Polystyrene-polyacrylate block copolymers, methods of manufacture thereof and articles comprising the same
Abstract
Disclosed herein is a block copolymer comprising a first block derived from a vinyl aromatic monomer; and a second block derived from an acrylate monomer; where a chi parameter that measures interactions between the first block and the second block is greater than or equal to about 0.05, when measured at 240° C. Disclosed herein too is a method comprising polymerizing a vinyl aromatic monomer to form a first block; and polymerizing a second block onto the first block to form a block copolymer; where the second block is derived by polymerizing an acrylate monomer; and where the block copolymer has a chi parameter of greater than or equal to about 0.05, when measured at 240° C.; where the chi parameter is a measure of interactions between the first block and the second block.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A method comprising:
polymerizing a vinyl aromatic monomer to form a first block; and polymerizing a second block onto the first block to form a block copolymer; where the second block is derived by polymerizing an acrylate monomer; and where the block copolymer has a chi parameter of greater than or equal to about 0.05, when measured at 240° C.; where the chi parameter is a measure of interactions between the first block and the second block of the copolymer.
2 . The method of claim 1 , where the first block is anionically polymerized and/or the second block is anionically polymerized.
3 . The method of claim 1 , where the second block is sequentially polymerized onto the first block; the sequential polymerization comprising polymerizing the acrylate monomer in the presence of the first block in a single reaction vessel.
4 . The method of claim 3 , where the first block and the second block are polymerized using a same initiator.
5 . The method of claim 1 , where the vinyl aromatic monomer is an alkylstyrene.
6 . The method of claim 1 , where the alkylstyrene is o-methylstyrene, p-methylstyrene, m-methylstyrene, α-methylstyrene, o-ethylstyrene, m-ethylstyrene, p-ethylstyrene, α-methyl-p-methylstyrene, 2,4-dimethylstyrene, monochlorostyrene, p-tert-butylstyrene, 4-tert-butylstyrene, or a combination comprising at least one of the foregoing alkylstyrenes.
7 . The method of claim 1 , where the acrylate monomer has a structure represented by formula (1):
where R 1 is a hydrogen or an alkyl group having 1 to 10 carbon atoms.
8 . The method of claim 1 , where the acrylate monomer has a structure represented by the formula (2):
where R 1 is a hydrogen or an alkyl group having 1 to 10 carbon atoms and R 2 is a C 1-10 alkyl, a C 3-10 cycloalkyl, or a C 7-10 aralkyl group.
9 . The method of claim 1 , where the acrylate monomer has a structure that comprises at least one fluorine atom substituent, where the structure represented by the formula (3):
where R 1 is a hydrogen or an alkyl group having 1 to 10 carbon atoms and R 3 is a C 2-10 fluoroalkyl group.
10 . The method of claim 1 , where the first block is poly(4-tert-butylstyrene).
11 . The method of claim 1 , where the acrylate monomer is a methacrylate, an ethacrylate, a propyl acrylate, a methyl methacrylate, a methyl ethylacrylate, a methyl propylacrylate, an ethyl ethylacrylate, a methyl arylacrylate, a trifluoroethyl methacrylate, a dodecafluoroheptylmethacrylate, or a combination comprising at least one of the foregoing acrylate monomers.
12 . The method of claim 1 , where the second block is polymethylmethacrylate.
13 . The method of claim 1 , where the block copolymer comprises cylindrical and/or lamellar domains and has an interdomain spacing of less than or equal to about 25 nanometers.Join the waitlist — get patent alerts
Track US2016053041A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.