Organic light emitting display apparatus and method of manufacturing the same

Abstract

An organic light emitting display apparatus and a method of manufacturing an organic light emitting display apparatus, the apparatus including a first substrate; an organic light emitting diode on the first substrate, the organic light emitting diode including an emitting area that generates light, and a non-emitting area which generates no light; a second substrate facing the organic light emitting diode; a black matrix layer on a surface of the second substrate that faces the organic light emitting diode, the black matrix layer including an open area aligned with the emitting area of the organic light emitting diode, and a closed area aligned with the non-emitting area of the organic light emitting diode; and a photoresist member, at least a portion of the photoresist member being on the open area of the black matrix layer and protruding toward the organic light emitting diode.

What is claimed is: 
     
         1 . An organic light emitting display apparatus, comprising:
 a first substrate;   an organic light emitting diode on the first substrate, the organic light emitting diode including:
 an emitting area that generates light, and 
 a non-emitting area which generates no light; 
   a second substrate facing the organic light emitting diode;   a black matrix layer on a surface of the second substrate that faces the organic light emitting diode, the black matrix layer including:
 an open area aligned with the emitting area of the organic light emitting diode, and 
 a closed area aligned with the non-emitting area of the organic light emitting diode; and 
   a photoresist member, at least a portion of the photoresist member being on the open area of the black matrix layer and protruding toward the organic light emitting diode.   
     
     
         2 . The apparatus as claimed in  claim 1 , wherein:
 the organic light emitting diode includes an emission layer in the emitting area, and   the organic light emitting diode includes a pixel defining layer in the non-emitting area and at an edge of the emission layer.   
     
     
         3 . The apparatus as claimed in  claim 2 , wherein the pixel defining layer and the emission layer form a groove in the organic light emitting diode. 
     
     
         4 . The apparatus as claimed in  claim 3 , wherein a distance between the second substrate and the pixel defining layer is less than a distance between the second substrate and the emission layer. 
     
     
         5 . The apparatus as claimed in  claim 3 , wherein at least a portion of the photoresist member is in the groove of the organic light emitting diode. 
     
     
         6 . The apparatus as claimed in  claim 1 , wherein the photoresist member is prepared from a negative photosensitive material. 
     
     
         7 . The apparatus as claimed in  claim 1 , wherein the closed area of the black matrix layer has a light shading rate equal to or greater than about 40%. 
     
     
         8 . The apparatus as claimed in  claim 1 , wherein the photoresist member includes:
 a first photoresist area on the closed area, and   a second photoresist area on the open area, a distance between the first substrate and the second photoresist layer being less than a distance between the first substrate and the first photoresist area.   
     
     
         9 . The apparatus as claimed in  claim 8 , wherein a material of the first photoresist area and that of the second photoresist area are identical. 
     
     
         10 . The apparatus as claimed in  claim 9 , wherein the first photoresist area and the second photoresist area are prepared from negative photosensitive materials. 
     
     
         11 . The apparatus as claimed in  claim 8 , wherein a material of the first photoresist area and that of the second photoresist area are different from each other. 
     
     
         12 . The apparatus as claimed in  claim 11 , wherein:
 the first photoresist area is prepared from a positive photosensitive material, and   the second photoresist area is prepared from a negative photosensitive material.   
     
     
         13 . The apparatus as claimed in  claim 1 , wherein the photoresist member further includes at least one of an absorbent, a light scattering particle, or a light blocking material. 
     
     
         14 . A method of manufacturing an organic light emitting display apparatus, the method comprising:
 forming a black matrix layer on one surface of a second substrate such that the black matrix layer includes an open area and a closed area;   forming a photosensitive photoresist layer in the open area and the closed area of the black matrix layer;   light exposing and developing the photosensitive photoresist layer such that a photoresist member remains in the open area of the black matrix layer;   providing a first substrate that has an emission layer and a pixel defining layer thereon;   disposing the second substrate on the first substrate such that the second substrate faces the first substrate; and   aligning the second substrate with the first substrate such that the open area of the black matrix layer is aligned with the emission layer, by inserting at least a portion of the photoresist member in a groove formed by the emission layer and the pixel defining layer.   
     
     
         15 . The method as claimed in  claim 14 , wherein the photosensitive photoresist layer includes a negative photosensitive material. 
     
     
         16 . The method as claimed in  claim 14 , wherein the closed area of the black matrix layer has a light shading rate equal to or greater than about 40%. 
     
     
         17 . The method as claimed in  claim 16 , wherein the photoresist member includes:
 a first photoresist area on the closed area, and   a second photoresist area on the open area, the second photoresist member being thicker than the first photoresist area.   
     
     
         18 . The method as claimed in  claim 14 , further comprising:
 forming a second photosensitive photoresist layer that includes a positive photosensitive material, and   light exposing and developing the second photosensitive photoresist layer such that a second photoresist member remains on the closed area of the black matrix layer,   wherein the second photosensitive photoresist layer is formed and the light exposing and developing is performed prior to forming the photoresist member.