US2016091799A1PendingUtilityA1

High-resolution microscopy and photolithography devices using focusing micromirrors

Assignee: ECOLE POLYTECHNIQUE FED LAUSANNE EPFLPriority: Jan 24, 2009Filed: Jun 3, 2015Published: Mar 31, 2016

Est. expiryJan 24, 2029(~2.5 yrs left)· nominal 20-yr term from priority

Inventors:Bastien Rachet Fabrice Merenda René Salathe

G02B 26/0833G02B 21/004G02B 21/0076G03F 7/70191G02B 21/0032

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Claims

Abstract

The invention relates to large-field high-resolution microscopy and photolithography setups operating with polychromatic light. It includes the use of a plurality of focusing micromirrors.

Claims

exact text as granted — not AI-modified

1 .- 15 . (canceled) 
     
     
         16 . High-resolution photolithography device comprising a light source, a sample area ( 34 ), a plurality of focusing micromirrors ( 2 ), wherein said sample area ( 34 ) is located in the focus area of said micromirrors ( 2 ) and wherein each focusing micromirror is adapted to collect an illumination light ( 5 ) and focus it onto a sample ( 34 ) of photo-sensitive material. 
     
     
         17 . High-resolution photolithography device according to  claim 16  comprising a translation mechanism which is adapted for establishing a relative motion between said sample ( 34 ) and said micromirrors ( 2 ). 
     
     
         18 . Use of a high-resolution photolithography device as defined in  claim 16  or  17  for two-photon polymerization.

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