Organic Film CMP Slurry Composition and Polishing Method Using Same

Abstract

The present invention relates to an organic film CMP slurry composition for polishing an organic film, which includes at least either of a polar solvent or a non-polar solvent and a metal oxide abrasive, is acidic, and has a carbon content of around 50 to 95 atm %, and a polishing method using the same.

1 . A CMP slurry composition for polishing organic films, comprising:
 at least one of polar solvents and non-polar solvents; and a metal oxide abrasive,   wherein the composition is acidic and   wherein the organic film contains about 50 atom % to 95 atom % of carbon.   
     
     
         2 . The CMP slurry composition according to  claim 1 , wherein the organic film has a film density of about 0.5 g/cm 3  to 2.5 g/cm 3  and a hardness of about 0.4 GPa or more. 
     
     
         3 . The CMP slurry composition according to  claim 1 , wherein the organic film has a film density of about 1.0 g/cm 3  to 2.0 g/cm 3  and a hardness of about 1.0 GPa or more. 
     
     
         4 . The CMP slurry composition according to  claim 1 , wherein the metal oxide abrasive comprises at least one of silica, alumina, ceria, titania, and zirconia. 
     
     
         5 . The CMP slurry composition according to  claim 1 , comprising the metal oxide abrasive is present in an amount of about 0.1 wt % to 20 wt %. 
     
     
         6 . The CMP slurry composition according to  claim 1 , wherein the CMP slurry composition has a pH of about 6 or less. 
     
     
         7 . The CMP slurry composition according to  claim 1 , wherein the CMP slurry composition has a pH of about 5 or less. 
     
     
         8 . The CMP slurry composition according to  claim 1 , further comprising an oxidant comprising: at least one of a metal salt in a multivalent oxidation state and a transition metal chelate. 
     
     
         9 . The CMP slurry composition according to  claim 8 , comprising the oxidant in an amount of about 0.001 wt % to 15 wt %. 
     
     
         10 . The CMP slurry composition according to  claim 8 , comprising the oxidant in an amount of about 0.01 wt % to 5 wt %. 
     
     
         11 . The CMP slurry composition according to  claim 8 , wherein the metal salt in a multivalent oxidation state comprises at least one of ceric ammonium salts, ferric nitrates, and ferric chlorides. 
     
     
         12 . The CMP slurry composition according to  claim 8 , wherein the transition metal chelate comprises at least one of Fe compounds including propylene diamine tetraacetic acid-Fe, and Mn compounds including propylene diamine tetraacetic acid-Mn. 
     
     
         13 . The CMP slurry composition according to  claim 1 , wherein the composition further comprises a pH adjusting agent. 
     
     
         14 . The CMP slurry composition according to  claim 1 , wherein the composition further comprises at least one of a polishing accelerator selected from malic acid, citric acid, formic acid, glutaric acid, oxalic acid, phthalic acid, succinic acid, tartaric acid, maleic acid, and malonic acid. 
     
     
         15 . The CMP slurry composition according to  claim 1 , wherein the organic film is formed of a composition for preparing organic films comprising a compound having a substituted or unsubstituted aromatic group. 
     
     
         16 . The CMP slurry composition according to  claim 15 , wherein
 the compound having the substituted aromatic group is substituted with at least one of a functional group represented by Formula A and a functional group represented by Formula B:
   *—(O) n -(CH 2 ) m -P(═O)(R)(R′)  <Formula A>
 
   *—B(R)(R′)  <Formula B>
 
   wherein in Formula A and Formula B, n is 0 or 1, m is an integer from 0 to 10,   R and R′ are each independently hydrogen, a hydroxyl group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 haloalkyl group, a substituted or unsubstituted C1 to C20 alkylsulfonate group, a substituted or unsubstituted C1 to C20 alkylsulfonyl group, a substituted or unsubstituted C2 to C20 alkylamide group, a substituted or unsubstituted C3 to C20 alkylester group, a substituted or unsubstituted C2 to C20 cyanoalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C6 to C30 arylalkyl group, or a substituted or unsubstituted C6 to C30 aryloxy group, or   R and R′ are linked to each other to form a substituted or unsubstituted C3 to C20 cycloalkyl group or a substituted or unsubstituted C3 to C20 heterocycloalkyl group.   
     
     
         17 . The CMP slurry composition according to  claim 1 , wherein the organic film is formed from a composition for preparing organic film including a material including Formula 2: 
       
         
           
           
               
               
           
         
         wherein in Formula 2, n is 1≦n≦190; 
         R 1  is hydrogen, a hydroxyl group, a halogen atom, an allyl group, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C1 to C30 heteroalkyl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkyl group, a substituted or unsubstituted C3 to C30 cycloalkenyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C7 to C30 arylalkyl group, a substituted or unsubstituted C1 to C20 heteroalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkenyl group, a substituted or unsubstituted C2 to C30 heteroaryl group, a substituted or unsubstituted C2 to C30 heteroarylalkyl group, a substituted or unsubstituted C1 to C20 alkylamine group, a substituted or unsubstituted C1 to C30 alkoxy group, a substituted or unsubstituted C1 to C30 heteroalkoxy group, a substituted or unsubstituted C6 to C30 aryloxy group, a substituted or unsubstituted C1 to C20 aldehyde group, a substituted or unsubstituted C1 to C40 alkylether group, a substituted or unsubstituted C7 to C20 arylalkyleneether group, a substituted or unsubstituted C1 to C30 haloalkyl group, a functional group including P, a functional group including B, or a combination thereof, 
         R 2  is hydrogen, an amino group, a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C6 to C20 aryloxy group, a dialkylamino group —NRR′ wherein R and R′ are each independently a substituted or unsubstituted C1 to C10 alkyl group or a substituted or unsubstituted C6 to C10 aryl group, a hydroxyl group, a halogen atom, an allyl group, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C1 to C30 heteroalkyl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkyl group, a substituted or unsubstituted C3 to C30 cycloalkenyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C7 to C30 arylalkyl group, a substituted or unsubstituted C1 to C20 heteroalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkenyl group, a substituted or unsubstituted C2 to C30 heteroaryl group, a substituted or unsubstituted C2 to C30 heteroarylalkyl group, a substituted or unsubstituted C1 to C20 alkylamine group, a substituted or unsubstituted C1 to C30 alkoxy group, a substituted or unsubstituted C1 to C30 heteroalkoxy group, a substituted or unsubstituted C6 to C30 aryloxy group, a substituted or unsubstituted C1 to C20 aldehyde group, a substituted or unsubstituted C1 to C40 alkylether group, a substituted or unsubstituted C7 to C20 arylalkyleneether group, a substituted or unsubstituted C1 to C30 haloalkyl group, a functional group including P, a functional group including B, or a combination thereof, and 
         R 3  is one selected from among substituted or unsubstituted 
       
       
         
           
           
               
               
           
         
       
     
     
         18 . The CMP slurry composition according to  claim 1 , wherein the organic film is formed from a composition for preparing organic film including a material represented by Formula 6: 
       
         
           
           
               
               
           
         
         wherein in Formula 6, R 4  to R 9  and X 1  to X 6  are each independently hydrogen, a hydroxyl group, a halogen atom, an allyl group, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C1 to C30 heteroalkyl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkyl group, a substituted or unsubstituted C3 to C30 cycloalkenyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C7 to C30 arylalkyl group, a substituted or unsubstituted C1 to C20 heteroalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkenyl group, a substituted or unsubstituted C2 to C30 heteroaryl group, a substituted or unsubstituted C2 to C30 heteroarylalkyl group, a substituted or unsubstituted C1 to C20 alkylamine group, a substituted or unsubstituted C1 to C30 alkoxy group, a substituted or unsubstituted C1 to C30 heteroalkoxy group, a substituted or unsubstituted C6 to C30 aryloxy group, a substituted or unsubstituted C1 to C20 aldehyde group, a substituted or unsubstituted C1 to C40 alkylether group, a substituted or unsubstituted C7 to C20 arylalkyleneether group, a substituted or unsubstituted C1 to C30 haloalkyl group, a functional group including P, a functional group including B, or a combination thereof, 
         n 1  to n 6  are each independently 0 to 2, and 
         2≦n 1 +n 2 +n 3 +n 4 +n 5 +n 6 ≦6. 
       
     
     
         19 . The CMP slurry composition according to  claim 1 , wherein the organic film is formed from a composition for preparing organic film including a polymer containing aromatic groups selected from (i) a compound represented by Formula 7, (ii) a mixture of the compound represented by Formula 7 and a compound represented by Formula 8, and (iii) a compound represented by Formula 9: 
       
         
           
           
               
               
           
         
         wherein in Formula 7 to Formula 9, 
         m and n are 1≦n≦750, 1≦m≦750, 2<m+n<1500, respectively; 
         R 10  is one selected from among substituted or unsubstituted 
       
       
         
           
           
               
               
           
         
         R 11  is hydrogen, a hydroxyl group, a halogen atom, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C1 to C30 heteroalkyl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C1 to C30 heterocycloalkyl group, a substituted or unsubstituted C3 to C30 cycloalkenyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C7 to C30 arylalkyl group, a substituted or unsubstituted C1 to C20 heteroalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkenyl group, a substituted or unsubstituted C2 to C30 heteroaryl group, a substituted or unsubstituted C2 to C30 heteroarylalkyl group, a substituted or unsubstituted C1 to C20 alkylamine group, a substituted or unsubstituted C1 to C30 alkoxy group, a substituted or unsubstituted C6 to C30 aryloxy group, a substituted or unsubstituted C1 to C20 aldehyde group, a substituted or unsubstituted C1 to C40 alkylether group, a substituted or unsubstituted C7 to C20 arylalkylene ether group, a substituted or unsubstituted C1 to C30 haloalkyl group, a functional group including P, a functional group including B, or a combination thereof; 
         R 12  is one selected from among substituted or unsubstituted 
       
       
         
           
           
               
               
           
         
         R 13  is one selected from among substituted or unsubstituted 
       
       
         
           
           
               
               
           
         
         R 14  is one selected from among substituted or unsubstituted 
       
       
         
           
           
               
               
           
         
         R 15  is one selected from among substituted or unsubstituted 
       
       
         
           
           
               
               
           
         
         and 
         R in R 10 , R 13 , and R 15  is each independently hydrogen, a hydroxyl group, a halogen atom, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C1 to C30 heteroalkyl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C1 to C30 heterocycloalkyl group, a substituted or unsubstituted C3 to C30 cycloalkenyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C7 to C30 arylalkyl group, a substituted or unsubstituted C1 to C20 heteroalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkenyl group, a substituted or unsubstituted C2 to C30 heteroaryl group, a substituted or unsubstituted C2 to C30 heteroarylalkyl group, a substituted or unsubstituted C1 to C20 alkylamine group, a substituted or unsubstituted C1 to C30 alkoxy group, a substituted or unsubstituted C6 to C30 aryloxy group, a substituted or unsubstituted C1 to C20 aldehyde group, a substituted or unsubstituted C1 to C40 alkylether group, a substituted or unsubstituted C7 to C20 arylalkyleneether group, a substituted or unsubstituted C1 to C30 haloalkyl group, a functional group including P, a functional group including B, or a combination thereof. 
       
     
     
         20 . The CMP slurry composition according to  claim 1 , wherein the organic film has an acid value of about 0 mgKOH/g. 
     
     
         21 . A method for polishing an organic film comprising polishing an organic film using the CMP slurry composition according to  claim 1 , wherein the organic film has a carbon content of about 50 atm % to 95 atm %, a film density of about 0.5 g/cm 3  to 2.5 g/cm 3 , and a hardness of about 0.4 GPa or more.