Apparatus for adjustable light source

Abstract

Apparatus for adjusting the position of lamp modules of a processing chamber are disclosed herein. Implementations generally include a process chamber comprising an enclosure defining an internal volume, a substrate support disposed in the internal volume of the process chamber, and a plurality of adjustable lamp modules. Each adjustable lamp module can include a radiation source, a lamp connector in connection with the radiation source, an adjustable mounting bracket connected to the lamp connector, the adjustable mounting bracket being pivotably connected to the process chamber; and a adjustable force device mounted in connection with the adjustable mounting bracket.

What is claimed is: 
     
         1 . An apparatus for processing a semiconductor substrate, comprising:
 a process chamber comprising an enclosure defining an internal volume;   a substrate support disposed in the internal volume of the process chamber;   a plurality of radiation emitters;   an adjustable bracket comprising a base connected to at least one of the radiation emitters, the adjustable bracket being pivotably connected to the process chamber; and   an adjuster connected with the adjustable bracket.   
     
     
         2 . The apparatus of  claim 1 , wherein the adjuster is a micrometer. 
     
     
         3 . The apparatus of  claim 1 , wherein the adjustable bracket comprises a first member and a second member pivotably connected to the first member. 
     
     
         4 . The apparatus of  claim 3 , wherein the first member comprises a first arm and a second arm. 
     
     
         5 . The apparatus of  claim 4 , wherein the first arm is pivotably connected to the second member. 
     
     
         6 . The apparatus of  claim 4 , further comprising a spring connected between the second arm and the second member. 
     
     
         7 . The apparatus of  claim 1 , wherein the adjuster is a wedge. 
     
     
         8 . The apparatus of  claim 1 , further comprising a spring connected to the adjustable bracket. 
     
     
         9 . The apparatus of  claim 1 , wherein the adjuster applies force between a component of the process chamber and the adjustable bracket. 
     
     
         10 . A system for processing a substrate, comprising:
 a process chamber comprising an enclosure, the enclosure having an upper portion and a lower portion defining a processing region;   a substrate support disposed in the processing region;   a plurality of lamp modules connected to the upper portion for delivering radiation to the processing region;   an adjustable bracket connected to at least one of the lamp modules; and   an adjuster connected with the adjustable bracket, the adjuster providing a force for pivoting the adjustable bracket.   
     
     
         11 . The system of  claim 10 , wherein the adjuster is a micrometer. 
     
     
         12 . The system of  claim 10 , wherein the adjustable bracket comprises a first member pivotably connected to a second member. 
     
     
         13 . The system of  claim 12 , wherein the first member comprises a first arm and a second arm. 
     
     
         14 . The system of  claim 13 , wherein the first arm is pivotably connected to the second member. 
     
     
         15 . The system of  claim 13 , further comprising a spring connected to the second arm, the spring providing an opposing force to the adjuster. 
     
     
         16 . The system of  claim 10 , wherein the adjuster is a wedge. 
     
     
         17 . The system of  claim 10 , wherein the adjuster applies force between a component of the process chamber and the adjustable bracket for pivoting the adjustable bracket. 
     
     
         18 . An apparatus for processing a semiconductor substrate, comprising:
 a plurality of radiation modules positioned in an upper portion of a process chamber, each radiation module comprising:
 a radiation source; 
 a base connected to the radiation source; 
 an adjustable bracket connected to the radiation source, the adjustable bracket comprising:
 a base connected to the radiation source; 
 a first member comprising a first arm and a second arm, wherein the first arm is connected to the base; 
 a second member connected to the first member by a pivot; and 
 a spring connected between the second arm of the first member and the second member; and 
 
 an adjuster connected with the first member to provide a pivoting force to the first member. 
   
     
     
         19 . The apparatus of  claim 18 , wherein the adjuster is a micrometer. 
     
     
         20 . The apparatus of  claim 18 , wherein the adjuster applies force between a component of the process chamber and the adjustable bracket.