Substrate processing device

Abstract

A substrate processing apparatus includes a processing unit supplying at least one of a plurality of types of chemical liquids to a substrate and a scrubber cleaning an exhaust by bringing the exhaust in contact with a scrubbing liquid. The scrubber includes an exhaust passage that guides the exhaust, generated at the processing unit and containing the chemical liquid, toward an exhaust equipment disposed outside the substrate processing apparatus and a discharger that is able to discharge each of a plurality of types of scrubbing liquids that clean the exhaust individually inside the exhaust passage. A controller selects any one of the plurality of types of scrubbing liquids based on the type of chemical liquid contained in the exhaust and makes the selected scrubbing liquid be discharged from the discharger.

1 . A substrate processing apparatus comprising:
 a processing unit that supplies at least one of a plurality of types of chemical liquids to a substrate;   a scrubber including an exhaust passage that guides exhaust, generated at the processing unit and containing the chemical liquid, toward an exhaust equipment disposed outside the substrate processing apparatus and a discharger that discharges each of a plurality of types of scrubbing liquids, that clean the exhaust, individually inside the exhaust passage, the scrubber being configured to clear the exhaust by bringing the exhaust flowing through the exhaust passage in contact with the scrubbing liquid; and   a controller that selects any one of the plurality of types of scrubbing liquids based on the type of chemical liquid contained in the exhaust and makes the selected scrubbing liquid be discharged from the discharger.   
     
     
         2 . The substrate processing apparatus according to  claim 1 , wherein the scrubber further includes a scrubber filter that is disposed in the exhaust passage, allows gas flowing through the exhaust passage to pass through the scrubber filter, and retains liquid internally. 
     
     
         3 . The substrate processing apparatus according to  claim 2 , wherein the discharger discharges the scrubbing liquid toward the scrubber filter. 
     
     
         4 . The substrate processing apparatus according to  claim 2 , wherein the scrubber further includes a mist filter that is disposed in the exhaust passage at a position further downstream than the discharger and the scrubber filter, allows gas flowing through the exhaust passage to pass through the mist filter, and removes a liquid component from the gas. 
     
     
         5 . The substrate processing apparatus according to  claim 1 , wherein the scrubber further includes a drain apparatus that expels liquid inside the exhaust passage by making the liquid be suctioned into a drain port that opens inside the exhaust passage. 
     
     
         6 . The substrate processing apparatus according to  claim 5 , wherein the scrubber further includes a scrubber filter that is disposed in the exhaust passage at a position further upstream than the drain port, allows gas flowing through the exhaust passage to pass through the scrubber filter, and retains liquid internally, and
 the drain apparatus includes a drain passage that extends from a position upstream than the scrubber filter to the drain port through a position below the scrubber filter such that the liquid inside the exhaust passage flows toward the drain port along the drain passage.   
     
     
         7 . The substrate processing apparatus according to  claim 1 , wherein the scrubber further includes a scrubber filter that is disposed in the exhaust passage, allows gas flowing through the exhaust passage to pass through the scrubber filter, and retains liquid internally, and
 the discharger discharges the scrubbing liquid constantly.   
     
     
         8 . The substrate processing apparatus according to  claim 1 , wherein the scrubber further includes a scrubber filter that is disposed in the exhaust passage, allows gas flowing through the exhaust passage to pass through the scrubber filter, and retains liquid internally, and
 the discharger discharges the scrubbing liquid intermittently.   
     
     
         9 . The substrate processing apparatus according to  claim 8 , wherein the scrubber further includes an exhaust pressure sensor that detects a gas pressure in the exhaust passage and
 the controller makes the discharger discharge the scrubbing liquid intermittently based on a detection value of the exhaust pressure sensor.   
     
     
         10 . The substrate processing apparatus according to  claim 1 , wherein the scrubber further includes a plurality of scrubber filters that allow gas flowing through the exhaust passage to pass through the plurality of scrubber filters and retain liquid internally and a filter switching apparatus switching a state of each of the plurality of scrubber filters individually,
 the filter switching apparatus switches the state of each of the plurality of scrubber filters individually between a removal state in which the gas inside exhaust passage passes through the scrubber filter and a removal stop state in which the passage of the gas through the scrubber filter is stopped, and   the controller selects any one of the plurality of scrubber filters based on the type of chemical liquid contained in the exhaust and causes the filter switching apparatus to switch the states of the plurality of scrubber filters such that the exhaust passes through the selected scrubber filter.   
     
     
         11 . The substrate processing apparatus according to  claim 1 , wherein the processing unit includes a gas-liquid separator that is disposed further upstream than the scrubber and removes liquid from the exhaust generated at the processing unit. 
     
     
         12 . The substrate processing apparatus according to  claim 1 , wherein the processing unit includes a plurality of processing units, each of which supplies at least one of a plurality of types of chemical liquids, and
 the exhaust passage includes a plurality of individual passages connected respectively to the plurality of processing units and a collection passage extending downstream from the plurality of individual passages.   
     
     
         13 . The substrate processing apparatus according to  claim 12 , wherein the discharger includes a plurality of dischargers disposed respectively in the plurality of individual passages. 
     
     
         14 . The substrate processing apparatus according to  claim 13 , wherein the scrubber further includes a plurality of scrubber filters that are disposed respectively in the plurality of individual passages, allow gas flowing through the exhaust passage to pass through the plurality of scrubber filters, and retain liquid internally. 
     
     
         15 . The substrate processing apparatus according to  claim 14 , wherein the scrubber further includes a plurality of mist filters that are disposed respectively in the plurality of individual passages at positions further downstream than the plurality of dischargers and the plurality of scrubber filters, allow gas flowing through the exhaust passage to pass through the plurality of mist filters, and remove a liquid component from the gas. 
     
     
         16 . The substrate processing apparatus according to  claim 12 , wherein the discharger is disposed in the collection passage. 
     
     
         17 . The substrate processing apparatus according to  claim 16 , wherein the scrubber further includes a scrubber filter that is disposed in the collection passage, allows gas flowing through the exhaust passage to pass through the scrubber filter, and retains liquid internally. 
     
     
         18 . The substrate processing apparatus according to  claim 17 , wherein the scrubber further includes a mist filter that is disposed in the collection passage at a position further downstream than the discharger and the scrubber filter, allows gas flowing through the exhaust passage to pass through the mist filter, and removes a liquid component from the gas. 
     
     
         19 . The substrate processing apparatus according to  claim 12 , wherein the scrubber further includes a drain apparatus that expels a liquid inside the exhaust passage by making the liquid be suctioned into a drain port that opens inside the collection passage, and
 the drain apparatus includes a plurality of drain passages extending from the plurality of individual passages to the collection passage and inclined with respect to a horizontal plane such that the liquid inside the exhaust passage flows from the plurality of individual passages to the collection passage.