US2016008607A1PendingUtilityA1
Polymeric feed-thru for chronic implantable devices
Est. expiryJul 11, 2034(~8 yrs left)· nominal 20-yr term from priority
H01B 3/28H01B 3/441A61N 1/362A61N 1/3754B32B 2581/00B32B 2457/04B32B 37/12B32B 15/06
53
PatentIndex Score
0
Cited by
0
References
0
Claims
Abstract
A method of making a feed-thru connector assembly includes inserting a conductor within an opening within a housing of a pulse generator and dispensing a sealant in a gap between the conductor and portions of the housing adjacent to the conductor that define the opening of the housing and curing the sealant to form a seal comprising a polyisobutylene cross-linked network.
Claims
exact text as granted — not AI-modifiedWe claim:
1 . An implantable system comprising:
a pulse generator including a housing, electronics within the housing, and an opening; a lead attached to the pulse generator; a feed-thru connector assembly mounted on the pulse generator and positioned at least partially within the opening, the feed-thru connector assembly comprising:
a conductor; and
a seal disposed within a gap between the conductor and portions of the housing adjacent to the conductor that define the opening of the housing, wherein the seal comprises a polyisobutylene cross-linked network.
2 . The implantable system of claim 1 , wherein the conductor comprises one of titanium, platinum iridium (PtIr), palladium iridium (PdIr), stainless steel SS316, MP35N, silver and gold alloys, and mixtures thereof.
3 . The implantable system of claim 1 , wherein at least a portion of a surface of the conductor includes a roughened surface.
4 . The implantable system of claim 1 , wherein the tensile strength between the conductor and the seal is greater than 1,500 psi.
5 . The implantable system of claim 1 , wherein the seal has a leak test rate less than about 4×10 −9 atm cc/sec (or Pa m 3 /s) when subjected to helium gas at a pressure of about 0.4 Pa.
6 . The implantable system of claim 1 , wherein the dielectric strength of the seal is greater than 1000 volts per mil.
7 . The implantable system of claim 1 , wherein the bulk resistivity of the seal is greater than 1×10 7 ohm-m.
8 . The implantable system of claim 1 , wherein the surface resistivity of the seal is greater than 1×10 6 ohm-m.
9 . A feed-thru connector assembly positioned at least partially within an opening in a pulse generator housing, the feed-thru connector assembly comprising:
a conductor disposed within the opening of the pulse generator housing; and a seal disposed within a gap between the conductor and portions of the pulse generator housing adjacent to the conductor, wherein the seal comprises a polyisobutylene cross-linked network.
10 . The feed-thru connector assembly of claim 9 , wherein the seal has a leak test rate less than about 4×10 −9 atm cc/sec (or Pa m 3 /s) when subjected to helium gas at a pressure of about 0.4 Pa.
11 . A method of making a feed-thru connector assembly for a pulse generator, the method comprising:
inserting a conductor within an opening within a housing of the pulse generator, the conductor being coupled to electronics housed within the housing; dispensing a sealant in a gap between the conductor and portions of the housing adjacent to the conductor that define the opening of the housing; and curing the sealant to form a seal comprising a polyisobutylene cross-linked network, wherein the seal is adapted to create a hermetic seal for the feedback assembly portion.
12 . The method of claim 11 , further comprising plasma treating at least a portion of the surface of the conductor that is bonded to the seal.
13 . The method of claim 11 , further comprising priming at least a portion of the conductor with a primer comprising an epoxy functional silane or a methylene diphenyl diisocyanate (MDI).
14 . The method of claim 11 , further comprising forming the polyisobutylene cross-linked network that comprises:
reacting a telechelic polyisobutylene diol and a diisocyanate to form a diisocyanate derivative; and reacting the diisocyanate derivative with a crosslinking initiator to form the polyisobutylene cross-linked network.
15 . The method of claim 11 , wherein the diisocyanate is 4,4′-methylenephenyl diisocyanate (MDI) and the crosslinking initiator is pentaerythritol.
16 . The method of claim 11 , further comprising forming the polyisobutylene cross-linked network that comprises:
reacting a diisocyanate with a polyol or a polyamine to form a polyisocyanate; and reacting the polyisocyanate with a telechelic polyisobutylene diol to form the polyisobutylene cross-linked network.
17 . The method of claim 16 , wherein the diisocyanate comprises 4,4′-methylenephenyl diisocyanate (MDI) and the polyol comprises 1,1,2,2-Tetrakis(p-hydroxyphenyl)ethane.
18 . The method of claim 11 , further comprising forming a polyisobutylene cross-linked network by reacting together:
a telechelic polyisobutylene derivative; a silane agent; and a transition metal species.
19 . The method of claim 18 , wherein the telechelic polyisobutylene derivative is a polyisobutylene dichloride or a polyisobutylene diallyl.
20 . The method of claim 18 , wherein the silane agent has more than two reactive hydrosilane groups per molecule in the presence of a catalyst.Join the waitlist — get patent alerts
Track US2016008607A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.