Dynamic ion radical sieve and ion radical aperture for an inductively coupled plasma (icp) reactor

Abstract

Embodiments described herein provide apparatus and methods of etching a substrate using an ion etch chamber having a movable aperture. The ion etch chamber has a chamber body enclosing a processing region, a substrate support disposed in the processing region and having a substrate receiving surface, a plasma source disposed at a wall of the chamber body facing the substrate receiving surface, an ion-radical shield disposed between the plasma source and the substrate receiving surface, and a movable aperture member between the ion-radical shield and the substrate receiving surface. The movable aperture member is actuated by a lift assembly comprising a lift ring and lift supports from the lift ring to the aperture member. The ion-radical shield is supported by shield supports disposed through the aperture member. The aperture size, shape, and/or central axis location may be changed using inserts.

What is claimed is: 
     
         1 . An aperture member for a plasma etch chamber, the aperture member comprising a disk with an outer diameter of at least about six inches having an aperture formed through a central portion of the disk, the aperture having a rectangular shape and a contoured inner wall to support a second member in a substantially parallel relationship to the aperture member. 
     
     
         2 . The aperture member of  claim 1 , wherein the disk comprises quartz or ceramic, including combinations and alloys thereof. 
     
     
         3 . The aperture member of  claim 1 , wherein the contoured inner wall has a cross-sectional shape that is one of beveled, curved, or stepped. 
     
     
         4 . The aperture member of  claim 1 , further comprising an insert having a contoured outer edge that matches the contoured inner wall of the aperture, the insert having a second aperture through a central portion of the insert. 
     
     
         5 . The aperture member of  claim 1 , further comprising a plurality of recesses in a peripheral portion of the disk that mate with support members. 
     
     
         6 . The aperture member of  claim 1 , further comprising a plurality of openings formed in a peripheral portion of the disk. 
     
     
         7 . A moveable aperture member for processing a substrate in a plasma etch chamber, comprising:
 a disk having an aperture formed in a central region of the disk, the aperture having a contoured edge to support an insert therein in a substantially parallel relationship to the aperture member, wherein the contoured edge is one of beveled, curved, or stepped.   
     
     
         8 . The aperture member of  claim 7 , further comprising an insert having a contoured outer edge that matches the contoured edge of the aperture, the insert having a second aperture through a central portion of the insert. 
     
     
         9 . The moveable aperture member of  claim 7 , wherein the contoured edge is beveled, and wherein the bevel is a straight bevel machined an angle up to about 75 degrees with reference to a plane of the aperture member. 
     
     
         10 . The moveable aperture member of  claim 7 , wherein the contoured edge is beveled, and wherein the bevel is curved or faceted. 
     
     
         11 . The moveable aperture member of  claim 7 , wherein the aperture member comprises quartz or ceramic, including combinations and alloys thereof. 
     
     
         12 . The moveable aperture member of  claim 7 , wherein the aperture member is coated with a ceramic metal material, an anodized aluminum material, or aluminum coated with a deposited or sprayed ceramic coating. 
     
     
         13 . The moveable aperture member of  claim 7 , wherein the aperture is a planar plate. 
     
     
         14 . The aperture member of  claim 7 , wherein the disk has an outer diameter of at least about six inches. 
     
     
         15 . An aperture member for a plasma etch chamber, comprising:
 a disk having an aperture formed therein, the aperture having a contoured edge to support an insert therein, wherein the contoured edge is one of beveled, curved, or stepped; and   a plurality of nesting aperture inserts, wherein each nesting aperture insert has a different aperture size, and wherein each nesting aperture insert comprises a contoured outer edge that mates with the contoured edge of the aperture.   
     
     
         16 . The aperture member of  claim 15 , wherein the plurality of nesting aperture inserts is about five or less nesting aperture inserts. 
     
     
         17 . The aperture member of  claim 16 , wherein the first nesting aperture insert has a first aperture that is between about ⅛ inch and about ¼ inch smaller than the aperture of the aperture member and nests within the aperture, and the second nesting aperture insert has a second aperture that is between about ⅛ inch and about ¼ inch smaller than the first aperture and nests within the first aperture. 
     
     
         18 . The aperture member of  claim 15 , wherein the plurality of nesting aperture inserts reduce the aperture of the aperture member by up to about 3 inches. 
     
     
         19 . The aperture member of  claim 15 , wherein the contoured edge is beveled, and wherein the bevel is a straight bevel machined an angle up to about 75 degrees with reference to a plane of the aperture member. 
     
     
         20 . The aperture member of  claim 15 , wherein the contoured edge is beveled, and wherein the bevel is curved or faceted.