Light Emitter With Coating Layers
Abstract
A laser apparatus may comprise: a substrate having a first surface and a second surface opposite to the first surface; a light emitting region formed on the first surface of the first substrate, the light emitting region including a p-type semiconductor layer and an n-type semiconductor layer; a p-contact layer formed on the p-type semiconductor layer; an n-contact layer formed on the n-type semiconductor layer; a sub-mount formed on the p-contact layer and the n-contact layer, the sub-mount including a first patterned dielectric coating layer formed on the p-contact layer and a reflector formed on the patterned dielectric coating layer.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A light emitting device comprising:
a substrate having a first surface and a second surface opposite to the first surface; a light emitting region formed on the first surface of the first substrate, the light emitting region including a p-type semiconductor layer and an n-type semiconductor layer; a p-contact layer formed on the p-type semiconductor layer; an n-contact layer formed on the n-type semiconductor layer; a sub-mount formed on the p-contact layer and the n-contact layer, the sub-mount including a first patterned dielectric coating layer formed on the p-contact layer and a reflector formed on the patterned dielectric coating layer.
2 . The light emitting device of claim 1 , wherein the first patterned dielectric coating layer comprises metal-oxide.
3 . The light emitting device of claim 2 , wherein the first patterned dielectric coating layer comprises a material chosen from a group consisting of Ta 2 O 5 , Nb 2 O 5 and TiO 2 .
4 . The light emitting device of claim 3 , wherein the first patterned dielectric coating layer comprises Nb 2 O 5 .
5 . The light emitting device of claim 1 , wherein the first patterned dielectric coating layer comprises a material chosen from a group consisting of metal oxide, silicon carbide, GaN, Ta 2 O 5 , Nb 2 O 5 , TiO 2 , AlInGaN based solid solutions.
6 . The light emitting device of claim 1 , wherein the light emitting region comprises:
an n-type semiconductor cap layer; an active region of an AiInGaN material system, the n-type semiconductor cap layer formed between the active region and the substrate; and a p-type semiconductor cap layer.
7 . The light emitting device of claim 1 , further comprising:
a second patterned dielectric coating layer formed on the second surface of the substrate, the second patterned dielectric coating layer having a patterned surface constituting a surface area for light emission.
8 . The light emitting device of claim 7 , wherein the patterned surface of the second patterned dielectric coating layer is continuously patterned.
9 . The light emitting device of claim 8 , wherein the second patterned dielectric coating layer comprises metal-oxide.
10 . The light emitting device of claim 8 , wherein the second patterned dielectric coating layer comprises a material chosen from a group consisting of metal oxide, silicon carbide, GaN, Ta 2 O 5 , Nb 2 O 5 , TiO 2 , AlInGaN based solid solutions.Join the waitlist — get patent alerts
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