of said holder body causes said first flange supporter and said second flange supporter to be spaced radially outward from said opposing-member flange part or to be disposed below said opposing-member flange part.   
     
     
         19 . The substrate processing apparatus according to  claim 17 , wherein
 said opposing-member holder further includes a supporter moving mechanism for moving said first flange supporter and said second flange supporter relative to said holder body, and   with said holder body being located at said holding position, said supporter moving mechanism moves said first flange supporter and said second flange supporter to space said first flange supporter and said second flange supporter radially outward from said opposing-member flange part or to dispose said first flange supporter and said second flange supporter below said opposing-member flange part.   
     
     
         20 . A substrate processing apparatus for processing a substrate, comprising:
 a substrate holder for holding a substrate in a horizontal position;   an opposing member that opposes an upper surface of said substrate;   a processing liquid supply part for supplying a processing liquid to said upper surface of said substrate;   a substrate rotation mechanism for rotating said substrate along with said substrate holder about a central axis pointing in an up-down direction;   an opposing-member storage part capable of housing said opposing member; and   an opposing-member conveying mechanism for holding said opposing member, moving said opposing member relative to said substrate holder between a first position and a second position in said up-down direction, and conveying said opposing member between a position above said substrate holder and said opposing-member storage part,   wherein said opposing member that is located at said first position is held by said opposing-member conveying mechanism and spaced above from said substrate holder, and said opposing member that is located at said second position is held by said substrate holder and rotated along with said substrate holder by said substrate rotation mechanism, and   said opposing-member conveying mechanism conveys said opposing member from the position above said substrate holder into said opposing-member storage part and conveys another opposing member housed in said opposing-member storage part out of said opposing-member storage part to the position above said substrate holder.   
     
     
         21 . The substrate processing apparatus according to  claim 20 , wherein
 said opposing member and said another opposing member are of different types.   
     
     
         22 . The substrate processing apparatus according to  claim 20 , further comprising:
 an opposing-member cleaning mechanism for cleaning said opposing member that is housed in said opposing-member storage part.   
     
     
         23 . The substrate processing apparatus according to  claim 20 , wherein
 said opposing-member storage part includes a plurality of storage parts that are stacked on top of one another in said up-down direction and each are capable of housing an opposing member.   
     
     
         24 . The substrate processing apparatus according to  claim 20 , wherein
 said opposing-member conveying mechanism includes a forward-backward movement mechanism for moving said opposing member in a forward-backward direction relative to said opposing-member storage part.   
     
     
         25 . The substrate processing apparatus according to  claim 20 , further comprising:
 a mobility limiting part for limiting a positional shift of said opposing member caused by said opposing-member conveying mechanism.   
     
     
         26 . The substrate processing apparatus according to  claim 20 , wherein
 said opposing member includes:   an opposing-member body that opposes said upper surface of said substrate and has an opposing-member opening in a central part; and   a tubular to-be-held part that protrudes upward from the periphery of said opposing-member opening of said opposing-member body and is held by said opposing-member conveying mechanism,   said to-be-held part includes:   a cylindrical flange connector centered on said central axis; and   an opposing-member flange part that extends radially outward from an upper end of said flange connector,   said opposing-member conveying mechanism includes:   a first flange supporter that is in contact with and supports part of said opposing-member flange part of said opposing member from the underside when said opposing member is located at said first position;   a second flange supporter that is located on the opposite side to said first flange supporter with said flange connector located therebetween and that is in contact with and supports part of said opposing-member flange part of said opposing member from the underside when said opposing member is located at said first position; and   a holder body on which said first flange supporter and said second flange supporter are mounted,   with said opposing member being located at said second position, said opposing-member conveying mechanism horizontally rotates said holder body to space said first flange supporter and said second flange supporter radially outward from said opposing-member flange part or to dispose said first flange supporter and said second flange supporter below said opposing-member flange part, and   said flange connector is separable on at least one side in a direction along said first flange supporter and said second flange supporter from a space between said first flange supporter and said second flange supporter.   
     
     
         27 . A substrate processing system for processing a substrate, comprising:
 the substrate processing apparatus according to  claim 20 ;   another substrate processing apparatus;   an apparatus housing chamber for housing said substrate processing apparatus; and   another apparatus housing chamber for housing said another substrate processing apparatus.   
     
     
         28 . A substrate processing system for processing a substrate, comprising:
 the substrate processing apparatus according to  claim 20 ;   another substrate processing apparatus that shares said opposing-member storage part and said opposing-member conveying mechanism with said substrate processing apparatus and has a similar configuration to a configuration of said substrate processing apparatus;   a shared space in which said opposing-member storage part and said opposing-member conveying mechanism are located;   an apparatus housing chamber in which the configuration of said substrate processing apparatus, excluding said opposing-member storage part and said opposing-member conveying mechanism, is located; and   another apparatus housing chamber in which the configuration of said another substrate processing apparatus, excluding said opposing-member storage part and said opposing-member conveying mechanism, is located.   
     
     
         29 . A substrate processing method of processing a substrate with a substrate processing apparatus that comprises: a substrate holder for holding a substrate in a horizontal position; an opposing member that opposes an upper surface of said substrate and has an opposing-member opening in a central part; an opposing-member conveying mechanism for holding said opposing member and moving said opposing member relative to said substrate holder between a first position and a second position in an up-down direction; a first processing liquid supply part for supplying a first processing liquid through a first processing liquid nozzle to said upper surface of said substrate; a second processing liquid supply part for supplying a second processing liquid through a second processing liquid nozzle to said upper surface of said substrate; a nozzle moving mechanism for individually moving said first processing liquid nozzle and said second processing liquid nozzle, specifically, moving said first processing liquid nozzle between a supply position above said opposing-member opening and a first retracted position around said substrate holder and moving said second processing liquid nozzle between said supply position and a second retracted position around said substrate holder; a substrate rotation mechanism for rotating said substrate along with said substrate holder about a central axis pointing in said up-down direction; and a gas supply part for supplying a gas to a space between said opposing member and said substrate, wherein said opposing member that is located at said first position is held by said opposing-member conveying mechanism and spaced above from said substrate holder, and said opposing member that is located at said second position is held by said substrate holder and rotated along with said substrate holder by said substrate rotation mechanism,
 said substrate processing method comprising:   a) moving said opposing member from said first position to said second position;   b) supplying said first processing liquid from said first processing liquid nozzle that is located at said supply position through said opposing-member opening to said substrate;   c) moving said first processing liquid nozzle from said supply position to said first retracted position;   d) moving said second processing liquid nozzle from said second retracted position to said supply position; and   e) supplying said second processing liquid through said opposing-member opening to said substrate.   
     
     
         30 . The substrate processing method according to  claim 29 , wherein
 said opposing-member conveying mechanism includes an opposing-member holder for holding said opposing member,   the substrate processing method further comprising:   retracting said opposing-member holder from above said opposing member between said operations a) and b),   wherein, in said operation b), the gas from said gas supply part is supplied from said first processing liquid nozzle, and   in said operation e), the gas from said gas supply part is supplied from said second processing liquid nozzle.   
     
     
         31 . The substrate processing method according to  claim 29 , further comprising:
 cleaning said first processing liquid nozzle that is located at said first retracted position in parallel with said operation d) or e).   
     
     
         32 . A substrate processing method of processing a substrate with a substrate processing apparatus that comprises: a substrate holder for holding a substrate in a horizontal position; an opposing member that opposes an upper surface of said substrate, has an opposing-member opening in a central part, and has a tubular to-be-held part that protrudes upward from the periphery of said opposing-member opening; an opposing-member holder for holding said to-be-held part of said opposing member; an opposing-member elevating mechanism for moving said opposing member relative to said substrate holder between a first position and a second position in an up-down direction; a processing liquid nozzle located on the inner side of said to-be-held part and for ejecting a processing liquid through said opposing-member opening toward said upper surface of said substrate; and a substrate rotation mechanism for rotating said substrate along with said substrate holder about a central axis pointing in said up-down direction,
 said substrate processing apparatus further comprising:   an opposing-member-holder moving mechanism for moving said opposing-member holder between a holding position above said opposing member and a retracted position around said opposing member,   wherein said opposing member that is located at said first position is held by said opposing-member holder and spaced above from said substrate holder, and said opposing member that is located at said second position is held by said substrate holder and rotated along with said substrate holder by said substrate rotation mechanism,   said to-be-held part includes:   a cylindrical flange connector centered on said central axis; and   an opposing-member flange part that extends radially outward from an upper end of said flange connector,   said opposing-member holder includes:   a first flange supporter that is in contact with and supports part of said opposing-member flange part of said opposing member from the underside when said opposing member is located at said first position;   a second flange supporter that is located on the opposite side to said first flange supporter with said flange connector located therebetween and that is in contact with and supports part of said opposing-member flange part of said opposing member from the underside when said opposing member is located at said first position; and   a holder body on which said first flange supporter and said second flange supporter are mounted,   said substrate processing method comprising:   a) moving said opposing member from said first position to said second position;   b) start rotation of said substrate, said substrate holder, and said opposing member;   c) horizontally moving said first flange supporter and said second flange supporter to space said first flange supporter and said second flange supporter radially outward from said opposing-member flange part;   d) supplying said processing liquid from said processing liquid nozzle to said substrate;   e) horizontally moving said first flange supporter and said second flange supporter to dispose said first flange supporter and said second flange supporter below said opposing-member flange part;   f) stopping the rotation of said substrate, said substrate holder, and said opposing member; and   g) moving said opposing member from said second position to said first position.   
     
     
         33 . The substrate processing method according to  claim 32 , wherein
 said first flange supporter and said second flange supporter are fixed to said holder body, and   said opposing-member-holder moving mechanism horizontally rotates said holder body to move said opposing-member holder between said holding position and said retracted position,   in said operation c), the rotation of said holder body causes said first flange supporter and said second flange supporter to be spaced radially outward from said opposing-member flange part, and   in said operation e), the rotation of said holder body causes said first flange supporter and said second flange supporter to be disposed below said opposing-member flange part.   
     
     
         34 . The substrate processing method according to  claim 32 , wherein
 said opposing-member holder further includes a supporter moving mechanism for moving said first flange supporter and said second flange supporter relative to said holder body,   in said operation c), with said holder body being located at said holding position, said supporter moving mechanism moves said first flange supporter and said second flange supporter to space said first flange supporter and said second flange supporter radially outward from said opposing-member flange part, and   in said operation e), with said holder body being located at said holding position, said supporter moving mechanism moves said first flange supporter and said second flange supporter to dispose said first flange supporter and said second flange supporter below said opposing-member flange part.   
     
     
         35 . A substrate processing method of processing a substrate with a substrate processing apparatus that comprises: a substrate holder for holding a substrate in a horizontal position; an opposing member that opposes an upper surface of said substrate; a processing liquid supply part for supplying a processing liquid to said upper surface of said substrate; and a substrate rotation mechanism for rotating said substrate along with said substrate holder about a central axis pointing in an up-down direction,
 said substrate processing apparatus further comprising:   an opposing-member storage part capable of housing said opposing member; and   an opposing-member conveying mechanism for holding said opposing member, moving said opposing member relative to said substrate holder between a first position and a second position in said up-down direction, and conveying said opposing member between a position above said substrate holder and said opposing-member storage part,   wherein said opposing member that is located at said first position is held by said opposing-member conveying mechanism and spaced above from said substrate holder, said opposing member that is located at said second position is held by said substrate holder and rotated along with said substrate holder by said substrate rotation mechanism,   said substrate processing method comprising:   a) conveying said opposing member from the position above said substrate holder into said opposing-member storage part; and   b) conveying another opposing member housed in said opposing-member storage part out of said opposing-member storage part to the position above said substrate holder.   
     
     
         36 . The substrate processing method according to  claim 35 , wherein
 said opposing member and said another opposing member are of different types,   the substrate processing method further comprising:   before said operation b), determining a type of said another opposing member according to a property of processing to be performed after said operation b) by said substrate processing apparatus.   
     
     
         37 . The substrate processing method according to  claim 35 , further comprising:
 after said operation a), cleaning said opposing member that is housed in said opposing-member storage part.   
     
     
         38 . The substrate processing method according to  claim 35 , wherein
 in said operation a), said opposing member is moved in a forward-backward direction relative to said opposing-member storage part and conveyed into said opposing-member storage part.   
     
     
         39 . The substrate processing method according to  claim 35 , wherein
 in said operation a), a positional shift of said opposing member that is being conveyed is limited.