US2016167089A1PendingUtilityA1
Forming sacrificial structures using phase-change materials that sublimate
Est. expiryDec 11, 2034(~8.4 yrs left)· nominal 20-yr term from priority
B29C 64/124B05D 7/50B29C 64/40B29C 64/112B29C 64/106B29C 33/448B29C 64/118B33Y 10/00B29K 2075/00
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Claims
Abstract
A structure can include a first layer of a polymer material and a second layer of the polymer material on the first layer, the first and second layers of the polymer material defining a hollow space that was formed by way of a temporary sacrificial structure that was made of a sublimable material.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A structure, comprising:
a first layer of a polymer material; and a second layer of the polymer material on the first layer, the first and second layers of the polymer material defining a hollow space that was formed by way of a temporary sacrificial structure that was made of a sublimable material.
2 . The structure of claim 1 , wherein the sublimable material includes cyclododecane and/or other phase-change composites.
3 . The structure of claim 1 , wherein the sacrificial structure has been removed by way of sublimation.
4 . The structure of claim 3 , wherein the sublimation was performed at a pressure of approximately 1 millitorr.
5 . The structure of claim 3 , wherein the sublimation was performed at a temperature less than 160 degrees C.
6 . The structure of claim 5 , wherein the temperature was approximately 55 degrees C.
7 . The structure of claim 1 , wherein the polymer material is an ultraviolet-curable polymer material.
8 . The structure of claim 1 , wherein the hollow space is a cavity or a channel.
9 . The structure of claim 1 , the first and second layers of the polymer material defining another hollow space that was formed by way of another temporary sacrificial structure that was made of the sublimable material.
10 . The structure of claim 1 , further comprising a third layer of the polymer material on the second layer, the third and second layers of the polymer material defining another hollow space that was formed by way of another temporary sacrificial structure that was made of the sublimable material.
11 . A method, comprising:
depositing a first layer of a polymer material; depositing a first amount of sublimable material on the first layer of the polymer material to form a first sacrificial structure; depositing a second layer of the polymer material on the first amount of sublimable material and first layer of the polymer material; and removing the sublimable material to form a first hollow space defined by the first and second layers of the polymer material.
12 . The method of claim 11 , wherein the removing includes performing sublimation.
13 . The method of claim 12 , wherein the sublimation includes heating at a certain temperature and at a certain pressure.
14 . The method of claim 13 , wherein the certain pressure is approximately 1 millitorr.
15 . The method of claim 13 , wherein the certain temperature is less than 160 degrees C.
16 . The method of claim 15 , wherein the certain temperature is approximately 55 degrees C.
17 . The method of claim 11 , wherein the sublimable material includes cyclododecane and/or other phase-change composites.
18 . The method of claim 11 , wherein the hollow space is a cavity or a channel.
19 . The method of claim 11 , further comprising to build multiple layered structures. depositing a second amount of sublimable material on the first layer of the polymer material to form a second sacrificial structure;
depositing a third layer of the polymer material on the second amount of sublimable material and first layer of the polymer material; and removing the sublimable material to form a second hollow space defined by the first and third layers of the polymer material.
20 . The method of claim 11 , further comprising to build multiple layered structures.
depositing a second amount of sublimable material on the second layer of the polymer material to form a second sacrificial structure; depositing a third layer of the polymer material on the second amount of sublimable material and second layer of the polymer material; and removing the second amount of sublimable material to form a second hollow space defined by the second and third layers of the polymer material.Join the waitlist — get patent alerts
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