Evaporation system and evaporation method

Abstract

An evaporation system and an evaporation method are disclosed, which are adapted for performing an evaporation process upon a surface of an evaporation target substrate. In an embodiment, the evaporation system comprises an evaporation material and an evaporation source plate, whereas the evaporation source plate is arranged to be heated by a heater so as to evaporate the evaporation material form its solid state into its gaseous state, and then enable the gaseous state evaporation material to travel passing through holes by the use of a shutter device so as to spread toward the surface of the evaporation target substrate for forming a film thereon. In addition, the evaporation system further comprises a transmission device, which is to be used for controlling the opening/closing of the holes of the shutter device.

What is claimed is: 
     
         1 . An evaporation system for performing an evaporation process upon a surface of a target substrate, comprising:
 an evaporation source plate, configured with at least one planar surface;   an evaporation material, coated on the at least one planar surface of the evaporation source plate;   a heater, disposed at a position for allowing the same to heat the evaporation source plate and thus transform the solid state evaporation material into its gaseous state;   a shutter device with a plurality of holes, arranged at a position between the evaporation source plate and the target substrate; and   a transmission device, coupled to the shutter device for controlling the opening/closing of the shutter device so as to allow the gaseous evaporation material to travel passing the holes and thereby reaching the surface of the target substrate for film deposition.   
     
     
         2 . The evaporation system of  claim 1 , wherein the heater is a device selected from a group consisting of: an infrared (IR) heater, a radio frequency (RF) heater, a microwave (MW) heater and a high-power heater. 
     
     
         3 . The evaporation system of  claim 1 , wherein the shutter device further comprises: a shutter plate and a diffuser plate in a manner that shutter plate is coupled to the transmission device. 
     
     
         4 . The evaporation system of  claim 1 , wherein the shutter device is a combination of an upper panel and a lower panel, and the plural holes are formed respectively on the upper panel and the lower panel while allowing the transmission device to couple to one panel selected between the upper panel and the lower panel in a manner that the upper panel and the lower panel can be driven to move and displaced by a relative displacement related to each other for enabling the holes of the upper panel to align or misalign with the holes of the lower panel. 
     
     
         5 . An evaporation method for performing an evaporation process upon a surface of a target substrate, comprising the steps of:
 providing an evaporation material and an evaporation source plate while allowing the evaporation material to be coated on a surface of the evaporation source plate;   heating the evaporation source plate by the use of a heater for transforming the evaporation material from its solid state to its gaseous state; and   providing a shutter device with a plurality of holes for enabling the gaseous evaporation material to travel passing the holes and thus reach the surface of the target substrate for film deposition;   wherein, the shutter device is coupled to a transmission device which is used for controlling the opening/closing of the holes.   
     
     
         6 . The evaporation method of  claim 5 , wherein the evaporation material and the evaporation source plate are disposed inside a vacuum chamber while allowing an enclosed heating area being formed between the shutter device and the evaporation source plate; and thereby, when the evaporation material is being heated and transformed from its solid state into its gaseous state to a point that the pressure difference between the enclosed heating area and the vacuum chamber is ranged between 1˜2 order, the transmission device is activated for enabling the shutter device to open. 
     
     
         7 . The evaporation method of  claim 5 , wherein the heater is a device selected from a group consisting of: an infrared (IR) heater, a radio frequency (RF) heater, a microwave (MW) heater and a high-power heater. 
     
     
         8 . The evaporation method of  claim 5 , wherein the shutter device further comprises: a shutter plate, arranged coupling to the transmission device; and a diffuser plate, formed with a plurality of holes; and thereby, the shutter can be driven to move by the transmission device for allowing the plural holes on the diffuser plate to expose and thus enabling the gaseous evaporation material to flow passing through the plural holes to reach a surface of the target substrate for film deposition. 
     
     
         9 . The evaporation method of  claim 5 , wherein the shutter device is a combination of an upper panel and a lower panel, and the plural holes are formed respectively on the upper panel and the lower panel while allowing the transmission device to couple to one panel selected between the upper panel and the lower panel in a manner that the upper panel and the lower panel can be driven to move and displaced by a relative displacement related to each other for enabling the holes of the upper panel to align or misalign with the holes of the lower panel.