Methods of making lamination transfer films for forming antireflective structures

Abstract

Transfer films, articles made therewith, and methods of making and using transfer films that include antireflective structures are disclosed.

What is claimed is: 
     
         1 . A method of forming a transfer film, comprising:
 reactive ion etching a layer of sacrificial material to form antireflective nanostructure template features;   coating a thermally stable backfill material on the antireflective nanostructure template features to form a thermally stable backfill layer having a first surface conforming to the antireflective nanostructure template features and an opposing planar second surface, forming a lamination transfer film; and   disposing the layer of sacrificial material on a release surface of a carrier film before the reactive ion etching step.   
     
     
         2 . The method according to  claim 1 , wherein the reactive ion etching step comprises applying a discontinuous random masking layer on a first surface of the layer of sacrificial material and reactive ion etching portion of the layer of sacrificial material not protected by the masking layer to form the antireflective nanostructure template features. 
     
     
         3 . The method according to  claim 1 , wherein the antireflective nanostructure template features comprise nanoscale features having a height to width ratio of about 5:1 or greater. 
     
     
         4 . The method according to  claim 1 , wherein the thermally stable backfill layer comprises an organosilicon polymer. 
     
     
         5 . The method according to  claim 1 , wherein the thermally stable backfill layer comprises silsesquioxanes of bridge or ladder-type. 
     
     
         6 . The method according to  claim 1 , wherein the thermally stable backfill layer comprises zirconia, titania, alumina, boron carbide, or silicon carbide nanoparticles.