System and method for generating extreme ultraviolet light

Abstract

A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

1 - 11 . (canceled) 
     
     
         12 . A system comprising:
 a laser beam apparatus configured to generate a laser beam; and   a target supply unit configured to supply a target material to be irradiated with the laser beam for generating extreme ultraviolet light, wherein   the laser beam apparatus is configured to:   generate a first pre-pulse laser beam with which the target material is irradiated, the first pre-pulse laser beam having a pulse duration of less than 1 ns,   generate a second pre-pulse laser beam with which the target material irradiated with the first pre-pulse laser beam is irradiated, and   generate a main pulse laser beam with which the target material irradiated with the second pre-pulse laser beam is irradiated.   
     
     
         13 . The system according to  claim 12 , wherein the laser beam apparatus includes a CO 2  laser apparatus. 
     
     
         14 . The system according to  claim 12 , wherein the laser beam apparatus comprises:
 a first laser apparatus configured to generate the first pre-pulse laser beam with which the target material is irradiated;   a second laser apparatus configured to generate the second pre-pulse laser beam with which the target material irradiated with the first pre-pulse laser beam is irradiated; and   a third laser apparatus configured to generate the main pulse laser beam with which the target material irradiated with the second pre-pulse laser beam is irradiated.   
     
     
         15 . The system according to  claim 14 , wherein
 the first and second laser apparatuses are configured to generate laser beams each having a first wavelength, and   the third laser apparatus is configured to generate a laser beam having a second wavelength longer than the first wavelength.   
     
     
         16 . The system according to  claim 15 , wherein
 the first laser apparatus is a first YAG laser apparatus;   the second laser apparatus is a second YAG laser apparatus; and   the third laser apparatus is a CO 2  laser apparatus.   
     
     
         17 . The system according to  claim 12 , wherein the laser beam apparatus comprises:
 a first laser apparatus configured to generate the first pre-pulse laser beam with which the target material is irradiated and the second pre-pulse laser beam with which the target material irradiated with the first pre-pulse laser beam is irradiated; and   a second laser apparatus configured to generate the main pulse laser beam with which the target material irradiated with the second pre-pulse laser beam is irradiated.   
     
     
         18 . The system according to  claim 17 , wherein
 the first laser apparatus is configured to generate a laser beam having a first wavelength, and   the second laser apparatus is configured to generate a laser beam having a second wavelength longer than the first wavelength.   
     
     
         19 . The system according to  claim 18 , wherein
 the first laser apparatus is a YAG laser apparatus; and   the second laser apparatus is a CO 2  laser apparatus.   
     
     
         20 . The system according to  claim 18 , wherein
 the first laser apparatus is a fiber laser apparatus; and   the second laser apparatus is a CO 2  laser apparatus.   
     
     
         21 . The system according to  claim 12 , wherein the laser beam apparatus includes a mode-locked laser apparatus. 
     
     
         22 . The system according to  claim 21 , wherein the mode-locked laser apparatus is a Ti:sapphire laser. 
     
     
         23 . The system according to  claim 21 , wherein the mode-locked laser apparatus is a fiber laser.