Lithography mask functional optimization and spatial frequency analysis

Abstract

In an electronic design automation technique for optical proximity correction, a mask is represented by a function with an exact analytical form over a mask region. Using the physics of optical projection, a solution based on a spatial frequency analysis is determined. Spatial frequencies above a cutoff are determined by the optical system do not contribute to the projected image. Spatial frequencies below this cutoff affect the print (and the mask), while those above the cutoff only affect the mask. Frequency components in the function below this cutoff frequency may be removed, which will help to reduce computational complexity.

The invention claimed is: 
     
         1 . A system comprising:
 at least one electronic processor coupled to a computer-readable medium, wherein the computer-readable medium comprises computer-executable code that causes the electronic processor to perform the following:   providing a target mask, wherein the target mask is in a spatial domain;   performing a frequency domain transformation on the target mask to obtain a first mask, wherein the first mask is in a frequency domain; and   computing a first cost function for a first mask to obtain a first value.   
     
     
         2 . The system of  claim 1  wherein the computer-executable code comprises:
 altering the first mask in a frequency domain to obtain a second mask, wherein the second mask is in the frequency domain; 
 computing the first cost function for the second mask to obtain a second value; and 
 repeating the altering the first mask and the computing the first cost function for the second mask until the second value is less than the first value, 
 wherein the performing a frequency domain transformation, computing a first cost function, and altering the first mask are performed using at least one electronic processor.