Component for plasma processing apparatus, and manufacturing method therefor

Abstract

Particle generation can be suppressed from a thermally sprayed film of yttrium fluoride. A component exposed to plasma in a plasma processing apparatus is provided. The component includes a base and a film. The base is made of aluminum or an aluminum alloy, and an alumite film may be formed on a surface of the base. The film is formed by thermally spraying yttrium fluoride on a surface of the base or on a surface of an underlying layer including a layer provided on the base. A porosity of the film is 4% or less, and an arithmetic mean roughness of a surface of the film is 4.5 μm or less.

We claim: 
     
         1 . A component for a plasma processing apparatus, comprising:
 a base; and   a film formed by thermally spraying yttrium fluoride onto a surface of the base or on a surface of an underlying layer including a layer provided on the base,   wherein a porosity of the film is 4% or less, and   an arithmetic mean roughness of a surface of the film is 4.5 μm or less.   
     
     
         2 . The component of  claim 1 , further comprising:
 a first intermediate layer which is made of an yttrium oxide film formed by an atmospheric plasma spraying method, and is provided between the base and the film.   
     
     
         3 . The component of  claim 2 ,
 wherein the film is not formed on a region including an edge of the first intermediate layer, but is formed on the first intermediate layer at an inner side than the region.   
     
     
         4 . The component of  claim 2 , further comprising:
 a second intermediate layer provided between the first intermediate layer and the film.   
     
     
         5 . The component of  claim 4 ,
 wherein the second intermediate layer has a linear expansion coefficient that falls between linear expansion coefficients of the first intermediate layer and the film.   
     
     
         6 . The component of  claim 5 ,
 wherein the second intermediate layer is formed of a thermally sprayed film of forsterite or a thermally sprayed film of yttria-stabilized zirconia (YSZ) formed by the atmospheric plasma spraying method.   
     
     
         7 . The component of  claim 5 ,
 wherein the second intermediate layer is made of a thermally sprayed film of gray alumina or a thermally sprayed film of alumina formed by the atmospheric plasma spraying method.   
     
     
         8 . The component of  claim 2 , further comprising:
 another intermediate layer provided between the base and the first intermediate layer.   
     
     
         9 . The component of  claim 8 ,
 wherein the another intermediate layer is formed of a thermally sprayed film of gray alumina or a thermally sprayed film of alumina formed by the atmospheric plasma spraying method.   
     
     
         10 . The component of  claims 1 ,
 wherein an alumite film is formed on the surface of the base.   
     
     
         11 . The component of  claims 1 ,
 wherein the base is made of aluminum or an aluminum alloy.   
     
     
         12 . A manufacturing method for a component in a plasma processing apparatus, the manufacturing method comprising:
 performing a surface conditioning on a surface of an underlying layer on which a film is to be formed by thermal spraying, the surface of the underlying layer includes a surface of a base or a surface of a layer formed on the surface of the base; and   forming the film on the surface of the underlying layer by thermally spraying yttrium fluoride,   wherein, in the forming of the film, a slurry containing yttrium fluoride particles having an average diameter ranging from 1 μm to 8 μm is supplied, from a nozzle of a spraying gun configured to jet a flame in a high velocity oxygen fuel spraying method or from a nozzle of a spraying gun configured to discharge a plasma jet in an atmospheric plasma spraying method, to a position distanced apart from the nozzle of the spraying gun toward a downstream side in a direction of a central axis line of the nozzle of the spraying gun or to a position corresponding to a tip end of the nozzle of the spraying gun.   
     
     
         13 . The manufacturing method of  claim 12 ,
 wherein the high velocity oxygen fuel spraying method is used in the forming of the film, and   the position to which the slurry is supplied is in the range from 0 mm to 100 mm from the tip end of the nozzle in the direction of the central axis line.   
     
     
         14 . The manufacturing method of  claim 12 ,
 wherein the atmospheric plasma spraying method is used in the forming of the film, and the position to which the slurry is supplied is in the range from 0 mm to 30 mm from the tip end of the nozzle in the direction of the central axis line.   
     
     
         15 . The manufacturing method of  claims 12 ,
 wherein an angle between a central axis line of a slurry supplying nozzle configured to supply the slurry and the central axis line of the nozzle of the spraying gun ranges from 45 degrees to 135 degrees at a side of the tip end of the nozzle of the spraying gun.   
     
     
         16 . The manufacturing method of  claim 12 ,
 wherein a temperature of the base is set to be in a range from 100° C. to 300° C. in the forming of the film.   
     
     
         17 . The manufacturing method of  claims 12 , further comprising:
 forming a first intermediate layer made of yttrium oxide between the base and the film.   
     
     
         18 . The manufacturing method of  claim 17 , further comprising:
 forming a mask on a region including an edge of the first intermediate layer,   wherein the forming of the film is performed while the mask is formed on the region including the edge of the first intermediate layer in the forming of the mask.   
     
     
         19 . The manufacturing method of  claim 17 , further comprising:
 forming a second intermediate layer between the first intermediate layer and the film.   
     
     
         20 . The manufacturing method of  claim 19 ,
 wherein the second intermediate layer has a linear expansion coefficient that falls between a linear expansion coefficient of the first intermediate layer and a linear expansion coefficient of the film.   
     
     
         21 . The manufacturing method of  claim 20 ,
 wherein the second intermediate layer is made of a thermally sprayed film of yttria-stabilized zirconia (YSZ), or a thermally sprayed film of forsterite.   
     
     
         22 . The manufacturing method of  claim 19 ,
 wherein the second intermediate layer is made of a thermally sprayed film of alumina or a thermally sprayed film of gray alumina.   
     
     
         23 . The manufacturing method of  claim 17 , further comprising:
 forming another intermediate layer between the base and the first intermediate layer.   
     
     
         24 . The manufacturing method of  claim 23 ,
 wherein the another intermediate layer is made of a thermally sprayed film of alumina or a thermally sprayed film of gray alumina.   
     
     
         25 . The manufacturing method of  claims 12 , further comprising:
 forming an alumite film on the surface of the base.