US2016137522A1PendingUtilityA1

Ito film, ito powder used in manufacturing same ito film, manufacturing method of ito powder, and manufacturing method of ito film

Assignee: MITSUBISHI MATERIALS CORPPriority: Jun 12, 2012Filed: Jan 27, 2016Published: May 19, 2016
Est. expiryJun 12, 2032(~5.9 yrs left)· nominal 20-yr term from priority
H10F 71/138C01P 2004/64C01P 2006/63C01P 2006/62C01G 19/02C01P 2006/12C01P 2006/64C01P 2006/40C04B 35/457H01B 13/00H01B 1/08G02B 1/00G02B 5/207Y02E10/50C01G 19/00C01G 1/02B82Y 30/00
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Claims

Abstract

An ITO film having a band gap in a range of 4.0 eV to 4.5 eV.

Claims

exact text as granted — not AI-modified
1 . (canceled) 
     
     
         2 . An ITO powder used in manufacture of an ITO film having: a band gap in a range of 4.0 eV to 4.5 eV; and an L*a*b* color tone in which L* is from 99.5 to 99.7, a* is from −0.35 to −0.17, and b* is from −0.24 to −0.06, the ITO powder comprising a perse color tone L*a*b* in which L* is 30 or less, a* is less than 0, and b* is less than 0. 
     
     
         3 - 12 . (canceled) 
     
     
         13 . The ITO powder according to  claim 2 , wherein a BET specific surface area of the ITO powder is 20 to 100 m 2 /g. 
     
     
         14 . The ITO powder according to  claim 2 , wherein a crystal particle size of the ITO powder determined by X-ray diffraction (XRD) is 5 to 30 nm.

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