Method for treating a semiconductor device

Abstract

A sensor array includes a plurality of sensors. A sensor of the plurality of sensors has a sensor pad exposed at a surface of the sensor array. A method of treating the sensor array includes exposing at least the sensor pad to a wash solution including sulfonic acid and an organic solvent and rinsing the wash solution from the sensor pad.

1 .- 53 . (canceled) 
     
     
         54 . A method of treating a sensor array, the sensor array including a plurality of sensors, a sensor of the plurality of sensors having a sensor pad exposed at a surface of the sensor array, the method comprising:
 exposing at least the sensor pad to a wash solution including acid and an organic solvent; and   rinsing the wash solution from the sensor pad.   
     
     
         55 . The method of  claim 54 , wherein the acid includes sulfonic acid. 
     
     
         56 . The method of  claim 55 , wherein the sulfonic acid includes alkyl sulfonic acid, alkyl aryl sulfonic acid, or a combination thereof. 
     
     
         57 . The method of  claim 56 , wherein the alkyl aryl sulfonic acid includes an alkyl group having between 1 and 20 carbons. 
     
     
         58 . The method of  claim 55 , wherein the sulfonic acid includes dodecyl benzene sulfonic acid. 
     
     
         59 . The method of  claim 54 , wherein the wash solution includes between 10 mM and 500 mM of the acid. 
     
     
         60 . The method of  claim 54 , wherein the wash solution includes between 0.5 wt % and 25 wt % of the acid. 
     
     
         61 . The method of  claim 54 , wherein the organic solvent is non-polar. 
     
     
         62 . The method of  claim 54 , wherein the organic solvent has a normal boiling point in a range of 36° C. to 345° C. 
     
     
         63 . The method of  claim 54 , wherein the organic solvent is an alkane having between 6 and 24 carbons. 
     
     
         64 . The method of  claim 54 , wherein the organic solvent is a polar aprotic solvent. 
     
     
         65 . The method of  claim 64 , wherein the polar aprotic solvent includes tetrahydrofuran, ethylacetate, acetone, dimethylformamide, acetonitrile, dimethyl sulfoxide, N-methyl pyrrolidone, or combinations thereof. 
     
     
         66 . The method of  claim 54 , further comprising heating the sensor pad and the wash solution while exposing the sensor pad to the wash solution at a temperature in a range of 35° C. to 70° C. 
     
     
         67 . The method of  claim 54 , wherein exposing includes exposing for a period in a range of 30 seconds to 30 minutes. 
     
     
         68 . The method of  claim 54 , further comprising exposing at least the sensor pad to a basic solution following exposing the sensor pad to the wash solution. 
     
     
         69 . The method of  claim 68 , wherein the basic solution includes between 0.005M and 1.5M sodium hydroxide. 
     
     
         70 . The method of  claim 54 , wherein rinsing includes rinsing with a rinse organic solvent miscible with water and the organic solvent. 
     
     
         71 . The method of  claim 70 , wherein the low boiling organic solvent includes alcohol. 
     
     
         72 . A method of treating a sensor array, the sensor array including a plurality of sensors, a sensor of the plurality of the sensors including a sensor pad, a well structure defining a well array corresponding with the sensor array, a well of the well array exposing the sensor pad, a cap attached over the sensor array and the well structure and including an fluid port, a space defined between the cap and the well structure, the method comprising:
 applying a wash solution through the fluid port into the space and waiting for a first period between 30 seconds and 30 minutes, the wash solution including acid and an organic solvent;   applying a basic solution through the fluid port into the space and waiting for a second period between 20 seconds and 15 minutes; and   applying a rinse solution through the fluid port.   
     
     
         73 . The method of  claim 72 , further comprising repeating applying the wash solution, applying the basic solution, and applying the rinse solution.