Liquid crystal display device

Abstract

A drain layer lead line connecting an image signal line and a terminal of an IC driver is interrupted in the middle, and the gap is bridged by bridging ITO that is formed at the same time as pixel ITO. Thus, the difference in the length of the lead lines is adjusted such that the length of the bridging ITO in the lead line connected to the terminal in the center of the IC driver is longer than the length of the bridging ITO in the lead line connected to the terminal in the end of the IC driver to reduce the difference in the wiring resistance of the lead lines due to the difference in the length of the lead lines depending on the location.

What is claimed is: 
     
         1 . A liquid crystal display device comprising:
 a plurality of scan lines and a plurality of image signal lines,   a display area has a plurality of pixels arranged in a matrix form,   a plurality of terminals are arranged outside the display area, the terminals are inputted an image signal of the image signal lines,   a plurality of lead lines made by a metal material, the lead lines are formed between the image signal lines in the display area and the terminals,   wherein the lead lines have a connecting portion for connecting the image signal lines, the inclined line portion extending inclined to the image signal line, the straight line portion for connecting the terminals,   a part of the lead lines are formed by a bridging ITO in the straight line portion.   
     
     
         2 . The liquid crystal display device according to  claim 1 , wherein
 a length of the bridging ITO formed in the lead line having the inclined line portion of the large inclination is shorter than the length of the bridging ITO formed in the lead line having the inclined line portion of a small inclination.   
     
     
         3 . The liquid crystal display device according to  claim 2 ,
 wherein the pixel includes a TFT, and a transmission part in which a common electrode having a slit is formed on a pixel electrode through an inter-layer insulating film,   a source electrode of the TFT and the image signal line are formed by the same material,   the source electrode and the pixel electrode are formed on a gate insulating film, and   the bridging ITO is formed on a same layer as the pixel electrode.   
     
     
         4 . The liquid crystal display device according to  claim 3 , wherein the pixel electrode is formed prior to the source electrode. 
     
     
         5 . The liquid crystal display device according to  claim 2 ,
 wherein the pixel includes a TFT, and a transmission part in which a common electrode having a slit is formed on a pixel electrode through a gate insulating film and an inter-layer insulating film,   wherein a source electrode of the TFT and the image signal line are formed by the same material,   wherein the source electrode is formed on the gate insulating film,   wherein the pixel electrode is formed below the gate insulating film, and   wherein the bridging ITO is formed on a same layer as the pixel electrode formed by ITO.   
     
     
         6 . The liquid crystal display device according to  claim 2 ,
 wherein the pixel includes a TFT, and a transmission part in which a pixel electrode having a slit is formed on a common electrode through an inter-layer insulating film,   a source electrode of the TFT and the image signal line are formed by the same material,   the source electrode is formed on a gate insulating film, and   the bridging ITO is formed on a same layer as the common electrode formed by ITO.   
     
     
         7 . A liquid crystal display device comprising:
 a plurality of scan lines and a plurality of image signal lines,   a display area has a plurality of pixels arranged in a matrix form,   a plurality of terminals are arranged outside the display area, the terminals are inputted a scan signal of the scan signal lines,   a plurality of lead lines made by a metal material, the lead lines are formed between the scan lines in the display area and the terminals,   wherein the lead lines have a connecting portion for connecting the scan lines, the inclined line portion extending inclined to the scan line, the straight line portion for connecting the terminals,   a part of the lead lines are formed by a bridging ITO in the straight line portion.   
     
     
         8 . The liquid crystal display device according to  claim 7 , wherein
 a length of the bridging ITO formed in the lead line having the inclined line portion of the large inclination is shorter than the length of the bridging ITO formed in the lead line having the inclined line portion of a small inclination.   
     
     
         9 . The liquid crystal display device according to  claim 8 ,
 wherein the pixel includes a TFT, and a transmission part in which a common electrode having a slit is formed on a pixel electrode through an inter-layer insulating film,   a gate electrode of the TFT and the scan line are formed by the same material,   a source electrode of the TFT and the pixel electrode are formed on a gate insulating film, and   the bridging ITO is formed on a same layer as the pixel electrode formed by ITO.   
     
     
         10 . The liquid crystal display device according to  claim 8 ,
 wherein the pixel includes a TFT, and a transmission part in which a common electrode having a slit is formed on a pixel electrode through a gate insulting film and an inter-layer insulating film,   a gate electrode of the TFT and the scan line are formed by the same material,   a source electrode of the TFT is formed on the gate insulating film,   the pixel electrode is formed below the gate insulating film, and   the bridging ITO is formed on a same layer as the pixel electrode formed by ITO.   
     
     
         11 . The liquid crystal display device according to  claim 10 , wherein the pixel electrode is formed prior to the source electrode. 
     
     
         12 . The liquid crystal display device according to  claim 8 ,
 wherein the pixel includes a TFT, and a transmission part in which a pixel electrode having a slit is formed on a common electrode through an inter-layer insulting film,   a source electrode of the TFT and the image signal line are formed by the same material,   the source electrode is formed on a gate insulating film, and   the bridging ITO is formed on a same layer as the common electrode formed by ITO.