Substrate processing apparatus

Abstract

In a substrate processing apparatus ( 1 ), an enlarged sealed space ( 100 ) is formed by bringing a cup part ( 161 ) that forms a lateral space ( 160 ) around the outer periphery of a chamber ( 12 ) into contact with a chamber lid part ( 122 ) separated from a chamber body ( 121 ). A scan nozzle ( 188 ) is attached to the cup part ( 161 ) in the lateral space ( 160 ) and supplies a chemical solution onto a substrate after moving to above the substrate through an annular opening ( 81 ). During processing for cleaning the substrate and processing for drying the substrate, the scan nozzle ( 188 ) is housed in the lateral space ( 160 ) and an upper opening of the chamber body ( 121 ) is closed by the chamber lid part ( 122 ) to isolate the chamber space ( 120 ) from the lateral space ( 160 ) and seal the chamber space ( 120 ). Thus, the chamber space ( 120 ) can be isolated from the scan nozzle ( 188 ). This consequently prevents a mist or the like of the chemical solution supplied from the scan nozzle ( 188 ) from adhering to the substrate.

1 . A substrate processing apparatus for processing a substrate, comprising:
 a chamber that includes a chamber body and a chamber lid part, which form a chamber space, and in which said chamber space is sealed by closing an upper opening of said chamber body with said chamber lid part;   a chamber opening-and-closing mechanism for moving said chamber lid part relative to said chamber body in an up-down direction;   a substrate holding part disposed in said chamber space and for holding a substrate in a horizontal state;   a substrate rotation mechanism for rotating said substrate along with said substrate holding part about a central axis pointing in the up-down direction;   a cup part located outside of and around an entire periphery of said chamber, forming a lateral space along an outer periphery of said chamber, and for receiving a processing liquid dispersed from said substrate that is being rotated, through an annular opening that is formed around said substrate when said chamber lid part is separated from said chamber body; and   a processing liquid supply part attached to said chamber or said cup part in said lateral space and for moving to above said substrate through said annular opening and supplying a processing liquid onto said substrate or for supplying a processing liquid onto said substrate through said annular opening,   wherein, when said cup part is in contact with said chamber lid part in a state where said annular opening is formed, said chamber space and said lateral space form a single enlarged sealed space.   
     
     
         2 . The substrate processing apparatus according to  claim 1 , wherein
 said processing liquid supply part includes:   an ejection head for ejecting the processing liquid; and   a head support part that is a member extending in a horizontal direction and has a free end to which said ejection head is fixed and a fixed end attached to said chamber or said cup part in said lateral space,   said substrate processing apparatus further comprising:   a head rotation mechanism for rotating said head support part along with said ejection head about said fixed end,   wherein, when the processing liquid is supplied onto said substrate, said head support part is rotated by said head rotation mechanism to move said ejection head to above said substrate through said annular opening.   
     
     
         3 . The substrate processing apparatus according to  claim 2 , wherein
 said head rotation mechanism is disposed outside said enlarged sealed space.   
     
     
         4 . The substrate processing apparatus according to  claim 3 , further comprising:
 a cup-part movement mechanism for moving said cup part in the up-down direction between a liquid-receiving position that is outside the said annular opening and a retracted position that is below said liquid-receiving position,   wherein said head rotation mechanism is fixed to an upper part of said cup part and moves along with said cup part in the up-down direction.   
     
     
         5 . (canceled) 
     
     
         6 . The substrate processing apparatus according to  claim 2 , wherein
 said ejection head supplies the processing liquid onto said substrate while moving back and forth along a predetermined travel path, above said substrate that is being rotated by said substrate rotation mechanism.   
     
     
         7 . The substrate processing apparatus according to  claim 4 , further comprising:
 another cup part located outside of and around an entire periphery of said annular opening in said enlarged sealed space and for receiving the processing liquid dispersed from said substrate that is being rotated; and   another cup-part movement mechanism for moving said another cup part independently of said cup part in the up-down direction between a liquid-receiving position that is outside said annular opening and a retracted position that is below said liquid-receiving position.   
     
     
         8 . The substrate processing apparatus according to  claim 4 , wherein
 the processing liquid is pre-dispensed from said processing liquid supply part in a state where said processing liquid supply part is housed in said lateral space.   
     
     
         9 . The substrate processing apparatus according to  claim 3 , wherein
 said head rotation mechanism is fixed to said chamber lid part and moves along with said chamber lid part relative to said chamber body in the up-down direction.   
     
     
         10 . The substrate processing apparatus according to  claim 9 , wherein
 said ejection head supplies the processing liquid onto said substrate while moving back and forth along a predetermined travel path, above said substrate that is being rotated by said substrate rotation mechanism.   
     
     
         11 . The substrate processing apparatus according to  claim 9 , further comprising:
 another cup part located outside of and around an entire periphery of said annular opening in said enlarged sealed space and for receiving the processing liquid dispersed from said substrate that is being rotated; and   another cup-part movement mechanism for moving said another cup part independently of said cup part in the up-down direction between a liquid-receiving position that is outside said annular opening and a retracted position that is below said liquid-receiving position.   
     
     
         12 . The substrate processing apparatus according to  claim 9 , wherein
 the processing liquid is pre-dispensed from said processing liquid supply part in a state where said processing liquid supply part is housed in said lateral space.   
     
     
         13 . The substrate processing apparatus according to  claim 3 , wherein
 said ejection head supplies the processing liquid onto said substrate while moving back and forth along a predetermined travel path, above said substrate that is being rotated by said substrate rotation mechanism.   
     
     
         14 . The substrate processing apparatus according to  claim 3 , further comprising:
 another cup part located outside of and around an entire periphery of said annular opening in said enlarged sealed space and for receiving the processing liquid dispersed from said substrate that is being rotated; and   another cup-part movement mechanism for moving said another cup part independently of said cup part in the up-down direction between a liquid-receiving position that is outside said annular opening and a retracted position that is below said liquid-receiving position.   
     
     
         15 . The substrate processing apparatus according to  claim 3 , wherein
 the processing liquid is pre-dispensed from said processing liquid supply part in a state where said processing liquid supply part is housed in said lateral space.   
     
     
         16 . The substrate processing apparatus according to  claim 2 , wherein
 said ejection head supplies the processing liquid onto said substrate while moving back and forth along a predetermined travel path, above said substrate that is being rotated by said substrate rotation mechanism.   
     
     
         17 . The substrate processing apparatus according to  claim 2 , further comprising:
 another cup part located outside of and around an entire periphery of said annular opening in said enlarged sealed space and for receiving the processing liquid dispersed from said substrate that is being rotated; and   another cup-part movement mechanism for moving said another cup part independently of said cup part in the up-down direction between a liquid-receiving position that is outside said annular opening and a retracted position that is below said liquid-receiving position.   
     
     
         18 . The substrate processing apparatus according to  claim 2 , wherein
 the processing liquid is pre-dispensed from said processing liquid supply part in a state where said processing liquid supply part is housed in said lateral space.   
     
     
         19 . The substrate processing apparatus according to  claim 1 , further comprising:
 another cup part located outside of and around an entire periphery of said annular opening in said enlarged sealed space and for receiving the processing liquid dispersed from said substrate that is being rotated; and   another cup-part movement mechanism for moving said another cup part independently of said cup part in the up-down direction between a liquid-receiving position that is outside said annular opening and a retracted position that is below said liquid-receiving position.   
     
     
         20 . The substrate processing apparatus according to  claim 1 , wherein
 the processing liquid is pre-dispensed from said processing liquid supply part in a state where said processing liquid supply part is housed in said lateral space.