Projection exposure tool for microlithography and method for microlithographic imaging

Abstract

A projection exposure tool for microlithography for imaging mask structures of an image-providing substrate onto a substrate to be structured includes a measuring apparatus configured to determine a relative position of measurement structures disposed on a surface of one of the substrates in relation to one another in at least one lateral direction with respect to the substrate surface and to thereby simultaneously measure a number of measurement structures disposed laterally offset in relation to one another.

1 . A tool, comprising:
 a measuring apparatus configured to determine a relative position of measurement structures relative to each other in a lateral direction,   wherein:
 the tool is a microlithography projection exposure tool configured to image mask structures of a first substrate onto a second substrate which is different from the first substrate; 
 the measurement structures are disposed on a surface of the first substrate, or the measurement structures are disposed on a surface of the second substrate; and 
 the measuring apparatus is configured so that, during use of the measuring apparatus, the measuring apparatus simultaneously measures a number of measurement structures which are laterally offset relative to each other. 
   
     
     
         2 .- 20 . (canceled)