Method of depositing a coating utilizing a coating apparatus

Abstract

A method of depositing a coating utilizing a coating apparatus includes providing a coating apparatus above a glass substrate and forming a coating on a surface of the glass substrate while flowing a fluorine-containing compound into the coating apparatus. The fluorine-containing compound inhibits the formation of the coating on one or more portions of the coating apparatus.

1 - 21 . (canceled) 
     
     
         22 . A method of depositing a coating utilizing a coating apparatus, comprising:
 providing a coating apparatus above a glass substrate; and   forming a coating on a surface of the glass substrate while flowing a fluorine-containing compound into the coating apparatus, wherein the fluorine-containing compound inhibits the formation of the coating on one or more portions of the coating apparatus.   
     
     
         23 . The method as claimed in  claim 22 , wherein the coating comprises an oxide of silicon. 
     
     
         24 . The method as claimed in  claim 22 , wherein the glass substrate is moving. 
     
     
         25 . The method as claimed in  claim 22 , further comprising positioning the coating apparatus within a deposition chamber. 
     
     
         26 . The method as claimed in  claim 22 , wherein the coating is formed on the surface of the glass substrate by chemical vapor deposition. 
     
     
         27 . The method as claimed in  claim 22 , wherein the glass substrate is at a temperature of between about 1050° F. (566° C.) and 1400° F. (760° C.). 
     
     
         28 . The method as claimed in  claim 22 , wherein the coating contains no fluorine or only trace amounts thereof. 
     
     
         29 . The method as claimed in  claim 22 , wherein the coating apparatus comprises one or more exhaust gas passages and the fluorine-containing compound is introduced into an exhaust gas passage. 
     
     
         30 . The method as claimed in  claim 22 , wherein the fluorine-containing compound is anhydrous HF. 
     
     
         31 . The method as claimed in  claim 22 , wherein the fluorine-containing compound inhibits the formation of the coating within one or more exhaust gas passages. 
     
     
         32 . The method as claimed in  claim 22 , wherein the fluorine-containing compound inhibits the formation of the coating on a surface of the coating apparatus. 
     
     
         33 . The method as claimed in  claim 22 , further comprising forming a gaseous mixture comprising a silicon-containing compound, an oxygen-containing compound and a radical scavenger, flowing the gaseous mixture into the coating apparatus and directing the gaseous mixture through the coating apparatus to the surface of the glass substrate. 
     
     
         34 . The method as claimed in  claim 22 , wherein the fluorine-containing compound flows into the coating apparatus prior to forming the coating on the surface of the glass substrate. 
     
     
         35 . The method as claimed in  claim 22 , wherein the coating is a silica coating. 
     
     
         36 . The method as claimed in  claim 29 , wherein the fluorine-containing compound is introduced into each exhaust gas passage via separate gas distribution tubes. 
     
     
         37 . The method as claimed in  claim 22 , wherein the ratio of fluorine-containing compound to silicon-containing compound flowing into the coating apparatus is equal to or greater than 2:1. 
     
     
         38 . The method as claimed in  claim 37 , wherein the ratio of fluorine-containing compound to silicon-containing compound flowing into the coating apparatus is equal to or greater than 4:1. 
     
     
         39 . A method of depositing a coating utilizing a coating apparatus, comprising:
 providing a coating apparatus which comprises one or more exhaust gas passages above a moving glass substrate; and   forming a silica coating on a surface of the glass substrate which contains no fluorine or only trace amounts thereof while flowing a fluorine-containing compound into the coating apparatus, wherein the fluorine-containing compound inhibits the formation of the silica coating in the one or more exhaust gas passages.   
     
     
         40 . The method as claimed in  claim 39 , wherein the glass substrate is at a temperature of between about 1050° F. (566° C.) and 1400° F. (760° C.). 
     
     
         41 . The method as claimed in  claim 39 , further comprising forming a gaseous mixture comprising a silicon-containing compound, an oxygen-containing compound and a radical scavenger, flowing the gaseous mixture into the coating apparatus and directing the gaseous mixture through the coating apparatus to the surface of the glass substrate and wherein the ratio of fluorine-containing compound to silicon-containing compound flowing into the coating apparatus is equal to or greater than 4:1. 
     
     
         42 . A coated glass substrate comprising a coating, the coating being deposited by utilizing a coating apparatus, comprising:
 providing a coating apparatus above a glass substrate; and   forming a coating on a surface of the glass substrate while flowing a fluorine-containing compound into the coating apparatus, wherein the fluorine-containing compound inhibits the formation of the coating on one or more portions of the coating apparatus.